JP2016502495A5 - - Google Patents
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- Publication number
- JP2016502495A5 JP2016502495A5 JP2015545421A JP2015545421A JP2016502495A5 JP 2016502495 A5 JP2016502495 A5 JP 2016502495A5 JP 2015545421 A JP2015545421 A JP 2015545421A JP 2015545421 A JP2015545421 A JP 2015545421A JP 2016502495 A5 JP2016502495 A5 JP 2016502495A5
- Authority
- JP
- Japan
- Prior art keywords
- less
- doped silica
- titania glass
- titania
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 49
- 239000011521 glass Substances 0.000 claims description 45
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 12
- 239000011737 fluorine Substances 0.000 claims description 12
- 239000004071 soot Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000002243 precursor Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 5
- 239000002245 particle Substances 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 239000002019 doping agent Substances 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 230000007062 hydrolysis Effects 0.000 claims description 2
- 238000006460 hydrolysis reaction Methods 0.000 claims description 2
- 238000005245 sintering Methods 0.000 claims description 2
- 241000338670 Clossiana titania Species 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000002485 combustion reaction Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261731621P | 2012-11-30 | 2012-11-30 | |
| US61/731,621 | 2012-11-30 | ||
| US13/835,039 | 2013-03-15 | ||
| US13/835,039 US8901019B2 (en) | 2012-11-30 | 2013-03-15 | Very low CTE slope doped silica-titania glass |
| PCT/US2013/072146 WO2014085529A1 (en) | 2012-11-30 | 2013-11-27 | Very low cte slope doped silica-titania glass |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016502495A JP2016502495A (ja) | 2016-01-28 |
| JP2016502495A5 true JP2016502495A5 (https=) | 2016-11-24 |
| JP6291505B2 JP6291505B2 (ja) | 2018-03-14 |
Family
ID=50826009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015545421A Expired - Fee Related JP6291505B2 (ja) | 2012-11-30 | 2013-11-27 | 非常に低いｃｔｅ勾配のドープされたシリカ−チタニアガラス |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8901019B2 (https=) |
| EP (1) | EP2925686A1 (https=) |
| JP (1) | JP6291505B2 (https=) |
| WO (1) | WO2014085529A1 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9505649B2 (en) | 2013-09-13 | 2016-11-29 | Corning Incorporated | Ultralow expansion glass |
| DE102013112396B3 (de) * | 2013-11-12 | 2014-11-13 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Rohlings aus Titan- und Fluor-dotiertem, hochkieselsäurehaltigem Glas |
| US9382150B2 (en) * | 2014-03-14 | 2016-07-05 | Corning Incorporated | Boron-doped titania-silica glass having very low CTE slope |
| EP3000791B1 (de) * | 2014-09-24 | 2017-04-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung eines Rohlings aus Fluor- und Titan-dotiertem, hochkieselsäurehaltigem Glas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling |
| US9580350B2 (en) | 2014-11-19 | 2017-02-28 | Corning Incorporated | High hydroxyl TiO2-SiO2 glass |
| JP2017536323A (ja) * | 2014-11-26 | 2017-12-07 | コーニング インコーポレイテッド | 低膨張率を有するドープされたシリカ−チタニアガラスおよびその製造方法 |
| JP6748644B2 (ja) * | 2014-11-26 | 2020-09-02 | コーニング インコーポレイテッド | ハロゲンをドープした光学要素を製造する方法 |
| US9611169B2 (en) * | 2014-12-12 | 2017-04-04 | Corning Incorporated | Doped ultra-low expansion glass and methods for making the same |
| US9822030B2 (en) * | 2015-02-13 | 2017-11-21 | Corning Incorporated | Ultralow expansion titania-silica glass |
