JP2016058446A5 - - Google Patents
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- Publication number
- JP2016058446A5 JP2016058446A5 JP2014181471A JP2014181471A JP2016058446A5 JP 2016058446 A5 JP2016058446 A5 JP 2016058446A5 JP 2014181471 A JP2014181471 A JP 2014181471A JP 2014181471 A JP2014181471 A JP 2014181471A JP 2016058446 A5 JP2016058446 A5 JP 2016058446A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processing
- air flow
- heating unit
- target surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 18
- 239000007788 liquid Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims 3
- 238000003672 processing method Methods 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014181471A JP6501469B2 (ja) | 2014-09-05 | 2014-09-05 | 基板処理装置及び基板処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014181471A JP6501469B2 (ja) | 2014-09-05 | 2014-09-05 | 基板処理装置及び基板処理方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016058446A JP2016058446A (ja) | 2016-04-21 |
| JP2016058446A5 true JP2016058446A5 (enExample) | 2017-10-19 |
| JP6501469B2 JP6501469B2 (ja) | 2019-04-17 |
Family
ID=55758820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014181471A Active JP6501469B2 (ja) | 2014-09-05 | 2014-09-05 | 基板処理装置及び基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6501469B2 (enExample) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004221155A (ja) * | 2003-01-10 | 2004-08-05 | Tokyo Electron Ltd | 酸化膜の除去方法、加熱方法、及び処理装置 |
| JP5420596B2 (ja) * | 2011-07-12 | 2014-02-19 | 東京エレクトロン株式会社 | 液処理装置および液処理方法 |
| JP6242057B2 (ja) * | 2013-02-15 | 2017-12-06 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置 |
-
2014
- 2014-09-05 JP JP2014181471A patent/JP6501469B2/ja active Active
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