JP2016128902A5 - - Google Patents
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- JP2016128902A5 JP2016128902A5 JP2015245014A JP2015245014A JP2016128902A5 JP 2016128902 A5 JP2016128902 A5 JP 2016128902A5 JP 2015245014 A JP2015245014 A JP 2015245014A JP 2015245014 A JP2015245014 A JP 2015245014A JP 2016128902 A5 JP2016128902 A5 JP 2016128902A5
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- aromatic
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- benzo
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462099095P | 2014-12-31 | 2014-12-31 | |
| US62/099,095 | 2014-12-31 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016128902A JP2016128902A (ja) | 2016-07-14 |
| JP2016128902A5 true JP2016128902A5 (OSRAM) | 2017-02-23 |
| JP6261091B2 JP6261091B2 (ja) | 2018-01-17 |
Family
ID=56163998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015245014A Active JP6261091B2 (ja) | 2014-12-31 | 2015-12-16 | フォトレジストパターントリミング組成物及び方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9696629B2 (OSRAM) |
| JP (1) | JP6261091B2 (OSRAM) |
| KR (1) | KR101790056B1 (OSRAM) |
| CN (1) | CN105739242B (OSRAM) |
| TW (1) | TWI617611B (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9455177B1 (en) * | 2015-08-31 | 2016-09-27 | Dow Global Technologies Llc | Contact hole formation methods |
| TWI628159B (zh) | 2015-10-31 | 2018-07-01 | 羅門哈斯電子材料有限公司 | 熱酸產生劑以及光阻劑圖案修整組合物及方法 |
| TWI615383B (zh) | 2015-10-31 | 2018-02-21 | 羅門哈斯電子材料有限公司 | 熱酸產生劑以及光阻劑圖案修整組合物及方法 |
| US9760011B1 (en) | 2016-03-07 | 2017-09-12 | Rohm And Haas Electronic Materials Llc | Pattern trimming compositions and methods |
| US9869933B2 (en) | 2016-03-07 | 2018-01-16 | Rohm And Haas Electronic Materials Llc | Pattern trimming methods |
| JP6556673B2 (ja) * | 2016-07-26 | 2019-08-07 | Hoya株式会社 | フォトマスクの製造方法、描画装置、表示装置の製造方法、フォトマスク基板の検査方法、及びフォトマスク基板の検査装置 |
| US9910355B2 (en) * | 2016-07-29 | 2018-03-06 | Rohm And Haas Electronic Materials Llc | Method of negative tone development using a copolymer multilayer electrolyte and articles made therefrom |
| US10133179B2 (en) * | 2016-07-29 | 2018-11-20 | Rohm And Haas Electronic Materials Llc | Pattern treatment methods |
| US10241411B2 (en) * | 2016-10-31 | 2019-03-26 | Rohm And Haas Electronic Materials Llc | Topcoat compositions containing fluorinated thermal acid generators |
| US10684549B2 (en) * | 2016-12-31 | 2020-06-16 | Rohm And Haas Electronic Materials Llc | Pattern-formation methods |
| US9799534B1 (en) | 2017-01-04 | 2017-10-24 | International Business Machines Corporation | Application of titanium-oxide as a patterning hardmask |
| US11003074B2 (en) | 2017-05-01 | 2021-05-11 | Rohm And Haas Electronic Materials Llc | Pattern formation methods and photoresist pattern overcoat compositions |
| TWI884927B (zh) * | 2018-10-17 | 2025-06-01 | 美商英培雅股份有限公司 | 圖案化有機金屬光阻及圖案化的方法 |
| CN109503434B (zh) * | 2018-11-16 | 2021-08-06 | 山东第一医科大学(山东省医学科学院) | 一种聚酯ptt的改性剂间苯二甲酸二丙二醇酯-5-磺酸钠的多组分催化合成方法 |
| WO2020210660A1 (en) | 2019-04-12 | 2020-10-15 | Inpria Corporation | Organometallic photoresist developer compositions and processing methods |
| US11754927B2 (en) | 2019-05-31 | 2023-09-12 | Rohm And Haas Electronic Materials Llc | Photoresist pattern trimming compositions and pattern formation methods |
| US11506981B2 (en) | 2019-05-31 | 2022-11-22 | Rohm And Haas Electronic Materials Llc | Photoresist pattern trimming compositions and pattern formation methods |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6180320B1 (en) | 1998-03-09 | 2001-01-30 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing a semiconductor device having a fine pattern, and semiconductor device manufactured thereby |
| JP2001215734A (ja) * | 2000-02-04 | 2001-08-10 | Tokyo Ohka Kogyo Co Ltd | レジストパターンの表面欠陥減少方法及びそれに用いる表面欠陥減少用処理液 |
| JP4329216B2 (ja) | 2000-03-31 | 2009-09-09 | Ｊｓｒ株式会社 | レジストパターン縮小化材料及びそれを使用する微細レジストパターンの形成方法 |
| US6492075B1 (en) | 2000-06-16 | 2002-12-10 | Advanced Micro Devices, Inc. | Chemical trim process |
| JP2002006512A (ja) | 2000-06-20 | 2002-01-09 | Mitsubishi Electric Corp | 微細パターン形成方法、微細パターン形成用材料、およびこの微細パターン形成方法を用いた半導体装置の製造方法 |
| JP2002299202A (ja) | 2001-03-29 | 2002-10-11 | Sony Corp | 半導体装置の製造方法 |
| US6869899B2 (en) | 2001-07-12 | 2005-03-22 | International Business Machines Corporation | Lateral-only photoresist trimming for sub-80 nm gate stack |
| JP3953822B2 (ja) | 2002-01-25 | 2007-08-08 | 富士通株式会社 | レジストパターン薄肉化材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法 |
| JP3743753B2 (ja) * | 2002-03-20 | 2006-02-08 | 竹本油脂株式会社 | ペルフルオロアルキルナフタレンスルホン酸塩、その製造方法、分散剤及び合成高分子用帯電防止剤 |
| US6916594B2 (en) * | 2002-12-30 | 2005-07-12 | Hynix Semiconductor Inc. | Overcoating composition for photoresist and method for forming photoresist pattern using the same |
| CN1288719C (zh) | 2003-03-10 | 2006-12-06 | 联华电子股份有限公司 | 图案光刻胶的微缩制造过程 |
| US7862982B2 (en) | 2008-06-12 | 2011-01-04 | International Business Machines Corporation | Chemical trim of photoresist lines by means of a tuned overcoat material |
| JP6155025B2 (ja) | 2011-12-31 | 2017-06-28 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | フォトレジストパターントリミング方法 |
| TWI481969B (zh) * | 2011-12-31 | 2015-04-21 | 羅門哈斯電子材料有限公司 | 光阻劑圖案修整方法 |
| JP5776615B2 (ja) * | 2012-04-11 | 2015-09-09 | 信越化学工業株式会社 | パターン形成方法 |
| JP6328931B2 (ja) * | 2012-12-31 | 2018-05-23 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | フォトレジストパターントリミング方法 |
| KR102346806B1 (ko) * | 2013-12-30 | 2022-01-04 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 포토레지스트 패턴 트리밍 조성물 및 방법 |
-
2015
- 2015-12-14 TW TW104141987A patent/TWI617611B/zh active
- 2015-12-16 JP JP2015245014A patent/JP6261091B2/ja active Active
- 2015-12-16 US US14/971,087 patent/US9696629B2/en active Active
- 2015-12-25 CN CN201510994176.8A patent/CN105739242B/zh active Active
- 2015-12-28 KR KR1020150187119A patent/KR101790056B1/ko active Active
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