JP2016171571A - 弾性波素子、アンテナデュプレクサ及び電子機器 - Google Patents
弾性波素子、アンテナデュプレクサ及び電子機器 Download PDFInfo
- Publication number
- JP2016171571A JP2016171571A JP2016048065A JP2016048065A JP2016171571A JP 2016171571 A JP2016171571 A JP 2016171571A JP 2016048065 A JP2016048065 A JP 2016048065A JP 2016048065 A JP2016048065 A JP 2016048065A JP 2016171571 A JP2016171571 A JP 2016171571A
- Authority
- JP
- Japan
- Prior art keywords
- acoustic wave
- electrode
- thickness
- wave device
- idt electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000010936 titanium Substances 0.000 claims abstract description 24
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims abstract description 20
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 46
- 235000012239 silicon dioxide Nutrition 0.000 claims description 23
- 239000000377 silicon dioxide Substances 0.000 claims description 23
- 238000004891 communication Methods 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 229910052721 tungsten Inorganic materials 0.000 claims description 9
- 239000010937 tungsten Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 8
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 8
- 230000008878 coupling Effects 0.000 description 7
- 238000010168 coupling process Methods 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 230000005284 excitation Effects 0.000 description 5
- 238000001914 filtration Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 238000004590 computer program Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000010295 mobile communication Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
- H01P1/201—Filters for transverse electromagnetic waves
- H01P1/205—Comb or interdigital filters; Cascaded coaxial cavities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
- H01P1/213—Frequency-selective devices, e.g. filters combining or separating two or more different frequencies
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/0222—Details of interface-acoustic, boundary, pseudo-acoustic or Stonely wave devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02834—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
- H03H9/14538—Formation
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6489—Compensation of undesirable effects
- H03H9/6496—Reducing ripple in transfer characteristic
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
- H03H9/725—Duplexers
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Electromagnetism (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562132046P | 2015-03-12 | 2015-03-12 | |
| US62/132,046 | 2015-03-12 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019217819A Division JP7005579B2 (ja) | 2015-03-12 | 2019-12-02 | 弾性波素子、アンテナデュプレクサ、ダイプレクサ及び通信機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016171571A true JP2016171571A (ja) | 2016-09-23 |
| JP2016171571A5 JP2016171571A5 (enExample) | 2019-03-28 |
Family
ID=55524240
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016048065A Pending JP2016171571A (ja) | 2015-03-12 | 2016-03-11 | 弾性波素子、アンテナデュプレクサ及び電子機器 |
| JP2019217819A Active JP7005579B2 (ja) | 2015-03-12 | 2019-12-02 | 弾性波素子、アンテナデュプレクサ、ダイプレクサ及び通信機器 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019217819A Active JP7005579B2 (ja) | 2015-03-12 | 2019-12-02 | 弾性波素子、アンテナデュプレクサ、ダイプレクサ及び通信機器 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10097159B2 (enExample) |
| EP (1) | EP3068049B1 (enExample) |
| JP (2) | JP2016171571A (enExample) |
| KR (1) | KR102526570B1 (enExample) |
| CN (1) | CN105978524A (enExample) |
| SG (1) | SG10201601943WA (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11451210B2 (en) | 2018-01-26 | 2022-09-20 | Taiyo Yuden Co., Ltd. | Acoustic wave device, filter, and multiplexer |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10308522B2 (en) | 2016-05-31 | 2019-06-04 | Skyworks Solutions, Inc. | High Q modified barium magnesium tantalate for high frequency applications |
| JPWO2018092470A1 (ja) * | 2016-11-17 | 2019-06-24 | 株式会社村田製作所 | 弾性波装置 |
| WO2018092511A1 (ja) * | 2016-11-18 | 2018-05-24 | 株式会社村田製作所 | 弾性表面波フィルタおよびマルチプレクサ |
| US10483942B2 (en) | 2017-01-24 | 2019-11-19 | Skyworks Solutions, Inc. | Acoustic wave device with acoustically separated multi-channel feedback |
| WO2022153943A1 (ja) * | 2021-01-12 | 2022-07-21 | 株式会社村田製作所 | 弾性波装置 |
| US12431857B2 (en) | 2021-06-30 | 2025-09-30 | Skyworks Solutions, Inc. | Acoustic wave device with acoustic obstruction structure |
| US12500570B2 (en) | 2021-09-29 | 2025-12-16 | Skyworks Solutions, Inc. | Shear horizontal mode acoustic wave device with multilayer interdigital transducer electrode |
| US20230179171A1 (en) | 2021-12-06 | 2023-06-08 | Skyworks Solutions, Inc. | Multi-band surface acoustic wave filters |
