|
US4203034A
(en)
*
|
1978-06-01 |
1980-05-13 |
University Of Florida Board Of Regents |
Diffraction camera for imaging penetrating radiation
|
|
US4599741A
(en)
*
|
1983-11-04 |
1986-07-08 |
USC--Dept. of Materials Science |
System for local X-ray excitation by monochromatic X-rays
|
|
US4807268A
(en)
*
|
1983-11-04 |
1989-02-21 |
University Of Southern California |
Scanning monochrometer crystal and method of formation
|
|
JPH0755841B2
(ja)
*
|
1987-02-03 |
1995-06-14 |
旭硝子株式会社 |
合せガラス用ガラス板の曲げ加工方法
|
|
JPH0833497B2
(ja)
*
|
1987-03-25 |
1996-03-29 |
株式会社島津製作所 |
Ｘ線湾曲結晶
|
|
NL8801019A
(nl)
*
|
1988-04-20 |
1989-11-16 |
Philips Nv |
Roentgen spectrometer met dubbel gebogen kristal.
|
|
JP2727745B2
(ja)
*
|
1989-08-24 |
1998-03-18 |
旭硝子株式会社 |
曲げ合せガラス及び合せガラス用素板ガラスの曲げ加工方法
|
|
JPH03131539A
(ja)
*
|
1989-10-17 |
1991-06-05 |
Asahi Glass Co Ltd |
曲げ成型用プレス型とガラス板の曲げ成型方法及びその装置
|
|
US5127028A
(en)
*
|
1990-08-01 |
1992-06-30 |
Wittry David B |
Diffractord with doubly curved surface steps
|
|
US5164975A
(en)
*
|
1991-06-13 |
1992-11-17 |
The United States Of America As Represented By The United States Department Of Energy |
Multiple wavelength X-ray monochromators
|
|
JPH08201593A
(ja)
|
1995-01-26 |
1996-08-09 |
Nikon Corp |
非球面反射光学素子
|
|
JPH08201589A
(ja)
|
1995-01-26 |
1996-08-09 |
Nikon Corp |
Ｘ線分光素子
|
|
JPH10502741A
(ja)
*
|
1995-04-26 |
1998-03-10 |
フィリップス エレクトロニクス ネムローゼ フェンノートシャップ |
Ｘ線分析装置用のｘ線光学素子の製造方法
|
|
JP3705504B2
(ja)
*
|
1995-10-24 |
2005-10-12 |
株式会社アサヒオプティカル |
眼鏡用樹脂レンズの注型成形用モールド
|
|
EP0884736B1
(en)
*
|
1997-06-11 |
2004-01-28 |
Istituto Nazionale Di Fisica Nucleare |
Multi-stepped diffractor constructed with constant step width angle (multi-stepped monochromator)
|
|
US5923720A
(en)
*
|
1997-06-17 |
1999-07-13 |
Molecular Metrology, Inc. |
Angle dispersive x-ray spectrometer
|
|
US5892809A
(en)
*
|
1997-09-10 |
1999-04-06 |
Wittry; David B. |
Simplified system for local excitation by monochromatic x-rays
|
|
DE19833524B4
(de)
*
|
1998-07-25 |
2004-09-23 |
Bruker Axs Gmbh |
Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
|
|
US6285506B1
(en)
*
|
1999-01-21 |
2001-09-04 |
X-Ray Optical Systems, Inc. |
Curved optical device and method of fabrication
|
|
US6236710B1
(en)
*
|
1999-02-12 |
2001-05-22 |
David B. Wittry |
Curved crystal x-ray optical device and method of fabrication
|
|
US6498830B2
(en)
*
|
1999-02-12 |
2002-12-24 |
David B. Wittry |
Method and apparatus for fabricating curved crystal x-ray optics
|
|
US6931097B1
(en)
*
|
1999-07-22 |
2005-08-16 |
Corning Incorporated |
Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
|
|
JP2001057328A
(ja)
*
|
1999-08-18 |
2001-02-27 |
Nikon Corp |
反射マスク、露光装置および集積回路の製造方法
|
|
US6381303B1
(en)
*
|
1999-09-29 |
2002-04-30 |
Jordan Valley Applied Radiation Ltd. |
X-ray microanalyzer for thin films
|
|
