JP2016139134A - 感光性樹脂組成物、その感光性樹脂組成物から形成された硬化膜、及びその硬化膜を備えた画像表示装置 - Google Patents

感光性樹脂組成物、その感光性樹脂組成物から形成された硬化膜、及びその硬化膜を備えた画像表示装置 Download PDF

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Publication number
JP2016139134A
JP2016139134A JP2016010680A JP2016010680A JP2016139134A JP 2016139134 A JP2016139134 A JP 2016139134A JP 2016010680 A JP2016010680 A JP 2016010680A JP 2016010680 A JP2016010680 A JP 2016010680A JP 2016139134 A JP2016139134 A JP 2016139134A
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JP
Japan
Prior art keywords
resin composition
photosensitive resin
meth
compound
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2016010680A
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English (en)
Japanese (ja)
Inventor
庸桓 趙
Yokan Cho
庸桓 趙
菩恩 安
Bo-Eun Ahn
菩恩 安
漢雨 朴
Hanwoo Park
漢雨 朴
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Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of JP2016139134A publication Critical patent/JP2016139134A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2016010680A 2015-01-26 2016-01-22 感光性樹脂組成物、その感光性樹脂組成物から形成された硬化膜、及びその硬化膜を備えた画像表示装置 Pending JP2016139134A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020150012009A KR20160091648A (ko) 2015-01-26 2015-01-26 감광성 수지 조성물, 이로부터 형성된 경화막 및 이를 포함하는 화상 표시 장치
KR10-2015-0012009 2015-01-26

Publications (1)

Publication Number Publication Date
JP2016139134A true JP2016139134A (ja) 2016-08-04

Family

ID=56514682

Family Applications (1)

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JP2016010680A Pending JP2016139134A (ja) 2015-01-26 2016-01-22 感光性樹脂組成物、その感光性樹脂組成物から形成された硬化膜、及びその硬化膜を備えた画像表示装置

Country Status (4)

Country Link
JP (1) JP2016139134A (zh)
KR (1) KR20160091648A (zh)
CN (1) CN105824193B (zh)
TW (1) TW201627761A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110119068A (zh) * 2018-02-06 2019-08-13 东友精细化工有限公司 正型感光性树脂组合物、绝缘膜及图像显示装置

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101897937B1 (ko) * 2017-01-20 2018-09-12 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스, 컬럼 스페이서 또는 블랙 컬럼 스페이서를 포함하는 컬러필터, 및 상기 컬러필터를 포함하는 표시장치
TWI741223B (zh) * 2017-10-20 2021-10-01 南韓商東友精細化工有限公司 著色分散液、含該著色分散液之著色感光性樹脂組合物、使用該組合物製造之圖案層、含該圖案層之彩色濾光片、及含該彩色濾光片之顯示裝置
KR20190087173A (ko) * 2018-01-16 2019-07-24 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
CN110531583B (zh) * 2019-09-14 2023-09-29 浙江福斯特新材料研究院有限公司 感光性树脂组合物、干膜抗蚀层

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5944615B2 (ja) 1976-02-16 1984-10-31 富士写真フイルム株式会社 感光性樹脂組成物及びそれを用いた金属画像形成材料
JP2008276192A (ja) * 2007-03-30 2008-11-13 Fujifilm Corp 着色パターン形成用組成物、着色パターン形成方法、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
JP4726868B2 (ja) * 2007-08-01 2011-07-20 株式会社Ａｄｅｋａ アルカリ現像性感光性樹脂組成物
JP2010256887A (ja) * 2009-03-31 2010-11-11 Fujifilm Corp 感光性着色組成物、カラーフィルタ及びその製造方法、並びに液晶表示装置
CN111217946B (zh) * 2013-03-29 2022-12-06 东京应化工业株式会社 包含含有乙烯基的化合物的组合物
KR101391224B1 (ko) * 2013-05-28 2014-05-02 동우 화인켐 주식회사 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110119068A (zh) * 2018-02-06 2019-08-13 东友精细化工有限公司 正型感光性树脂组合物、绝缘膜及图像显示装置
CN110119068B (zh) * 2018-02-06 2023-03-24 东友精细化工有限公司 正型感光性树脂组合物、绝缘膜及图像显示装置

Also Published As

Publication number Publication date
KR20160091648A (ko) 2016-08-03
CN105824193B (zh) 2019-10-25
TW201627761A (zh) 2016-08-01
CN105824193A (zh) 2016-08-03

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