JP2016502595A5 - - Google Patents
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- Publication number
- JP2016502595A5 JP2016502595A5 JP2015539665A JP2015539665A JP2016502595A5 JP 2016502595 A5 JP2016502595 A5 JP 2016502595A5 JP 2015539665 A JP2015539665 A JP 2015539665A JP 2015539665 A JP2015539665 A JP 2015539665A JP 2016502595 A5 JP2016502595 A5 JP 2016502595A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gas injection
- extraction
- conduit
- substrate support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002347 injection Methods 0.000 claims description 35
- 239000007924 injection Substances 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 29
- 238000000605 extraction Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 7
- 239000006227 byproduct Substances 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims 63
- 239000000463 material Substances 0.000 claims 2
- 239000002243 precursor Substances 0.000 claims 2
- 238000000231 atomic layer deposition Methods 0.000 claims 1
- 239000003638 chemical reducing agent Substances 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 239000000047 product Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261718413P | 2012-10-25 | 2012-10-25 | |
| US61/718,413 | 2012-10-25 | ||
| US14/052,049 US10174422B2 (en) | 2012-10-25 | 2013-10-11 | Apparatus for selective gas injection and extraction |
| US14/052,049 | 2013-10-11 | ||
| PCT/US2013/065354 WO2014066123A1 (en) | 2012-10-25 | 2013-10-17 | Apparatus for selective gas injection and extraction |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016502595A JP2016502595A (ja) | 2016-01-28 |
| JP2016502595A5 true JP2016502595A5 (enExample) | 2016-12-08 |
| JP6514106B2 JP6514106B2 (ja) | 2019-05-15 |
Family
ID=50545120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015539665A Active JP6514106B2 (ja) | 2012-10-25 | 2013-10-17 | 選択的なガス注入及び抽出のための装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US10174422B2 (enExample) |
| JP (1) | JP6514106B2 (enExample) |
| KR (2) | KR102208882B1 (enExample) |
| CN (1) | CN104718603B (enExample) |
| TW (1) | TWI596230B (enExample) |
| WO (1) | WO2014066123A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10954597B2 (en) * | 2015-03-17 | 2021-03-23 | Asm Ip Holding B.V. | Atomic layer deposition apparatus |
| KR102420015B1 (ko) * | 2015-08-28 | 2022-07-12 | 삼성전자주식회사 | Cs-ald 장치의 샤워헤드 |
| AT518081B1 (de) * | 2015-12-22 | 2017-07-15 | Sico Tech Gmbh | Injektor aus Silizium für die Halbleiterindustrie |
| US11919189B2 (en) | 2020-12-10 | 2024-03-05 | Bobst Mex Sa | Positioning device and positioning assembly for holding a flat flexible part, and sheet material processing machine |
| GB2624388B (en) * | 2022-11-15 | 2025-02-05 | Edwards Ltd | Vacuum chamber and vacuum system |
| CN117802480A (zh) * | 2024-01-23 | 2024-04-02 | 哈尔滨工业大学 | 用于半球形曲面内表面均匀镀膜的原子层沉积装置 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3158264B2 (ja) | 1993-08-11 | 2001-04-23 | 東京エレクトロン株式会社 | ガス処理装置 |
| US5781693A (en) | 1996-07-24 | 1998-07-14 | Applied Materials, Inc. | Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween |
| US20030049372A1 (en) * | 1997-08-11 | 2003-03-13 | Cook Robert C. | High rate deposition at low pressures in a small batch reactor |
| JP2978857B2 (ja) | 1997-10-03 | 1999-11-15 | 九州日本電気株式会社 | プラズマエッチング装置 |
| US6086677A (en) | 1998-06-16 | 2000-07-11 | Applied Materials, Inc. | Dual gas faceplate for a showerhead in a semiconductor wafer processing system |
| JP2000114251A (ja) * | 1998-10-09 | 2000-04-21 | C Bui Res:Kk | 常圧cvd装置用ガス散布機構部 |
