SG10201506630VA - Fill on demand ampoule - Google Patents

Fill on demand ampoule

Info

Publication number
SG10201506630VA
SG10201506630VA SG10201506630VA SG10201506630VA SG10201506630VA SG 10201506630V A SG10201506630V A SG 10201506630VA SG 10201506630V A SG10201506630V A SG 10201506630VA SG 10201506630V A SG10201506630V A SG 10201506630VA SG 10201506630V A SG10201506630V A SG 10201506630VA
Authority
SG
Singapore
Prior art keywords
fill
ampoule
demand
demand ampoule
Prior art date
Application number
SG10201506630VA
Inventor
Tuan Nguyen
Eashwar Ranganathan
Shankar Swaminathan
Adrien Lavoie
Chloe Baldasseroni
Frank L Pasquale
Purushottam Kumar
Jun Qian
Hu Kang
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG10201506630VA publication Critical patent/SG10201506630VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
    • B65B1/00—Packaging fluent solid material, e.g. powders, granular or loose fibrous material, loose masses of small articles, in individual containers or receptacles, e.g. bags, sacks, boxes, cartons, cans, or jars
    • B65B1/04—Methods of, or means for, filling the material into the containers or receptacles
    • B65B1/08—Methods of, or means for, filling the material into the containers or receptacles by vibratory feeders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
SG10201506630VA 2014-08-22 2015-08-21 Fill on demand ampoule SG10201506630VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462040974P 2014-08-22 2014-08-22
US14/516,452 US20160052651A1 (en) 2014-08-22 2014-10-16 Fill on demand ampoule

Publications (1)

Publication Number Publication Date
SG10201506630VA true SG10201506630VA (en) 2016-03-30

Family

ID=55347636

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201506630VA SG10201506630VA (en) 2014-08-22 2015-08-21 Fill on demand ampoule

Country Status (6)

Country Link
US (1) US20160052651A1 (en)
JP (1) JP6857960B2 (en)
KR (1) KR102414284B1 (en)
CN (1) CN105390414B (en)
SG (1) SG10201506630VA (en)
TW (1) TWI684666B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11072860B2 (en) 2014-08-22 2021-07-27 Lam Research Corporation Fill on demand ampoule refill
US10094018B2 (en) * 2014-10-16 2018-10-09 Lam Research Corporation Dynamic precursor dosing for atomic layer deposition
US11718912B2 (en) 2019-07-30 2023-08-08 Applied Materials, Inc. Methods and apparatus for calibrating concentration sensors for precursor delivery
CN114777024B (en) * 2022-06-22 2022-10-28 国家管网集团北方管道有限责任公司 One-key start-stop control method for oil pipeline

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1813318C3 (en) * 1968-12-07 1974-01-03 Alexander 2000 Hamburg Kueckens Time-controlled dosing device for liquid media from solid and elastic containers
JP2004031782A (en) * 2002-06-27 2004-01-29 Sumitomo Chem Co Ltd Organic metal gas supply device
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US20050252449A1 (en) * 2004-05-12 2005-11-17 Nguyen Son T Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US20060121192A1 (en) * 2004-12-02 2006-06-08 Jurcik Benjamin J Liquid precursor refill system
US8951478B2 (en) * 2006-03-30 2015-02-10 Applied Materials, Inc. Ampoule with a thermally conductive coating
KR100855582B1 (en) * 2007-01-12 2008-09-03 삼성전자주식회사 Liquid supplying unit and method, facility for treating substrates with the unit, and method for treating substrates
JP5305328B2 (en) * 2007-06-07 2013-10-02 株式会社日立国際電気 Substrate processing equipment
US20090214777A1 (en) * 2008-02-22 2009-08-27 Demetrius Sarigiannis Multiple ampoule delivery systems
GB2479322A (en) * 2009-01-16 2011-10-05 Veeco Instr Inc Composition and method for low temperature deposition of ruthenium
US20100305884A1 (en) * 2009-05-22 2010-12-02 Applied Materials, Inc. Methods for determining the quantity of precursor in an ampoule
KR102245759B1 (en) * 2011-07-22 2021-04-27 어플라이드 머티어리얼스, 인코포레이티드 Reactant delivery system for ald/cvd processes
KR102387359B1 (en) * 2014-04-18 2022-04-14 어플라이드 머티어리얼스, 인코포레이티드 Auto-refill ampoule and methods of use

Also Published As

Publication number Publication date
JP2016044361A (en) 2016-04-04
KR20160023605A (en) 2016-03-03
TWI684666B (en) 2020-02-11
TW201623676A (en) 2016-07-01
US20160052651A1 (en) 2016-02-25
CN105390414B (en) 2018-07-10
KR102414284B1 (en) 2022-06-28
JP6857960B2 (en) 2021-04-14
CN105390414A (en) 2016-03-09

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