| JP2018513093A (ja) | 2015-03-26 | 2018-05-24 | コーニング インコーポレイテッド | 極紫外線リソグラフィーに使用するためのガラス複合体 |
| US9932261B2 (en) * | 2015-11-23 | 2018-04-03 | Corning Incorporated | Doped ultra-low expansion glass and methods for annealing the same |
| US10464840B2 (en) * | 2016-10-05 | 2019-11-05 | Corning Incorporated | Near infrared shielding and laser-resistant window |
| CN115181502B (zh) | 2016-12-21 | 2023-09-22 | 康宁股份有限公司 | 烧结系统和烧结制品 |
| US11270724B1 (en) * | 2021-03-04 | 2022-03-08 | Western Digital Technologies, Inc. | Glass substrates for heat assisted magnetic recording (HAMR) and methods and apparatus for use with the glass substrates |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4792706B2 (ja) | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびその製造方法 |
| EP1471038A3 (de) | 2003-04-26 | 2005-11-23 | Schott Ag | Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas |
| DE102004060600A1 (de) | 2003-12-18 | 2005-07-14 | Schott Ag | Mit Fluor dotiertes Silicatglas und Verwendung eines solchen |
| US20060179879A1 (en) * | 2004-12-29 | 2006-08-17 | Ellison Adam J G | Adjusting expansivity in doped silica glasses |
| US20080004169A1 (en) * | 2006-06-28 | 2008-01-03 | Adam James Ellison | Ultra low expansion glass and methods for making |
| JP5042714B2 (ja) * | 2007-06-06 | 2012-10-03 | 信越化学工業株式会社 | ナノインプリントモールド用チタニアドープ石英ガラス |
| WO2009070223A1 (en) | 2007-11-30 | 2009-06-04 | Corning Incorporated | Low expansion glass material having low expansivity gradient |
| JP5428323B2 (ja) * | 2007-12-27 | 2014-02-26 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| TW200940472A (en) | 2007-12-27 | 2009-10-01 | Asahi Glass Co Ltd | TiO2-containing silica glass |
| EP2250133A1 (en) | 2008-02-29 | 2010-11-17 | Asahi Glass Company, Limited | Tio2-containing silica glass and optical member for lithography using the same |
| JP5644058B2 (ja) | 2008-03-21 | 2014-12-24 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラス |
| JP2010135732A (ja) | 2008-08-01 | 2010-06-17 | Asahi Glass Co Ltd | Ｅｕｖマスクブランクス用基板 |
| US8735308B2 (en) | 2009-01-13 | 2014-05-27 | Asahi Glass Company, Limited | Optical member comprising TiO2-containing silica glass |
| JPWO2010131662A1 (ja) | 2009-05-13 | 2012-11-01 | 旭硝子株式会社 | ＴｉＯ２−ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２−ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材 |
| JP5572016B2 (ja) | 2009-08-04 | 2014-08-13 | シスメックス株式会社 | 組織液抽出用デバイス、その製造方法、及び該デバイスを用いた組織液の分析方法 |
| US8713969B2 (en) | 2009-08-31 | 2014-05-06 | Corning Incorporated | Tuning Tzc by the annealing of ultra low expansion glass |
| JP5510308B2 (ja) | 2009-12-25 | 2014-06-04 | 旭硝子株式会社 | Ｅｕｖｌ光学部材用基材 |
| US8541325B2 (en) | 2010-02-25 | 2013-09-24 | Corning Incorporated | Low expansivity, high transmission titania doped silica glass |
| US20110207593A1 (en) | 2010-02-25 | 2011-08-25 | Carlos Duran | Expansivity in Low Expansion Silica-Titania Glasses |
| US20130047669A1 (en) | 2011-08-31 | 2013-02-28 | Sezhian Annamalai | Method of making a silica-titania glass having a ternary doped critical zone |
| US9034450B2 (en) | 2011-08-31 | 2015-05-19 | Corning Incorporated | Binary silica-titania glass articles having a ternary doped silica-titania critical zone |
-
2013
- 2013-03-15 US US13/835,039 patent/US8901019B2/en not_active Expired - Fee Related
- 2013-11-27 WO PCT/US2013/072146 patent/WO2014085529A1/en not_active Ceased
- 2013-11-27 JP JP2015545421A patent/JP6291505B2/ja not_active Expired - Fee Related
- 2013-11-27 EP EP13803404.6A patent/EP2925686A1/en not_active Withdrawn
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