| US6230651B1 (en) | 1998-12-30 | 2001-05-15 | Lam Research Corporation | Gas injection system for plasma processing |
| JP2000262351A (ja) | 1999-03-17 | 2000-09-26 | Kasai Kogyo Co Ltd | 自動車用シートのポケット構造 |
| JP3212581B2 (ja) | 1999-12-08 | 2001-09-25 | 株式会社筒井プラスチック | 含浸液体の化学結合により補強された粉体造形品の製造方法 |
| US6461980B1 (en) | 2000-01-28 | 2002-10-08 | Applied Materials, Inc. | Apparatus and process for controlling the temperature of a substrate in a plasma reactor chamber |
| KR100470986B1 (ko) | 2000-03-14 | 2005-03-07 | 주성엔지니어링(주) | 반도체소자 제조용 고진공 장치 및 이를 이용한 에피택셜막 형성방법 |
| JP2001262351A (ja) * | 2000-03-23 | 2001-09-26 | Ebara Corp | シャワーヘッド及び成膜装置 |
| US20030070620A1 (en) | 2001-10-15 | 2003-04-17 | Cooperberg David J. | Tunable multi-zone gas injection system |
| US6821563B2 (en) * | 2002-10-02 | 2004-11-23 | Applied Materials, Inc. | Gas distribution system for cyclical layer deposition |
| KR100941960B1 (ko) * | 2003-06-03 | 2010-02-11 | 주성엔지니어링(주) | 화학기상증착 장치의 샤워헤드 |
| KR101309334B1 (ko) * | 2004-08-02 | 2013-09-16 | 비코 인스트루먼츠 인코포레이티드 | 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터 |
| KR20070058797A (ko) | 2005-12-05 | 2007-06-11 | 삼성전자주식회사 | 반도체 웨이퍼의 오염 분석을 위한 전처리 방법 및 이를이용한 장치 |
| CN101589171A (zh) | 2006-03-03 | 2009-11-25 | 普拉萨德·盖德吉尔 | 用于大面积多层原子层化学气相处理薄膜的装置和方法 |
| JP4741430B2 (ja) | 2006-06-30 | 2011-08-03 | 京セラ株式会社 | 成膜装置および成膜方法 |
| JP4826483B2 (ja) | 2007-01-19 | 2011-11-30 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US8057602B2 (en) | 2007-05-09 | 2011-11-15 | Applied Materials, Inc. | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |
| US8057601B2 (en) | 2007-05-09 | 2011-11-15 | Applied Materials, Inc. | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |
| KR100960958B1 (ko) | 2007-12-24 | 2010-06-03 | 주식회사 케이씨텍 | 박막 증착 장치 및 증착 방법 |
| KR101004927B1 (ko) * | 2008-04-24 | 2010-12-29 | 삼성엘이디 주식회사 | Cvd용 샤워 헤드 및 이를 구비하는 화학 기상 증착 장치 |
| KR100982842B1 (ko) * | 2008-04-25 | 2010-09-16 | 주식회사 케이씨텍 | 원자층 증착 장치 |
| US8111978B2 (en) | 2008-07-11 | 2012-02-07 | Applied Materials, Inc. | Rapid thermal processing chamber with shower head |
| US20100037820A1 (en) * | 2008-08-13 | 2010-02-18 | Synos Technology, Inc. | Vapor Deposition Reactor |
| KR101037189B1 (ko) * | 2008-11-11 | 2011-05-26 | 세메스 주식회사 | 플라즈마 화학기상증착 장치용 대면적 샤워헤드 |
| KR101027954B1 (ko) * | 2008-12-22 | 2011-04-12 | 주식회사 케이씨텍 | 샤워헤드 및 이를 구비하는 원자층 증착장치 |
| US8298372B2 (en) | 2009-04-20 | 2012-10-30 | Applied Materials, Inc. | Quartz window having gas feed and processing equipment incorporating same |
| JP5812606B2 (ja) * | 2010-02-26 | 2015-11-17 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
| US9499905B2 (en) | 2011-07-22 | 2016-11-22 | Applied Materials, Inc. | Methods and apparatus for the deposition of materials on a substrate |
| CN104471678B (zh) | 2012-07-27 | 2018-06-29 | 应用材料公司 | 用于输送工艺气体至基板的方法和设备 |
| US20140027060A1 (en) | 2012-07-27 | 2014-01-30 | Applied Matericals, Inc | Gas distribution apparatus for substrate processing systems |
-
2013
- 2013-10-11 US US14/052,049 patent/US10174422B2/en active Active
- 2013-10-15 TW TW102137182A patent/TWI596230B/zh active
- 2013-10-17 WO PCT/US2013/065354 patent/WO2014066123A1/en not_active Ceased
- 2013-10-17 KR KR1020207022588A patent/KR102208882B1/ko active Active
- 2013-10-17 JP JP2015539665A patent/JP6514106B2/ja active Active
- 2013-10-17 KR KR1020157013626A patent/KR102143141B1/ko active Active
- 2013-10-17 CN CN201380052520.0A patent/CN104718603B/zh active Active
-
2018
- 2018-12-11 US US16/216,175 patent/US11274368B2/en active Active
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