JP2016027675A5 - - Google Patents
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- Publication number
- JP2016027675A5 JP2016027675A5 JP2015219556A JP2015219556A JP2016027675A5 JP 2016027675 A5 JP2016027675 A5 JP 2016027675A5 JP 2015219556 A JP2015219556 A JP 2015219556A JP 2015219556 A JP2015219556 A JP 2015219556A JP 2016027675 A5 JP2016027675 A5 JP 2016027675A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gate
- conductivity type
- semiconductor device
- electrode layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000010410 layer Substances 0.000 claims 76
- 239000004065 semiconductor Substances 0.000 claims 30
- 238000009792 diffusion process Methods 0.000 claims 21
- 239000004020 conductor Substances 0.000 claims 10
- 239000012535 impurity Substances 0.000 claims 10
- 239000003990 capacitor Substances 0.000 claims 6
- 239000011229 interlayer Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 230000010355 oscillation Effects 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims 2
- 229920005591 polysilicon Polymers 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015219556A JP6177300B2 (ja) | 2013-03-31 | 2015-11-09 | 半導体装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013059785 | 2013-03-31 | ||
| JPPCT/JP2013/059785 | 2013-03-31 | ||
| JP2015219556A JP6177300B2 (ja) | 2013-03-31 | 2015-11-09 | 半導体装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015510084A Division JP5841693B2 (ja) | 2013-03-31 | 2014-03-31 | 半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016027675A JP2016027675A (ja) | 2016-02-18 |
| JP2016027675A5 true JP2016027675A5 (https=) | 2016-04-14 |
| JP6177300B2 JP6177300B2 (ja) | 2017-08-09 |
Family
ID=55352892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015219556A Active JP6177300B2 (ja) | 2013-03-31 | 2015-11-09 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6177300B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114039219A (zh) * | 2022-01-10 | 2022-02-11 | 珠海华萃科技有限公司 | 一种电子元器件焊锡用防漂移结构 |
| CN115207092B (zh) * | 2022-09-09 | 2022-12-13 | 深圳芯能半导体技术有限公司 | 一种高可靠性的沟槽侧壁栅碳化硅mosfet及其制备方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5048273B2 (ja) * | 2006-05-10 | 2012-10-17 | オンセミコンダクター・トレーディング・リミテッド | 絶縁ゲート型半導体装置 |
| WO2008069309A1 (ja) * | 2006-12-07 | 2008-06-12 | Shindengen Electric Manufacturing Co., Ltd. | 半導体装置及びその製造方法 |
-
2015
- 2015-11-09 JP JP2015219556A patent/JP6177300B2/ja active Active
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