US6317483B1
(en)
*
|
1999-11-29 |
2001-11-13 |
X-Ray Optical Systems, Inc. |
Doubly curved optical device with graded atomic planes
|
|
US6625250B2
(en)
*
|
1999-12-20 |
2003-09-23 |
Agere Systems Inc. |
Optical structures and methods for x-ray applications
|
|
US6697454B1
(en)
*
|
2000-06-29 |
2004-02-24 |
X-Ray Optical Systems, Inc. |
X-ray analytical techniques applied to combinatorial library screening
|
|
US6829327B1
(en)
*
|
2000-09-22 |
2004-12-07 |
X-Ray Optical Systems, Inc. |
Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic
|
|
JP2005512020A
(ja)
*
|
2001-06-19 |
2005-04-28 |
エックス−レイ オプティカル システムズ インコーポレーテッド |
Ｘ線蛍光分光システム及びｘ線蛍光分光方法
|
|
AU2002363962A1
(en)
*
|
2001-12-04 |
2003-06-17 |
X-Ray Optical Systems, Inc. |
X-ray source assembly having enhanced output stability, and fluid stream analysis applications thereof
|
|
US6680996B2
(en)
*
|
2002-02-19 |
2004-01-20 |
Jordan Valley Applied Radiation Ltd. |
Dual-wavelength X-ray reflectometry
|
|
US6816570B2
(en)
*
|
2002-03-07 |
2004-11-09 |
Kla-Tencor Corporation |
Multi-technique thin film analysis tool
|
|
US7248670B2
(en)
*
|
2002-06-19 |
2007-07-24 |
Xenocs |
Optical unit and associated method
|
|
US7104690B2
(en)
*
|
2002-07-26 |
2006-09-12 |
X-Ray Optical Systems, Inc. |
Diagnosing system for an x-ray source assembly
|
|
WO2004013867A2
(en)
*
|
2002-08-02 |
2004-02-12 |
X-Ray Optical Systems, Inc. |
An optical device for directing x-rays having a plurality of optical crystals
|
|
US7763820B1
(en)
*
|
2003-01-27 |
2010-07-27 |
Spectramet, Llc |
Sorting pieces of material based on photonic emissions resulting from multiple sources of stimuli
|
|
US20050011227A1
(en)
*
|
2003-03-26 |
2005-01-20 |
Hoya Corporation |
Method of preparation of lens
|
|
DE102004014954A1
(de)
*
|
2003-03-27 |
2005-03-10 |
Hoya Corp |
Verfahren zur Herstellung eines Glassubstrats für einen Maskenrohling und Verfahren zur Herstellung eines Maskenrohlings
|
|
JP4723487B2
(ja)
*
|
2003-06-02 |
2011-07-13 |
エックス−レイ オプティカル システムズ インコーポレーテッド |
Ｘ線吸収端近傍構造解析を実行するためのｘａｎｅｓ解析システム及びその方法
|
|
JP4786533B2
(ja)
*
|
2003-06-17 |
2011-10-05 |
エックス−レイ オプティカル システムズ インコーポレーテッド |
加圧サンプルのｘ線分析のための可動透過性障壁
|
|
JP2007501503A
(ja)
*
|
2003-08-04 |
2007-01-25 |
エックス−レイ オプティカル システムズ インコーポレーテッド |
管電力調節および遠隔較正を使用して出力安定性が向上したｘ線源アセンブリ
|
|
US7092843B2
(en)
*
|
2003-10-21 |
2006-08-15 |
X-Ray Optical Systems, Inc. |
Apparatus and method for suppressing insignificant variations in measured sample composition data, including data measured from dynamically changing samples using x-ray analysis techniques
|
|
US7298817B2
(en)
*
|
2003-12-01 |
2007-11-20 |
X-Ray Optical Systems, Inc. |
Portable and on-line arsenic analyzer for drinking water
|
|
WO2006022333A1
(ja)
|
2004-08-27 |
2006-03-02 |
Tohoku University |
曲率分布結晶レンズ、曲率分布結晶レンズを有するｘ線装置及び曲率分布結晶レンズの作製方法
