JP2017220929A - ラム波によるスプリアスが低減された分波器 - Google Patents
ラム波によるスプリアスが低減された分波器 Download PDFInfo
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- 235000019687 Lamb Nutrition 0.000 title description 15
- 239000000758 substrate Substances 0.000 claims abstract description 60
- 238000010897 surface acoustic wave method Methods 0.000 claims description 97
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 28
- 235000012239 silicon dioxide Nutrition 0.000 claims description 14
- 239000000377 silicon dioxide Substances 0.000 claims description 14
- 238000004806 packaging method and process Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 6
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims description 4
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 4
- 230000009977 dual effect Effects 0.000 claims description 3
- 229910000679 solder Inorganic materials 0.000 claims description 3
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- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6489—Compensation of undesirable effects
- H03H9/6496—Reducing ripple in transfer characteristic
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02866—Means for compensation or elimination of undesirable effects of bulk wave excitation and reflections
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6403—Programmable filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
- H03H9/6423—Means for obtaining a particular transfer characteristic
- H03H9/6433—Coupled resonator filters
- H03H9/6483—Ladder SAW filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
- H03H9/725—Duplexers
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Abstract
【解決手段】分波器200は、共通接点201と第1信号接点202の間に接続されて第1通過帯域を有する第1フィルタ210と、共通接点と第2信号接点203の間に接続されて第2通過帯域を有する第2フィルタ220とを含む。第2通過帯域の中心周波数は、第1通過帯域の中心周波数の1.2から1.4倍の範囲にある。第1フィルタは、圧電基板上に形成されたSAWフィルタ214と、圧電基板上に形成されて共通接点及びSAWフィルタ間に直列接続されたSAW共振器212と、SAWフィルタ及びSAW共振器を覆う誘電膜とを含む。誘電膜は、SAW共振器に対応する領域に低減された膜厚を有する。
【選択図】図3
Description
Claims (22)
- 分波器であって、
共通接点、第1信号接点及び第2信号接点と、
前記共通接点及び前記第1信号接点間に接続されて第1通過帯域を有する第1フィルタと、
前記共通接点及び前記第2信号接点間に接続されて前記第1通過帯域とは異なる第2通過帯域を有する第2フィルタと
を含み、
前記第1フィルタは、
第1圧電基板と、
前記第1圧電基板の一表面上に形成された弾性表面波(SAW)フィルタと、
前記第1圧電基板の前記一表面上に形成されて前記共通接点及び前記SAWフィルタ間に直列接続されたSAW共振器と、
前記圧電基板の前記一表面にわたって形成されて前記SAWフィルタ及びSAW共振器を覆う誘電膜と
を含み、
前記誘電膜は、前記SAWフィルタに対応する第1領域に第1厚さを有し、前記SAW共振器に対応する第2領域に第2厚さを有し、
