JP2016105077A5 - - Google Patents

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JP2016105077A5
JP2016105077A5 JP2015215353A JP2015215353A JP2016105077A5 JP 2016105077 A5 JP2016105077 A5 JP 2016105077A5 JP 2015215353 A JP2015215353 A JP 2015215353A JP 2015215353 A JP2015215353 A JP 2015215353A JP 2016105077 A5 JP2016105077 A5 JP 2016105077A5
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Japan
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probe
sample
charged particle
workpiece
particle beam
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JP2015215353A
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Japanese (ja)
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JP2016105077A (ja
JP6552383B2 (ja
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JP2015215353A 2014-11-07 2015-11-01 自動化されたｔｅｍ試料調製 Active JP6552383B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462077148P 2014-11-07 2014-11-07
US62/077,148 2014-11-07

Publications (3)

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JP2016105077A JP2016105077A (ja) 2016-06-09
JP2016105077A5 true JP2016105077A5 (OSRAM) 2018-12-13
JP6552383B2 JP6552383B2 (ja) 2019-07-31

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JP2015215353A Active JP6552383B2 (ja) 2014-11-07 2015-11-01 自動化されたｔｅｍ試料調製

Country Status (5)

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US (3) US9601313B2 (OSRAM)
EP (1) EP3018693B1 (OSRAM)
JP (1) JP6552383B2 (OSRAM)
KR (1) KR101970478B1 (OSRAM)
CN (1) CN105588742A (OSRAM)

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JP6552383B2 (ja) * 2014-11-07 2019-07-31 エフ・イ−・アイ・カンパニー 自動化されたｔｅｍ試料調製
US9837246B1 (en) 2016-07-22 2017-12-05 Fei Company Reinforced sample for transmission electron microscope
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JP6885576B2 (ja) * 2017-01-19 2021-06-16 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
DE102017202339B3 (de) 2017-02-14 2018-05-24 Carl Zeiss Microscopy Gmbh Strahlsystem mit geladenen Teilchen und Verfahren dafür
US10303829B2 (en) 2017-05-31 2019-05-28 International Business Machines Corporation Automated method for integrated analysis of back end of the line yield, line resistance/capacitance and process performance
DE102017212020B3 (de) 2017-07-13 2018-05-30 Carl Zeiss Microscopy Gmbh Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe
JP7109051B2 (ja) * 2018-03-30 2022-07-29 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
DE102018108974B3 (de) * 2018-04-16 2019-05-09 Carl Zeiss Microscopy Gmbh Verfahren zum Herstellen einer TEM-Probe
DE102018206278A1 (de) 2018-04-24 2019-10-24 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Entfernen eines Partikels von einer photolithographischen Maske
DE102018210098B4 (de) 2018-06-21 2022-02-03 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zum Untersuchen und/oder zum Bearbeiten einer Probe
DE102018010436B4 (de) 2018-06-21 2025-01-23 Carl Zeiss Smt Gmbh Vorrichtung zum Untersuchen und/oder zum Bearbeiten einer Probe
CN109011030B (zh) * 2018-08-08 2021-02-09 长沙理工大学 自动注射仪器针头的位置检测矫正方法及装置
CN110514679B (zh) * 2019-09-16 2021-04-30 南京大学 一种带有活动拉曼针尖探头的透射电镜原位反应舱芯片及其使用方法
US11355305B2 (en) * 2019-10-08 2022-06-07 Fei Company Low keV ion beam image restoration by machine learning for object localization
CN110554063B (zh) * 2019-10-21 2021-10-12 长江存储科技有限责任公司 一种tem样品以及制备tem样品的方法
CN111537533B (zh) * 2020-03-24 2023-06-30 天津华慧芯科技集团有限公司 一种尖晶石微米颗粒的球差矫正tem样品制备方法
DE102020112220B9 (de) * 2020-05-06 2022-05-25 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät zum Abtragen mindestens eines Materials von einer Materialeinheit und Anordnen des Materials an einem Objekt
GB202013591D0 (en) * 2020-08-28 2020-10-14 Oxford Instr Nanotechnology Ltd Sample preparation and method aparatus
EP4068333A1 (en) * 2021-03-31 2022-10-05 FEI Company Sample carrier for use in a charged particle microscope, and a method of using such a sample carrier in a charged particle microscope
DE102021205001B4 (de) 2021-05-18 2023-07-27 Carl Zeiss Microscopy Gmbh Verfahren zum Positionieren von Objekten in einem Teilchenstrahlmikroskop mithilfe einer flexiblen Teilchenstrahlschranke sowie Computerprogrammprodukt
CN114858828A (zh) * 2022-02-23 2022-08-05 厦门士兰集科微电子有限公司 透射电子显微镜样品的制备方法

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JP6552383B2 (ja) * 2014-11-07 2019-07-31 エフ・イ−・アイ・カンパニー 自動化されたｔｅｍ試料調製

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