|
|
US7120228B2
(en)
*
|
2004-09-21 |
2006-10-10 |
Jordan Valley Applied Radiation Ltd. |
Combined X-ray reflectometer and diffractometer
|
|
US7076024B2
(en)
*
|
2004-12-01 |
2006-07-11 |
Jordan Valley Applied Radiation, Ltd. |
X-ray apparatus with dual monochromators
|
|
JP2006308487A
(ja)
*
|
2005-04-28 |
2006-11-09 |
Canon Inc |
多層膜反射鏡、該多層膜反射鏡の再利用方法、及びこれらの多層膜反射鏡による露光装置
|
|
US7415096B2
(en)
*
|
2005-07-26 |
2008-08-19 |
Jordan Valley Semiconductors Ltd. |
Curved X-ray reflector
|
|
WO2007016484A2
(en)
*
|
2005-08-01 |
2007-02-08 |
The Research Foundation Of State University Of New York |
X-ray imaging systems employing point-focusing, curved monochromating optics
|
|
US7991116B2
(en)
*
|
2005-08-04 |
2011-08-02 |
X-Ray Optical Systems, Inc. |
Monochromatic x-ray micro beam for trace element mapping
|
|
US7317784B2
(en)
*
|
2006-01-19 |
2008-01-08 |
Broker Axs, Inc. |
Multiple wavelength X-ray source
|
|
JP4997815B2
(ja)
*
|
2006-04-12 |
2012-08-08 |
旭硝子株式会社 |
高平坦かつ高平滑なガラス基板の作製方法
|
|
JP2007285791A
(ja)
*
|
2006-04-14 |
2007-11-01 |
Rigaku Industrial Co |
湾曲ｘ線分光素子の製造方法ならびその湾曲ｘ線分光素子およびそれを用いるｘ線分析装置
|
|
JP5315251B2
(ja)
*
|
2006-11-16 |
2013-10-16 |
エックス−レイ オプティカル システムズ インコーポレーテッド |
それぞれの結晶方位を持つ多層を有するｘ線集束光学系及びこの光学系を形成する方法
|
|
US7440541B2
(en)
*
|
2006-12-27 |
2008-10-21 |
Innov-X-Systems, Inc. |
Dual source XRF system
|
|
JP2008175755A
(ja)
*
|
2007-01-22 |
2008-07-31 |
Institute X-Ray Technologies Co Ltd |
分光結晶およびその製造方法
|
|
JPWO2008090988A1
(ja)
|
2007-01-25 |
2010-05-20 |
株式会社ニコン |
光学素子、これを用いた露光装置、及びデバイス製造方法
|
|
CN101883980B
(zh)
*
|
2007-03-15 |
2013-06-12 |
X射线光学系统公司 |
用于确定样品价态的x射线荧光方法
|
|
EP2075569B1
(en)
*
|
2007-12-31 |
2012-02-15 |
Xenocs S.A. |
X-ray beam device
|
|
US8050382B2
(en)
*
|
2008-02-25 |
2011-11-01 |
X-Ray Optical Systems, Inc. |
Sample module with sample stream spaced from window, for x-ray analysis system
|
|
US8559597B2
(en)
*
|
2008-03-05 |
2013-10-15 |
X-Ray Optical Systems, Inc. |
XRF system having multiple excitation energy bands in highly aligned package
|
|
US7738630B2
(en)
*
|
2008-03-05 |
2010-06-15 |
X-Ray Optical Systems, Inc. |
Highly aligned x-ray optic and source assembly for precision x-ray analysis applications
|
|
US7590220B1
(en)
*
|
2008-03-10 |
2009-09-15 |
General Electric Company |
X-ray inspection and detection system and method
|
|
JP5531009B2
(ja)
*
|
2008-04-11 |
2014-06-25 |
リガク イノベイティブ テクノロジーズ インコーポレイテッド |
ポリキャピラリ光学系を有するｘ線発生装置
|
|
JP5344123B2
(ja)
*
|
2008-07-18 |
2013-11-20 |
独立行政法人 宇宙航空研究開発機構 |
Ｘ線反射体、ｘ線反射装置およびｘ線反射鏡作成方法
|
|
US8058621B2
(en)
*
|
2009-10-26 |
2011-11-15 |
General Electric Company |
Elemental composition detection system and method
|
|
JP5538840B2
(ja)
*
|
2009-11-30 |
2014-07-02 |
キヤノン株式会社 |
Ｘ線モノクロメータ、その製造方法及びｘ線分光装置
|
|
DK2606490T3
(en)
*
|
2010-08-19 |
2018-10-15 |
Convergent R N R Ltd |