前記第1厚さは前記第2厚さよりも大きく、
前記第2通過帯域の中心周波数は、前記第1通過帯域の中心周波数の1.2から1.4倍の範囲にある分波器。 - 前記SAW共振器及び前記SAWフィルタは一緒になって第1ラダー型フィルタを形成し、
前記SAWフィルタは、グランド接点に接続された少なくとも一つの並列共振器を含む請求項1の分波器。 - 前記SAWフィルタは二重モード型SAWフィルタである請求項1の分波器。
- 前記第2通過帯域の中心周波数は、前記第1通過帯域の中心周波数の1.25から1.3倍の範囲にある請求項1の分波器。
- 前記誘電膜は二酸化ケイ素からなる請求項1の分波器。
- 前記SAW共振器に対応する前記第2領域における前記誘電膜の第2厚さは、前記第1フィルタにおいて励振される弾性表面波の波長で規格化した場合に26%よりも小さくなるように構成される請求項1の分波器。
- 前記SAWフィルタに対応する前記第1領域の前記誘電膜の第1厚さは、前記第1フィルタにおいて励振される弾性表面波の波長で規格化した場合に29%よりも大きくなるように構成される請求項6の分波器。
- 前記誘電膜の第1厚さと第2厚さとの差は、前記第1フィルタにおいて励振される弾性表面波の波長で規格化した場合に3%よりも大きくなるように構成される請求項6の分波器。
- 前記SAWフィルタに対応する前記第1領域における前記誘電膜の第1厚さは、前記第1フィルタにおいて励振される弾性表面波の波長で規格化した場合に29%よりも大きくなるように構成される請求項1の分波器。
- 前記誘電膜の第1厚さと第2厚さとの差は、前記第1フィルタにおいて励振される弾性表面波の波長で規格化した場合に3%よりも大きくなるように構成される請求項1の分波器。
- 前記第2フィルタは、前記第1圧電基板に配置された複数の弾性波素子を含む請求項1の分波器。
- 前記第2フィルタは第2圧電基板を含む請求項1の分波器。
- 前記第2フィルタは、前記第2圧電基板に配置された複数の弾性波素子を含む請求項12の分波器。
- 前記第1圧電基板は第1材料からなり、
前記第2圧電基板は前記第1材料とは異なる第2材料からなる請求項12の分波器。 - 前記第1圧電基板はニオブ酸リチウムからなる請求項1の分波器。
- 前記第1圧電基板はタンタル酸リチウムからなる請求項1の分波器。
- 請求項1〜16のいずれか一項の分波器を含むモジュール。
- 分波モジュールであって、
パッケージング基板と、
前記パッケージング基板上に配置されて共通接点、第1信号接点及び第2信号接点を有するフィルタダイと、
前記パッケージング基板上に配置された複数の接続パッドと
を含み、
前記フィルタダイは、前記共通接点及び前記第1信号接点間に接続されて第1通過帯域を有する第1フィルタを含み、
前記第1フィルタは、
圧電基板と、
前記圧電基板の一表面上に形成された弾性表面波(SAW)フィルタと、
前記圧電基板の前記一表面上に形成されて前記共通接点及び前記SAWフィルタ間に直列接続されたSAW共振器と、
前記圧電基板の前記一表面にわたって形成されて前記SAWフィルタ及びSAW共振器を覆う誘電膜と
を含み、
前記誘電膜は、前記SAWフィルタに対応する第1領域に第1厚さを有し、前記SAW共振器に対応する第2領域に第2厚さを有し、
前記第1厚さは前記第2厚さよりも大きく、
前記フィルタダイはさらに、前記共通接点及び前記第2信号接点間に接続されて前記第1通過帯域とは異なる第2通過帯域を有する第2フィルタを含み、
前記第2通過帯域の中心周波数は、前記第1通過帯域の中心周波数の1.2から1.4倍の範囲にあり、
前記フィルタダイの前記共通接点、前記第1信号接点及び前記第2信号接点は、前記複数の接続パッドの対応するそれぞれに電気コネクタによって接続される分波モジュール。 - 前記第2通過帯域の中心周波数は、前記第1通過帯域の中心周波数の1.25から1.3倍の範囲にある請求項18の分波モジュール。
- 前記誘電膜は二酸化ケイ素からなる請求項18の分波モジュール。
- 前記電気コネクタはワイヤボンドである請求項18の分波モジュール。
- 前記電気コネクタは半田バンプである請求項18の分波モジュール。
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US201762503557P | 2017-05-09 | 2017-05-09 | |
US62/503,557 | 2017-05-09 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019216422A (ja) * | 2018-06-13 | 2019-12-19 | スカイワークス ソリューションズ, インコーポレイテッドSkyworks Solutions, Inc. | ニオブ酸リチウムフィルタにおいて高速度層を付加することによるスプリアスシアホリゾンタルモードの周波数制御 |
WO2023085189A1 (ja) * | 2021-11-09 | 2023-05-19 | 株式会社村田製作所 | フィルタ装置 |
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US10187039B2 (en) | 2019-01-22 |
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