JP2016044361A5 - - Google Patents

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Publication number
JP2016044361A5
JP2016044361A5 JP2015162483A JP2015162483A JP2016044361A5 JP 2016044361 A5 JP2016044361 A5 JP 2016044361A5 JP 2015162483 A JP2015162483 A JP 2015162483A JP 2015162483 A JP2015162483 A JP 2015162483A JP 2016044361 A5 JP2016044361 A5 JP 2016044361A5
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JP
Japan
Prior art keywords
ampoule
precursor
filling
substrate
substrate processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2015162483A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016044361A (ja
JP6857960B2 (ja
Filing date
Publication date
Priority claimed from US14/516,452 external-priority patent/US20160052651A1/en
Application filed filed Critical
Publication of JP2016044361A publication Critical patent/JP2016044361A/ja
Publication of JP2016044361A5 publication Critical patent/JP2016044361A5/ja
Application granted granted Critical
Publication of JP6857960B2 publication Critical patent/JP6857960B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015162483A 2014-08-22 2015-08-20 オンデマンド充填アンプル Active JP6857960B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201462040974P 2014-08-22 2014-08-22
US62/040,974 2014-08-22
US14/516,452 US20160052651A1 (en) 2014-08-22 2014-10-16 Fill on demand ampoule
US14/516,452 2014-10-16

Publications (3)

Publication Number Publication Date
JP2016044361A JP2016044361A (ja) 2016-04-04
JP2016044361A5 true JP2016044361A5 (enExample) 2018-09-27
JP6857960B2 JP6857960B2 (ja) 2021-04-14

Family

ID=55347636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015162483A Active JP6857960B2 (ja) 2014-08-22 2015-08-20 オンデマンド充填アンプル

Country Status (6)

Country Link
US (1) US20160052651A1 (enExample)
JP (1) JP6857960B2 (enExample)
KR (1) KR102414284B1 (enExample)
CN (1) CN105390414B (enExample)
SG (1) SG10201506630VA (enExample)
TW (1) TWI684666B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11970772B2 (en) 2014-08-22 2024-04-30 Lam Research Corporation Dynamic precursor dosing for atomic layer deposition
US10094018B2 (en) * 2014-10-16 2018-10-09 Lam Research Corporation Dynamic precursor dosing for atomic layer deposition
US11072860B2 (en) 2014-08-22 2021-07-27 Lam Research Corporation Fill on demand ampoule refill
US11718912B2 (en) * 2019-07-30 2023-08-08 Applied Materials, Inc. Methods and apparatus for calibrating concentration sensors for precursor delivery
KR20230030576A (ko) 2020-06-06 2023-03-06 램 리써치 코포레이션 반도체 프로세싱 툴들을 위한 제거 가능한 샤워헤드 대면 플레이트 (removable showerhead faceplate)
US12209310B2 (en) 2020-07-29 2025-01-28 Lam Research Corporation Concentration control using a bubbler
US12084771B2 (en) 2021-03-02 2024-09-10 Applied Materials, Inc. Control of liquid delivery in auto-refill systems
CN114777024B (zh) * 2022-06-22 2022-10-28 国家管网集团北方管道有限责任公司 一种输油管线的一键启停控制方法
WO2025155439A1 (en) * 2024-01-19 2025-07-24 Lam Research Corporation Level monitoring of solid precursors

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1813318C3 (de) * 1968-12-07 1974-01-03 Alexander 2000 Hamburg Kueckens Zeitgesteuerte Dosiervorrichtung für flüssige Medien aus festen und elastischen Behältern
JP2004031782A (ja) * 2002-06-27 2004-01-29 Sumitomo Chem Co Ltd 有機金属ガス供給装置
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US20050252449A1 (en) * 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US20060121192A1 (en) * 2004-12-02 2006-06-08 Jurcik Benjamin J Liquid precursor refill system
US8951478B2 (en) * 2006-03-30 2015-02-10 Applied Materials, Inc. Ampoule with a thermally conductive coating
KR100855582B1 (ko) * 2007-01-12 2008-09-03 삼성전자주식회사 액 공급 장치 및 방법, 상기 장치를 가지는 기판 처리설비, 그리고 기판 처리 방법
JP5305328B2 (ja) * 2007-06-07 2013-10-02 株式会社日立国際電気 基板処理装置
US20090214777A1 (en) * 2008-02-22 2009-08-27 Demetrius Sarigiannis Multiple ampoule delivery systems
KR20110122823A (ko) * 2009-01-16 2011-11-11 비코 인스트루먼츠 인코포레이티드 루테늄의 저온 부착용 조성물 및 방법
US20100305884A1 (en) * 2009-05-22 2010-12-02 Applied Materials, Inc. Methods for determining the quantity of precursor in an ampoule
CN103688339B (zh) * 2011-07-22 2016-09-28 应用材料公司 用于ald/cvd工艺的反应物输送系统
KR102387359B1 (ko) * 2014-04-18 2022-04-14 어플라이드 머티어리얼스, 인코포레이티드 자동-리필 앰풀 및 사용 방법들

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