JP2016519832A5 - - Google Patents

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Publication number
JP2016519832A5
JP2016519832A5 JP2016500085A JP2016500085A JP2016519832A5 JP 2016519832 A5 JP2016519832 A5 JP 2016519832A5 JP 2016500085 A JP2016500085 A JP 2016500085A JP 2016500085 A JP2016500085 A JP 2016500085A JP 2016519832 A5 JP2016519832 A5 JP 2016519832A5
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JP
Japan
Prior art keywords
voltage
magnetron
coil driver
drive current
magnetic field
Prior art date
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Application number
JP2016500085A
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English (en)
Japanese (ja)
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JP2016519832A (ja
JP6415527B2 (ja
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Priority claimed from PCT/US2013/052729 external-priority patent/WO2014143137A1/en
Publication of JP2016519832A publication Critical patent/JP2016519832A/ja
Publication of JP2016519832A5 publication Critical patent/JP2016519832A5/ja
Application granted granted Critical
Publication of JP6415527B2 publication Critical patent/JP6415527B2/ja
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JP2016500085A 2013-03-15 2013-07-30 デュアル電源を使用してデュアルマグネトロンにパワーを供給するシステム及び方法 Active JP6415527B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361788500P 2013-03-15 2013-03-15
US61/788,500 2013-03-15
PCT/US2013/052729 WO2014143137A1 (en) 2013-03-15 2013-07-30 System and method for powering dual magnetrons using a dual power supply

Publications (3)

Publication Number Publication Date
JP2016519832A JP2016519832A (ja) 2016-07-07
JP2016519832A5 true JP2016519832A5 (enExample) 2016-09-01
JP6415527B2 JP6415527B2 (ja) 2018-10-31

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ID=51522925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016500085A Active JP6415527B2 (ja) 2013-03-15 2013-07-30 デュアル電源を使用してデュアルマグネトロンにパワーを供給するシステム及び方法

Country Status (7)

Country Link
US (2) US9363853B2 (enExample)
EP (1) EP2973922B1 (enExample)
JP (1) JP6415527B2 (enExample)
KR (1) KR102116215B1 (enExample)
CN (1) CN105122569B (enExample)
TW (1) TWI584695B (enExample)
WO (1) WO2014143137A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6415527B2 (ja) * 2013-03-15 2018-10-31 ヘレウス ノーブルライト アメリカ エルエルシー デュアル電源を使用してデュアルマグネトロンにパワーを供給するシステム及び方法
WO2019045323A1 (ko) * 2017-08-31 2019-03-07 엘지전자 주식회사 회로 구조가 개선된 유도 가열 및 무선 전력 전송 장치
KR102413857B1 (ko) * 2017-08-31 2022-06-28 엘지전자 주식회사 회로 구조가 개선된 유도 가열 및 무선 전력 전송 장치
RU2718811C1 (ru) * 2019-10-04 2020-04-14 Евгений Петрович Бондарь Магнетронная установка (варианты)
RU2718611C1 (ru) * 2019-10-04 2020-04-08 Евгений Петрович Бондарь СВЧ установка

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Publication number Priority date Publication date Assignee Title
JPS4123343Y1 (enExample) * 1964-04-02 1966-11-25
US3619536A (en) 1970-05-14 1971-11-09 Bowmar Tic Inc Microwave oven with separately driven antenna elements
SE457496B (sv) 1987-05-07 1988-12-27 Alfastar Ab Anordning foer att reglera magnetroner, vad avser deras mikrovaagseffekt
US4868509A (en) * 1988-05-23 1989-09-19 Fusion Systems Corporation Method and apparatus for detecting magnetron power supply failure
JP2504198B2 (ja) 1989-07-12 1996-06-05 日本電気株式会社 移動通信システムの移動端末
US5571439A (en) * 1995-04-27 1996-11-05 Fusion Systems Corporation Magnetron variable power supply with moding prevention
US5838114A (en) 1996-03-08 1998-11-17 Fusion Systems Corporation Plural ferro-resonant power supplies for powering a magnetron where the aray lies in these power supplies being independent from each other and not utilizing any common components
US5886480A (en) * 1998-04-08 1999-03-23 Fusion Uv Systems, Inc. Power supply for a difficult to start electrodeless lamp
US6177783B1 (en) * 1999-09-13 2001-01-23 Adc Telecommunications, Inc. Current balancing for voltage regulator having inputs from multiple power supplies
US6509656B2 (en) * 2001-01-03 2003-01-21 Fusion Uv Systems Dual magnetrons powered by a single power supply
JP2003115372A (ja) * 2001-10-05 2003-04-18 Matsushita Electric Ind Co Ltd マイクロ波発生装置
JP2003117404A (ja) * 2001-10-19 2003-04-22 Bridgestone Corp 光触媒の製造方法及び光触媒
JP4123343B2 (ja) 2002-04-23 2008-07-23 Ｊｓｒ株式会社 オキセタニル基を有する環状オレフィン
US6972079B2 (en) * 2003-06-25 2005-12-06 Advanced Energy Industries Inc. Dual magnetron sputtering apparatus utilizing control means for delivering balanced power
SE0303136D0 (sv) 2003-11-24 2003-11-24 Chemfilt R & D Ab Method and apparatus for reactive soilid-gas-plasma deposition
JP4204505B2 (ja) * 2004-03-31 2009-01-07 日本高周波株式会社 マグネトロン発振装置
JP4237733B2 (ja) * 2004-08-02 2009-03-11 株式会社リコー 補助電源ユニットおよび画像形成装置
JP2006092874A (ja) * 2004-09-22 2006-04-06 Sanyo Electric Co Ltd 電子レンジ
WO2008049634A1 (en) 2006-10-26 2008-05-02 Hauzer Techno Coating Bv Dual magnetron sputtering power supply and magnetron sputtering apparatus
TWI380553B (en) * 2009-04-16 2012-12-21 Delta Electronics Inc Power supply and power system employing plural power supplies
US9066377B2 (en) * 2009-08-10 2015-06-23 Sharp Kabushiki Kaisha High frequency cooking apparatus
JP6415527B2 (ja) * 2013-03-15 2018-10-31 ヘレウス ノーブルライト アメリカ エルエルシー デュアル電源を使用してデュアルマグネトロンにパワーを供給するシステム及び方法

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