JP2016065230A - 薄膜印刷用絶縁性樹脂組成物及び薄膜パターンの製造方法 - Google Patents
薄膜印刷用絶縁性樹脂組成物及び薄膜パターンの製造方法 Download PDFInfo
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- JP2016065230A JP2016065230A JP2015183720A JP2015183720A JP2016065230A JP 2016065230 A JP2016065230 A JP 2016065230A JP 2015183720 A JP2015183720 A JP 2015183720A JP 2015183720 A JP2015183720 A JP 2015183720A JP 2016065230 A JP2016065230 A JP 2016065230A
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- thin film
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- insulating resin
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Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
Description
・ビスフェノール−A−グリシジルエーテルの合成
2000mlのナス型フラスコに、ビスフェノール−A(三井化学株式会社製)148.4g(0.650mol)、50%含水5%−Pd/C−STDタイプ(エヌ・イーケムキャット株式会社製)1.38g(0.650mmol)、トリフェニルホスフィン(北興化学株式会社製)1.639g(6.50mmol)、炭酸カリウム(日本曹達株式会社製)189g(1.37mol)、酢酸アリル(昭和電工株式会社製)143g(1.43mol)、及びイソプロパノール64.1gを入れ、窒素ガス雰囲気中、85℃で8時間反応させた。反応後、一部サンプリングし、酢酸エチルで希釈後、ガスクロマトグラフィーによる分析で、ビスフェノール−A−ジアリルエーテル対モノアリルエーテルの比率が98:2までになっていることを確認した。
表1に示すように、参考例1で合成したビスフェノール−A−グリシジルエーテル5.80g、溶媒としてテルソルブ MTPH(日本テルペン化学(株)製、イソボルニルシクロヘキサノール)44.0g、アエロジル380(日本アエロジル(株)製)1.03g、ノバキュア(登録商標)HX−3722(エポキシ樹脂硬化剤 旭化成イーマテリアル(株)製)1.93gを加え、遊星型真空攪拌装置(ARV−310、シンキー社製)にて最大攪拌速度2000rpmで30分程度混合して、樹脂濃度(表1中の樹脂と硬化剤の総和の樹脂組成物全体に対する割合)が約15質量%の絶縁性樹脂組成物サンプルを調製した。
表1に示すように、参考例1で合成したビスフェノール−A−グリシジルエーテル25.60g、溶媒としてジエチレングリコールモノブチルエーテルアセテート10.3g、アエロジル380(日本アエロジル(株)製)1.33g、ノバキュア(登録商標)HX−3722(エポキシ樹脂硬化剤 旭化成イーマテリアル(株)製)8.53gを加え、実施例1と同様にして混合して絶縁性樹脂組成物サンプルを調製した。
表1に示すように、配合組成を変更した以外は実施例1同様に樹脂濃度(表1中の樹脂と硬化剤の総和の樹脂組成物全体に対する割合)が約20質量%(実施例2)および約10質量%(実施例3)の絶縁性樹脂組成物サンプルを各々調製した。
表1に示すように、配合組成を変更した以外は実施例1同様に樹脂濃度(表1中の樹脂と硬化剤の総和の樹脂組成物全体に対する割合)が約2質量%の絶縁性樹脂組成物サンプルを調製した。
表1に示すように、エポキシ樹脂(ビスフェノール−A−グリシジルエーテル及びノバキュア(登録商標)HX−3722)の代わりにエポキシアクリレート樹脂であるリポキシ(登録商標)SP−1509(昭和電工(株)製)を使用し、樹脂濃度(表1中の樹脂と硬化剤の総和の樹脂組成物全体に対する割合)が約15質量%の絶縁性樹脂組成物サンプルを調製した。
表1に示すように、溶媒組成を変更した以外は実施例3同様に樹脂濃度(表1中の樹脂と硬化剤の総和の樹脂組成物全体に対する割合)が約10質量%の絶縁性樹脂組成物サンプルを各々調製した。
ブルックフィールド社製B型粘度計DV−II+Proを用いて絶縁性樹脂組成物(インク)の粘度を25℃にて測定した。なお、粘度が10000mPa・sを超える場合はロータ番号52を、10000mPa・s以下の場合はロータ番号40を、各々用いて測定した。結果を表2に示す。