| US12494771B2 (en) | 2022-01-26 | 2025-12-09 | Skyworks Solutions, Inc. | Acoustic-wave receive-side filter topologies |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006295976A (ja) * | 2003-10-03 | 2006-10-26 | Murata Mfg Co Ltd | 弾性表面波装置 |
| WO2006114930A1 (ja) * | 2005-04-25 | 2006-11-02 | Murata Manufacturing Co., Ltd. | 弾性境界波装置 |
| WO2015025651A1 (ja) * | 2013-08-21 | 2015-02-26 | 株式会社村田製作所 | チューナブルフィルタ |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002176333A (ja) * | 2000-12-07 | 2002-06-21 | Fujitsu Media Device Kk | 弾性表面波フィルタ |
| JP4127170B2 (ja) * | 2003-01-07 | 2008-07-30 | 株式会社村田製作所 | 表面波装置 |
| EP1696562A4 (en) | 2003-12-16 | 2010-07-07 | Murata Manufacturing Co | ACOUSTIC LIMIT WAVE DEVICE |
| CN101964642A (zh) * | 2004-01-13 | 2011-02-02 | 株式会社村田制作所 | 边界声波装置 |
| DE112008001500B8 (de) * | 2007-06-06 | 2016-06-16 | Murata Manufacturing Co., Ltd. | Oberflächenschallwellenvorrichtung |
| JP5355958B2 (ja) | 2008-07-31 | 2013-11-27 | 太陽誘電株式会社 | フィルタ、分波器および通信機器 |
| WO2010137279A1 (ja) | 2009-05-27 | 2010-12-02 | パナソニック株式会社 | 弾性波共振器と、これを用いたアンテナ共用器 |
| JP2011041127A (ja) * | 2009-08-17 | 2011-02-24 | Hitachi Media Electoronics Co Ltd | 弾性波装置 |
| JPWO2011158445A1 (ja) * | 2010-06-17 | 2013-08-19 | パナソニック株式会社 | 弾性波素子 |
| JP2012060419A (ja) * | 2010-09-09 | 2012-03-22 | Seiko Epson Corp | 弾性表面波デバイス、電子機器及びセンサー装置 |
| JP2012227626A (ja) | 2011-04-15 | 2012-11-15 | Panasonic Corp | 弾性表面波素子 |
| JP5797979B2 (ja) * | 2011-08-31 | 2015-10-21 | 太陽誘電株式会社 | 弾性波デバイス |
| CN103891139B (zh) * | 2011-10-24 | 2016-08-24 | 株式会社村田制作所 | 弹性表面波装置 |
| JP5704263B2 (ja) | 2012-02-06 | 2015-04-22 | 株式会社村田製作所 | フィルタ装置 |
-
2016
- 2016-03-10 EP EP16159654.9A patent/EP3068049B1/en active Active
- 2016-03-11 JP JP2016048065A patent/JP2016171571A/ja active Pending
- 2016-03-11 CN CN201610137318.3A patent/CN105978524A/zh active Pending
- 2016-03-11 US US15/067,304 patent/US10097159B2/en active Active
- 2016-03-11 KR KR1020160029454A patent/KR102526570B1/ko active Active
- 2016-03-14 SG SG10201601943WA patent/SG10201601943WA/en unknown
-
2019
- 2019-12-02 JP JP2019217819A patent/JP7005579B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006295976A (ja) * | 2003-10-03 | 2006-10-26 | Murata Mfg Co Ltd | 弾性表面波装置 |
| WO2006114930A1 (ja) * | 2005-04-25 | 2006-11-02 | Murata Manufacturing Co., Ltd. | 弾性境界波装置 |
| WO2015025651A1 (ja) * | 2013-08-21 | 2015-02-26 | 株式会社村田製作所 | チューナブルフィルタ |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11451210B2 (en) | 2018-01-26 | 2022-09-20 | Taiyo Yuden Co., Ltd. | Acoustic wave device, filter, and multiplexer |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102526570B1 (ko) | 2023-04-26 |
| JP7005579B2 (ja) | 2022-02-04 |
| US20160268997A1 (en) | 2016-09-15 |
| EP3068049A3 (en) | 2016-11-30 |
| US10097159B2 (en) | 2018-10-09 |
| CN105978524A (zh) | 2016-09-28 |
| JP2020061742A (ja) | 2020-04-16 |
| EP3068049A2 (en) | 2016-09-14 |
| SG10201601943WA (en) | 2016-10-28 |
| KR20160110243A (ko) | 2016-09-21 |
| EP3068049B1 (en) | 2018-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7005579B2 (ja) | 弾性波素子、アンテナデュプレクサ、ダイプレクサ及び通信機器 | |
| US9641151B2 (en) | Elastic wave filters and duplexers using same | |
| WO2016017104A1 (en) | Acoustic wave filters and duplexers using same | |
| US10305445B2 (en) | Elastic wave resonators and filters | |
| US11990892B2 (en) | Acoustic wave device with transverse spurious mode suppression | |
| Lam | A review of the timing and filtering technologies in smartphones | |
| US20170033765A1 (en) | Acoustic wave device and module | |
| JP2017220929A (ja) | ラム波によるスプリアスが低減された分波器 | |
| CN101729039A (zh) | 弹性波滤波器、双工器、通信模块和通信装置 | |
| US20230104500A1 (en) | Stacked acoustic wave devices with solid acoustic mirror therebetween | |
| US20230111476A1 (en) | Stacked acoustic wave device assembly | |
| US10069477B2 (en) | Surface acoustic wave device and filter | |
| US20160226464A1 (en) | Acoustic wave elements, and duplexers and electronic devices using same | |
| HK1227184A1 (en) | Acoustic wave elements, antenna duplexers and electronic devices | |
| JP2017522822A (ja) | 弾性波素子、アンテナデュプレクサ、モジュール及びこれらを使用する電子機器 | |
| US20250112613A1 (en) | Scattering elements for coupling prevention with electroacoustic resonators | |
| HK1235557A1 (en) | Acoustic wave filters and duplexers using same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190213 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190213 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20190213 |
|
| A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20190305 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20190508 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20190705 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20190903 |