JP2016033952A - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JP2016033952A JP2016033952A JP2014156177A JP2014156177A JP2016033952A JP 2016033952 A JP2016033952 A JP 2016033952A JP 2014156177 A JP2014156177 A JP 2014156177A JP 2014156177 A JP2014156177 A JP 2014156177A JP 2016033952 A JP2016033952 A JP 2016033952A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229910000679 solder Inorganic materials 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 230000002265 prevention Effects 0.000 abstract description 5
- 238000009413 insulation Methods 0.000 abstract description 4
- 230000001629 suppression Effects 0.000 abstract description 3
- 206010010904 Convulsion Diseases 0.000 description 18
- 238000010586 diagram Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010909 process residue Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4871—Bases, plates or heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3736—Metallic materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/07—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
- H01L25/072—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
Abstract
Description
<参考例>
図1は、参考例である半導体装置600の構成図である。図1(a)は平面図、図1(b)は図1(a)のX−X線で切断した拡大断面図である。半導体装置600においては、絶縁基板52の周囲に縞状に複数本(ここでは3本)の溝56を配置している。複数本の溝56を配置することにより、一本の溝に比べヒートシンク51の表面におけるはんだ流れの抵抗が増えるため、狭い幅でもはんだ流れを効果的に防止することができる。このように狭い幅で縞状の複数本の溝56を形成する方法としては、レーザー加工を用いることができる。
<実施例1>
図5および図6は、この発明に係る第1実施例の半導体装置100の構成図である。図5は平面図である。図6(a)は図1のX1−X1線で切断した拡大断面図である。図6(b)は図6のX2−X2で切断した拡大断面図である。
<実施例2>
図8は、この発明に係る第2実施例の半導体装置200の要部断面図である。この断面図は図6(a)に相当する断面図である。
1b 絶縁膜
2 絶縁基板
3 第1溝
3a 底面
3b 凸部
4 第2溝
4a 底面
5 第2金属層
6 はんだ
7 第1金属
20 半導体チップ
100,200 半導体装置
Claims (12)
- 半導体チップと、
前記半導体チップが固定された複数の絶縁基板と、
複数の前記絶縁基板がそれぞれ所定の配置領域に配置され、前記複数の所定領域のそれぞれを囲む複数の第1溝と、前記第1溝よりも浅く前記第1溝を囲む第2溝を有するヒートシンクと、
前記絶縁基板と前記ヒートシンクの前記配置領域との間に充填されたはんだと、
を備える半導体装置。 - 前記第1溝の深さが50μm以下であり、
前記第1溝と前記第2溝との間隔が40μm以下であり、
前記第1溝の深さと幅の積である第1溝の断面積が、7200μm2以上、20000μm2以下である請求項1記載の半導体装置。 - 前記第1溝が縞状に複数本配置され、複数本の前記第1溝の合計の断面積が7200μm2以上、20000μm2以下であることを特徴とする請求項2に記載の半導体装置。
- 前記第1溝が縞状に複数本配置され、複数本の前記第1溝同士の間隔を5μm以上、20μm以下とすることを特徴とする請求項2に記載の半導体装置。
- 前記ヒートシンクは第1金属で構成され、第2金属層で表面が被覆された請求項1記載の半導体装置。
- 前記第2溝の深さが、前記第2金属層の厚さ以上、前記第1溝の深さの3/4以下であることを特徴とする請求項5に記載の半導体装置。
- 前記第1金属がアルミニウムもしくは銅であり、前記第2金属層がニッケル層もしくはチタン層である請求項5に記載の半導体装置。
- 前記第1金属が銅であり、前記第1溝の底面に絶縁膜を配置することを特徴とする請求項5に記載の半導体装置。
- ヒートシンクおよび複数の絶縁基板を準備する工程と、
前記ヒートシンクに、複数の前記絶縁基板が配置される所定の配置領域のそれぞれを囲む複数の第1溝と、前記第1溝よりも浅く前記第1溝を囲む第2溝をレーザー加工で形成する工程と、
複数の前記配置領域にそれぞれはんだ板と前記絶縁基板を重ねて配置する工程と、
前記はんだ板を加熱して溶融する工程と、
前記溶融したはんだ板を冷却して固化する工程と、
を有する半導体装置の製造方法。 - 前記第1溝の深さを50μm以下とし、
前記第1溝と前記第2溝との間隔を40μm以下とし、
前記第1溝の深さと幅の積である第1溝の断面積を、7200μm2以上、20000μm2以下とする請求項9記載の半導体装置の製造方法。 - 前記第1溝を縞状に複数本形成し、複数本の前記第1溝の合計の断面積を7200μm2以上、20000μm2以下とする請求項10に記載の半導体装置の製造方法。
- 前記第1溝を縞状に複数本形成し、複数本の前記第1溝同士の間隔を5μm以上、20μm以下とする請求項10に記載の半導体装置の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014156177A JP6379815B2 (ja) | 2014-07-31 | 2014-07-31 | 半導体装置およびその製造方法 |
US14/730,651 US9437461B2 (en) | 2014-07-31 | 2015-06-04 | Semiconductor device and method for manufacturing the same |
CN201510307204.4A CN105321936B (zh) | 2014-07-31 | 2015-06-05 | 半导体装置及其制造方法 |
Applications Claiming Priority (1)
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---|---|---|---|