スクリーン版としてメッシュカウント640で線径15μmΦ カレンダー加工品のメッシュを用いて、乳剤IC−10000(ムラカミ社製)を用いて膜厚5μmで硬膜処理して作製した2cm角のパターンを有するスクリーン版を用いて印刷した。なお、基材は15cm角のガラス板を用いた。上記の通り調製した絶縁性組成物(インク)を上記スクリーン版を用いて2cm角のパターンを基材表面に印刷した後、予備乾燥をせずに、140℃で60分間熱風乾燥オーブンにて加熱処理して薄膜絶縁パターンを形成した。
日立ハイテク株式会社製 FE−SEM S−5200により3点測定し、その平均値を求めた。結果を表2に示す。
ガラス基板上に1±0.5μmの厚さで形成した上記実施例1〜6の薄膜絶縁パターンの硬化後の碁盤目剥離試験を行った。新しい刃を付けたカッターナイフを用いて1mm間隔で切込みを上記薄膜絶縁パターンに11本入れた後、90°向きを変えてさらに11本引いて100個の1mm角のマス目を形成した。カットした印刷面に付着するようにセロハン粘着テープをはりつけ、セロハン粘着テープ上を消しゴムでこすって塗膜にテープを付着させた。テープを付着させてから1〜2分後にテープの端を持って印刷面に直角に保ち、瞬間的にひきはがして、旧JIS K5400に従って図1に示す基準で判定した。結果を表2に示す。比較例1は厚さが1±0.5μmの薄膜を形成することができなかったので、厚み12μmでの試験結果を参考値として示した。
<鉛筆硬度>
JIS K5600−5−4に従ってガラス基板上に1±0.5μmの厚さで形成した上記実施例1〜6の薄膜絶縁パターンの硬化後の鉛筆硬度を測定した。結果を表2に示す。比較例1は厚さが1±0.5μmの薄膜を形成することができなかったので、厚み12μmでの測定結果を参考値として示した。
Claims (10)
- 絶縁性樹脂及び溶媒を含み、前記溶媒中の、橋かけ環骨格を有する炭化水素基と水酸基とを有する有機化合物の含有率が5〜100質量%であり、前記絶縁性樹脂を3〜30質量%含有し、25℃における粘度が1000〜200000mPa・sであることを特徴とする薄膜印刷用絶縁性樹脂組成物。
- 前記橋かけ環骨格を有する炭化水素基と水酸基とを有する有機化合物が、イソボルニルシクロヘキサノール、トリシクロデカンジメタノールまたはヒドロキシジシクロペンタジエンのいずれかである請求項1に記載の薄膜印刷用絶縁性樹脂組成物。
- ガラス基板上に1±0.5μmの厚さで形成後の薄膜の鉛筆硬度がHまたはそれより硬く、ガラス基板上に1±0.5μmの厚さで薄膜形成後の碁盤目剥離試験の結果、密着性が碁盤目剥離試験で8点以上である、請求項1又は2に記載の薄膜印刷用絶縁性樹脂組成物。
- 前記絶縁性樹脂が、エポキシ樹脂又はエポキシ樹脂と硬化剤との混合物、ブロックイソシアネート系ウレタン樹脂プレポリマー、エポキシアクリレート樹脂、アクリル樹脂、ウレタンアクリレート樹脂、アリル系樹脂、不飽和アルキッド樹脂のいずれかである請求項1から3のいずれか一項に記載の薄膜印刷用絶縁性樹脂組成物。
- 前記エポキシ樹脂の硬化剤がフェノール樹脂、イミダゾール化合物、ジシアンジアミド、酸無水物、ポリアミン化合物のいずれかである請求項4に記載の薄膜印刷用絶縁性樹脂組成物。
- 前記イミダゾール化合物が、カプセル化されたイミダゾール化合物である請求項5に記載の薄膜印刷用絶縁性樹脂組成物。
- 前記エポキシアクリレート樹脂、アクリル樹脂、ウレタンアクリレート樹脂、アリル系樹脂、不飽和アルキッド樹脂が、熱または光ラジカル硬化剤を含む請求項4に記載の薄膜印刷用絶縁性樹脂組成物。
- 前記ブロックイソシアネート系ウレタン樹脂プレポリマーがポリオールを含む請求項4に記載の薄膜印刷用絶縁性樹脂組成物。
- 前記絶縁性樹脂が、アリルエーテルを過酸化水素によりエポキシ化したハロゲンフリーエポキシ樹脂である請求項1から3のいずれか一項に記載の薄膜印刷用絶縁性樹脂組成物。
- 請求項1から請求項9のいずれか一項に記載の薄膜印刷用絶縁性樹脂組成物により、基板上に任意の形状のパターンをスクリーン印刷する工程と、
前記パターンに300℃以下の加熱処理及び/又はパターンに光を照射する工程と、
を有することを特徴とする薄膜パターンの製造方法。
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JP2014137394A (ja) * | 2013-01-15 | 2014-07-28 | Hitachi Chemical Co Ltd | タッチパネル電極の保護膜用感光性透明材 |
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