JP2015537239A5 - - Google Patents
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- Publication number
- JP2015537239A5 JP2015537239A5 JP2015537177A JP2015537177A JP2015537239A5 JP 2015537239 A5 JP2015537239 A5 JP 2015537239A5 JP 2015537177 A JP2015537177 A JP 2015537177A JP 2015537177 A JP2015537177 A JP 2015537177A JP 2015537239 A5 JP2015537239 A5 JP 2015537239A5
- Authority
- JP
- Japan
- Prior art keywords
- actuator
- holder
- plane
- force
- coupled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000059 patterning Methods 0.000 claims description 52
- 238000005452 bending Methods 0.000 claims description 48
- 238000000034 method Methods 0.000 claims description 7
- 238000003384 imaging method Methods 0.000 claims description 4
- 238000005259 measurement Methods 0.000 claims description 3
- 230000008878 coupling Effects 0.000 claims 4
- 238000010168 coupling process Methods 0.000 claims 4
- 238000005859 coupling reaction Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 230000036316 preload Effects 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 230000007935 neutral effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261717208P | 2012-10-23 | 2012-10-23 | |
| US61/717,208 | 2012-10-23 | ||
| PCT/EP2013/069547 WO2014063871A1 (en) | 2012-10-23 | 2013-09-20 | Patterning device manipulating system and lithographic apparatuses |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015537239A JP2015537239A (ja) | 2015-12-24 |
| JP2015537239A5 true JP2015537239A5 (enExample) | 2016-06-16 |
| JP6198837B2 JP6198837B2 (ja) | 2017-09-20 |
Family
ID=49237199
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015537177A Expired - Fee Related JP6198837B2 (ja) | 2012-10-23 | 2013-09-20 | パターニングデバイス操作システム及びリソグラフィ装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9910368B2 (enExample) |
| JP (1) | JP6198837B2 (enExample) |
| KR (1) | KR101670314B1 (enExample) |
| WO (1) | WO2014063871A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014032897A1 (en) | 2012-08-29 | 2014-03-06 | Asml Holding N.V. | Real-time reticle curvature sensing |
| US10289007B2 (en) * | 2014-07-10 | 2019-05-14 | Nikon Corporation | Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion |
| US10310393B2 (en) | 2015-06-22 | 2019-06-04 | Asml Netherlands B.V. | Substrate support, method of compensating unflatness of an upper surface of a substrate, lithographic apparatus and device manufacturing method |
| KR102653016B1 (ko) * | 2018-09-18 | 2024-03-29 | 삼성전자주식회사 | 척 구동 장치 및 기판 처리 장치 |
| JP7271978B2 (ja) * | 2019-02-05 | 2023-05-12 | 株式会社ニューフレアテクノロジー | ステージ装置及び荷電粒子ビーム処理装置 |
| WO2024213378A1 (en) * | 2023-04-10 | 2024-10-17 | Asml Netherlands B.V. | Systems and methods for clamping a patterning device in a lithography apparatus |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3271760B2 (ja) | 1999-03-31 | 2002-04-08 | 株式会社ニコン | 走査露光方法、走査型露光装置、及び前記方法を用いるデバイス製造方法 |
| JP3626888B2 (ja) | 1999-10-08 | 2005-03-09 | 日立ハイテク電子エンジニアリング株式会社 | 基板露光装置におけるマスク撓み補正機構及びマスク撓み補正方法並びにパターン形成方法 |
| US7675607B2 (en) | 2006-07-14 | 2010-03-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7675201B2 (en) | 2006-07-25 | 2010-03-09 | Asml Netherlands B.V. | Lithographic apparatus with planar motor driven support |
| NL1036511A1 (nl) | 2008-02-13 | 2009-08-14 | Asml Netherlands Bv | Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object. |
| US8553207B2 (en) * | 2008-12-31 | 2013-10-08 | Asml Holdings N.V. | Optically compensated unidirectional reticle bender |
| NL2006190A (en) | 2010-03-11 | 2011-09-13 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| CN104350426A (zh) | 2012-04-27 | 2015-02-11 | Asml荷兰有限公司 | 光刻设备 |
-
2013
- 2013-09-20 JP JP2015537177A patent/JP6198837B2/ja not_active Expired - Fee Related
- 2013-09-20 US US14/437,294 patent/US9910368B2/en not_active Expired - Fee Related
- 2013-09-20 KR KR1020157013660A patent/KR101670314B1/ko not_active Expired - Fee Related
- 2013-09-20 WO PCT/EP2013/069547 patent/WO2014063871A1/en not_active Ceased
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