JP2015534652A - 高耐久性反射防止被覆 - Google Patents

高耐久性反射防止被覆 Download PDF

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Publication number
JP2015534652A
JP2015534652A JP2015529783A JP2015529783A JP2015534652A JP 2015534652 A JP2015534652 A JP 2015534652A JP 2015529783 A JP2015529783 A JP 2015529783A JP 2015529783 A JP2015529783 A JP 2015529783A JP 2015534652 A JP2015534652 A JP 2015534652A
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JP
Japan
Prior art keywords
densifying
coating solution
coating
solution
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015529783A
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English (en)
Japanese (ja)
Inventor
ムコパドヒャイ，スディプ
ゲブレブラン，アマヌエル
コロレフ，ボリス
ヴァラプラサッド，デサラジュ
リウ，ヤー・チュイン
ジアーン，ユンジ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
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Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of JP2015534652A publication Critical patent/JP2015534652A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/30—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen phosphorus-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/006—Anti-reflective coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/395—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing phosphorus
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/38—Polysiloxanes modified by chemical after-treatment
    • C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
    • C08G77/398—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing boron or metal atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/32—Phosphorus-containing compounds
    • C08K2003/329—Phosphorus containing acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/32—Phosphorus-containing compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Photovoltaic Devices (AREA)
  • Silicon Polymers (AREA)
JP2015529783A 2012-08-31 2013-03-05 高耐久性反射防止被覆 Pending JP2015534652A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261695822P 2012-08-31 2012-08-31
US61/695,822 2012-08-31
US201261729057P 2012-11-21 2012-11-21
US61/729,057 2012-11-21
PCT/US2013/029001 WO2014035468A1 (en) 2012-08-31 2013-03-05 Highly durable anti-reflective coatings

Publications (1)

Publication Number Publication Date
JP2015534652A true JP2015534652A (ja) 2015-12-03

Family

ID=50184078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015529783A Pending JP2015534652A (ja) 2012-08-31 2013-03-05 高耐久性反射防止被覆

Country Status (8)

Country Link
US (1) US20150267060A1 (enExample)
EP (1) EP2890750A4 (enExample)
JP (1) JP2015534652A (enExample)
KR (1) KR20150048838A (enExample)
CN (1) CN104769058A (enExample)
IN (1) IN2015DN01565A (enExample)
TW (1) TW201408741A (enExample)
WO (1) WO2014035468A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102610317B1 (ko) * 2015-03-17 2023-12-06 옵티툰 오와이 신규한 카보실록산 중합체 조성물, 그 제조 방법 및 용도
CN106941126B (zh) * 2017-05-05 2018-07-13 孝感双华应用科技开发有限公司 一种高性能减反射膜的制备方法
US11859090B2 (en) * 2019-05-09 2024-01-02 Zirconia Inc. Protective coatings for galvanized steel
US11859091B2 (en) * 2019-05-09 2024-01-02 Zirconia Inc. Protective coatings for ferrous substrates

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07292118A (ja) * 1993-12-28 1995-11-07 Shimizu Corp 無機ケイ酸重合体の製造方法
WO2007119805A1 (ja) * 2006-04-13 2007-10-25 Nissan Chemical Industries, Ltd. リン酸エステル化合物を含有する被膜形成用塗布液及び反射防止膜
JP2010204394A (ja) * 2009-03-03 2010-09-16 Hoya Corp 反射防止膜の製造方法、並びに反射防止膜及び光学素子
WO2010144527A2 (en) * 2009-06-10 2010-12-16 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003295517A1 (en) * 2002-11-12 2004-06-03 Honeywell International Inc Anti-reflective coatings for photolithography and methods of preparation thereof
WO2004088364A1 (ja) * 2003-03-31 2004-10-14 Lintec Corporation 光学用フィルム
US20090214796A1 (en) * 2005-06-09 2009-08-27 Kaoru Okaniwa Method for Forming Antireflection Film
US20070286994A1 (en) * 2006-06-13 2007-12-13 Walker Christopher B Durable antireflective film
US7947848B2 (en) * 2006-06-19 2011-05-24 Basf Se Coloured silsesquioxanes
US9029449B2 (en) * 2006-10-13 2015-05-12 Nitto Boseki Co., Ltd. Polymeric composition comprising metal alkoxide condensation product, organic silane compound and boron compound
US7700711B2 (en) * 2007-03-02 2010-04-20 Chung Shan Institute Of Science And Technology, Armaments Bureau, M.N.D. Manufacturing method of ladder-like phosphorous-containing polysilsesquioxanes nanocomposite material
KR20090049518A (ko) * 2007-11-13 2009-05-18 주식회사 엘지화학 반사방지 코팅 조성물 및 이것을 이용하여 제조된 반사방지필름
US7955782B2 (en) * 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
KR101133953B1 (ko) * 2010-07-09 2012-04-05 성균관대학교산학협력단 실리카 반사방지막의 제조 방법 및 이를 이용한 실리콘 태양전지

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07292118A (ja) * 1993-12-28 1995-11-07 Shimizu Corp 無機ケイ酸重合体の製造方法
WO2007119805A1 (ja) * 2006-04-13 2007-10-25 Nissan Chemical Industries, Ltd. リン酸エステル化合物を含有する被膜形成用塗布液及び反射防止膜
JP2010204394A (ja) * 2009-03-03 2010-09-16 Hoya Corp 反射防止膜の製造方法、並びに反射防止膜及び光学素子
WO2010144527A2 (en) * 2009-06-10 2010-12-16 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP2012529679A (ja) * 2009-06-10 2012-11-22 ハネウェル・インターナショナル・インコーポレーテッド 光学透明基材のための反射防止被覆

Also Published As

Publication number Publication date
CN104769058A (zh) 2015-07-08
US20150267060A1 (en) 2015-09-24
EP2890750A1 (en) 2015-07-08
KR20150048838A (ko) 2015-05-07
IN2015DN01565A (enExample) 2015-07-03
TW201408741A (zh) 2014-03-01
EP2890750A4 (en) 2016-04-13
WO2014035468A1 (en) 2014-03-06

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