JP2014156177A JP6379815B2 (ja) | 2014-07-31 | 2014-07-31 | 半導体装置およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2016033952A true JP2016033952A (ja) | 2016-03-10 |
JP6379815B2 JP6379815B2 (ja) | 2018-08-29 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2014156177A Expired - Fee Related JP6379815B2 (ja) | 2014-07-31 | 2014-07-31 | 半導体装置およびその製造方法 |
Country Status (3)
Country | Link |
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US (1) | US9437461B2 (ja) |
JP (1) | JP6379815B2 (ja) |
CN (1) | CN105321936B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6610590B2 (ja) * | 2017-03-21 | 2019-11-27 | トヨタ自動車株式会社 | 半導体装置とその製造方法 |
JP6907671B2 (ja) * | 2017-04-17 | 2021-07-21 | 富士電機株式会社 | 半導体装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5389167U (ja) * | 1976-12-21 | 1978-07-21 | ||
JP2004228286A (ja) * | 2003-01-22 | 2004-08-12 | Mitsubishi Electric Corp | 電力用半導体装置 |
JP2007103909A (ja) * | 2005-09-12 | 2007-04-19 | Denso Corp | 半導体装置 |
JP2008159857A (ja) * | 2006-12-25 | 2008-07-10 | Fuji Electric Device Technology Co Ltd | 半導体装置の製造方法 |
JP2008294069A (ja) * | 2007-05-22 | 2008-12-04 | Aisin Aw Co Ltd | 半導体モジュール及びインバータ装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2500669B2 (ja) | 1994-08-15 | 1996-05-29 | ソニー株式会社 | 半導体装置の製造方法 |
US6317218B1 (en) * | 2000-02-08 | 2001-11-13 | Lexmark International, Inc. | Printer with adaptive printing mode |
JP2003100986A (ja) * | 2001-09-26 | 2003-04-04 | Toshiba Corp | 半導体装置 |
JP2005136018A (ja) * | 2003-10-29 | 2005-05-26 | Denso Corp | 半導体装置 |
US7224047B2 (en) * | 2004-12-18 | 2007-05-29 | Lsi Corporation | Semiconductor device package with reduced leakage |
JP2007012857A (ja) * | 2005-06-30 | 2007-01-18 | Renesas Technology Corp | 半導体装置 |
US7262491B2 (en) * | 2005-09-06 | 2007-08-28 | Advanced Interconnect Technologies Limited | Die pad for semiconductor packages and methods of making and using same |
US8269336B2 (en) * | 2008-03-25 | 2012-09-18 | Bridge Semiconductor Corporation | Semiconductor chip assembly with post/base heat spreader and signal post |
JP2010103244A (ja) * | 2008-10-22 | 2010-05-06 | Sony Corp | 半導体装置及びその製造方法 |
US9070662B2 (en) * | 2009-03-05 | 2015-06-30 | Volterra Semiconductor Corporation | Chip-scale packaging with protective heat spreader |
US8901732B2 (en) * | 2013-03-12 | 2014-12-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device package and method |
-
2014
- 2014-07-31 JP JP2014156177A patent/JP6379815B2/ja not_active Expired - Fee Related
-
2015
- 2015-06-04 US US14/730,651 patent/US9437461B2/en active Active
- 2015-06-05 CN CN201510307204.4A patent/CN105321936B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5389167U (ja) * | 1976-12-21 | 1978-07-21 | ||
JP2004228286A (ja) * | 2003-01-22 | 2004-08-12 | Mitsubishi Electric Corp | 電力用半導体装置 |
JP2007103909A (ja) * | 2005-09-12 | 2007-04-19 | Denso Corp | 半導体装置 |
JP2008159857A (ja) * | 2006-12-25 | 2008-07-10 | Fuji Electric Device Technology Co Ltd | 半導体装置の製造方法 |
JP2008294069A (ja) * | 2007-05-22 | 2008-12-04 | Aisin Aw Co Ltd | 半導体モジュール及びインバータ装置 |
Also Published As
Publication number | Publication date |
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US9437461B2 (en) | 2016-09-06 |
CN105321936B (zh) | 2019-08-20 |
JP6379815B2 (ja) | 2018-08-29 |
CN105321936A (zh) | 2016-02-10 |
US20160035643A1 (en) | 2016-02-04 |
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