X-ray irradiation of the target volume
|
|
US9063066B2
(en)
*
|
2010-10-14 |
2015-06-23 |
Xrpro Sciences, Inc. |
Method for analysis using X-ray fluorescence
|
|
EP2695864B1
(en)
*
|
2011-04-01 |
2019-07-03 |
AGC Inc. |
Laminated glass and process for producing same
|
|
US8557149B2
(en)
*
|
2011-04-08 |
2013-10-15 |
Uchicago Argonne, Llc |
System and method for implementing enhanced optics fabrication
|
|
CN110006936A
(zh)
*
|
2011-06-20 |
2019-07-12 |
X射线光学系统公司 |
原油和重质燃料中污染物的在线监控及其精炼厂应用
|
|
WO2013033572A2
(en)
*
|
2011-09-01 |
2013-03-07 |
Spectramet, Llc |
Material sorting technology
|
|
US9240254B2
(en)
*
|
2011-09-27 |
2016-01-19 |
Revera, Incorporated |
System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy
|
|
WO2013052556A2
(en)
*
|
2011-10-06 |
2013-04-11 |
X-Ray Optical Systems, Inc. |
Mobile transport and shielding apparatus for removable x-ray analyzer
|
|
EP2814573B1
(en)
*
|
2012-02-13 |
2018-03-21 |
Convergent R.N.R Ltd |
Imaging-guided delivery of x-ray radiation
|
|
US9449780B2
(en)
*
|
2012-02-28 |
2016-09-20 |
X-Ray Optical Systems, Inc. |
X-ray analyzer having multiple excitation energy bands produced using multi-material x-ray tube anodes and monochromating optics
|
|
JP5538637B2
(ja)
*
|
2012-03-30 |
2014-07-02 |
Ｈｏｙａ株式会社 |
マスクブランク用基板、多層反射膜付き基板、透過型マスクブランク、反射型マスクブランク、透過型マスク、反射型マスク及び半導体装置の製造方法
|
|
JP6206901B2
(ja)
*
|
2012-12-14 |
2017-10-04 |
大学共同利用機関法人 高エネルギー加速器研究機構 |
散乱強度分布の測定方法及び測定装置
|
|
CN103057122A
(zh)
*
|
2012-12-19 |
2013-04-24 |
青岛宙庆工业设计有限公司 |
一种制备双曲面亚克力玻璃的方法
|
|
US9740091B2
(en)
*
|
2013-07-22 |
2017-08-22 |
Hoya Corporation |
Substrate with multilayer reflective film, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method of manufacturing the same, and method of manufacturing a semiconductor device
|
|
KR20170120212A
(ko)
*
|
2013-09-18 |
2017-10-30 |
호야 가부시키가이샤 |
반사형 마스크 블랭크 및 그 제조방법, 반사형 마스크 그리고 반도체 장치의 제조방법
|
|
SG10201805079YA
(en)
*
|
2013-09-27 |
2018-07-30 |
Hoya Corp |
Conductive film coated substrate, multilayer reflectivefilm coated substrate, reflective mask blank, reflectivemask, and semiconductor device manufacturing method
|
|
US9551677B2
(en)
*
|
2014-01-21 |
2017-01-24 |
Bruker Jv Israel Ltd. |
Angle calibration for grazing-incidence X-ray fluorescence (GIXRF)
|
|
US9666322B2
(en)
*
|
2014-02-23 |
2017-05-30 |
Bruker Jv Israel Ltd |
X-ray source assembly
|
|
US9823203B2
(en)
*
|
2014-02-28 |
2017-11-21 |
Sigray, Inc. |
X-ray surface analysis and measurement apparatus
|
|
US9594036B2
(en)
*
|
2014-02-28 |
2017-03-14 |
Sigray, Inc. |
X-ray surface analysis and measurement apparatus
|
|
TWI650607B
(zh)
*
|
2014-10-21 |
2019-02-11 |
日商Ａｇｃ股份有限公司 |
Euvl用附反射層之基板及其製造方法、以及euvl用反射型光罩基底及euvl用反射型光罩
|
|
JP6069609B2
(ja)
*
|
2015-03-26 |
2017-02-01 |
株式会社リガク |
二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法
|