JP2015530691A - TiN−X中間層を含む磁気スタック - Google Patents
TiN−X中間層を含む磁気スタック Download PDFInfo
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- 239000011229 interlayer Substances 0.000 title description 95
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000002019 doping agent Substances 0.000 claims abstract description 17
- 229910005335 FePt Inorganic materials 0.000 claims description 239
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 163
- 239000000463 material Substances 0.000 claims description 26
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 25
- 239000013078 crystal Substances 0.000 claims description 19
- 150000004767 nitrides Chemical class 0.000 claims description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000006148 magnetic separator Substances 0.000 claims description 4
- 229910015187 FePd Inorganic materials 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 248
- 229910052718 tin Inorganic materials 0.000 description 157
- 239000002245 particle Substances 0.000 description 143
- GEIAQOFPUVMAGM-UHFFFAOYSA-N Oxozirconium Chemical compound [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 113
- 239000010408 film Substances 0.000 description 102
- KELHQGOVULCJSG-UHFFFAOYSA-N n,n-dimethyl-1-(5-methylfuran-2-yl)ethane-1,2-diamine Chemical compound CN(C)C(CN)C1=CC=C(C)O1 KELHQGOVULCJSG-UHFFFAOYSA-N 0.000 description 89
- 229910010282 TiON Inorganic materials 0.000 description 83
- 238000003917 TEM image Methods 0.000 description 32
- 238000002441 X-ray diffraction Methods 0.000 description 22
- 238000009826 distribution Methods 0.000 description 21
- 230000007423 decrease Effects 0.000 description 19
- 230000003247 decreasing effect Effects 0.000 description 16
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 15
- 238000004544 sputter deposition Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 13
- 238000001228 spectrum Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 238000001878 scanning electron micrograph Methods 0.000 description 11
- 238000010951 particle size reduction Methods 0.000 description 10
- 239000006104 solid solution Substances 0.000 description 10
- 238000004458 analytical method Methods 0.000 description 9
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- 239000000523 sample Substances 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 8
- 238000004627 transmission electron microscopy Methods 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 230000009467 reduction Effects 0.000 description 7
- 230000009919 sequestration Effects 0.000 description 7
- 230000006870 function Effects 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000009736 wetting Methods 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000006249 magnetic particle Substances 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229910052735 hafnium Inorganic materials 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000011065 in-situ storage Methods 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 238000005191 phase separation Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- -1 X is Chemical compound 0.000 description 2
- 229910006252 ZrON Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 229910021480 group 4 element Inorganic materials 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 239000013074 reference sample Substances 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- 238000005204 segregation Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000005549 size reduction Methods 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- NQTSTBMCCAVWOS-UHFFFAOYSA-N 1-dimethoxyphosphoryl-3-phenoxypropan-2-one Chemical compound COP(=O)(OC)CC(=O)COC1=CC=CC=C1 NQTSTBMCCAVWOS-UHFFFAOYSA-N 0.000 description 1
- 229910021296 Co3Pt Inorganic materials 0.000 description 1
- ZSBXGIUJOOQZMP-JLNYLFASSA-N Matrine Chemical compound C1CC[C@H]2CN3C(=O)CCC[C@@H]3[C@@H]3[C@H]2N1CCC3 ZSBXGIUJOOQZMP-JLNYLFASSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910011210 Ti—O—N Inorganic materials 0.000 description 1
- 229910008322 ZrN Inorganic materials 0.000 description 1
- 229910003134 ZrOx Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000013169 thromboelastometry Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000000101 transmission high energy electron diffraction Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/657—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing inorganic, non-oxide compound of Si, N, P, B, H or C, e.g. in metal alloy or compound
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
- G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
- G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
本願明細書において説明される実施形態は、基板と、磁気記録層と、基板と磁気記録層との間に配置されるTiN−X層とを含むスタックを伴う。たとえば、TiN−X層において、Xは、MgO、TiO、TiO2、ZrN、ZrO、ZrO2、HfN、HfO、AlN、およびAl2O3のうち少なくとも1つを含むドーパントである。
熱アシスト磁気記録(HAMR)は、記録層において使用される材料の高い結晶磁気異方性によって磁気記録の面密度を拡張する能力を有する。HAMR媒体を形成するために、1つ以上の下層を使用して高異方性磁気記録層の粒度が配向および/または制御され得る。たとえば、FePtを含む記録層について、これらの下層を使用してFePt膜のL10(001)テクスチャが導入され得る。FePt(または他の磁気層)の微細構造は、c軸分散および粒度など、磁気層の微細構造を制御する役割を有する直下の下層に依存する。たとえば、下層は以下の性質のうち1つ以上を提供し得る。1)磁気層のエピタキシャル成長に好適な格子構造。2)化学的安定性および拡散隔膜。3)磁気層の粒度および結晶配向を制御するための適切な表面性質。
Claims (22)
- スタックであって、
基板と、
磁気記録層と、
前記基板と前記磁気記録層との間に配置されるTiN−X層とを備え、Xはドーパントである、スタック。 - Xは、MgO、TiO、TiO2、ZrN、ZrO、ZrO2、HfN、HfO、AlN、およびAl2O3のうち少なくとも1つを含む、請求項1に記載のスタック。
- 前記磁気記録層は、
FePt、FeXPt合金、FePd、FeXPd、Co3Ptのうち少なくとも1つを含む磁性結晶粒子と、
前記結晶粒子間に配置され、酸化物、窒化物、ホウ化物、および炭化物材料のうち少なくとも1つを含む非磁性分離体とを含む、請求項1に記載のスタック。 - XはTiO2であり、Xは、0より大きく約40体積%以下の量で前記TiN−X層内に存在する、請求項1に記載のスタック。
- XはZnO2であり、Xは、0より大きく約30体積%以下の量で前記TiN−X層内に存在する、請求項1に記載のスタック。
- XはTiO2を含み、
前記磁気記録層は、磁性結晶粒子と、前記結晶粒子間に配置される非磁性分離体とを含み、前記結晶粒子は、前記磁気層の面において約8.5nm未満の平均直径を有する、請求項1に記載のスタック。 - XはZnO2を含み、
前記磁気記録層は、磁性結晶粒子と、前記結晶粒子間に配置される非磁性分離体とを含み、前記結晶粒子は、前記磁気層の面において約6nm未満の平均直径を有する、請求項1に記載のスタック。 - 前記磁気記録層は、FePtの磁性結晶粒子と、前記結晶粒子間に配置される、SiOxおよびCを含む非磁性分離体とを含み、前記磁気層は、SiOxを約35体積%と約45体積%との間の量で含み、Cを約20体積%の量で含む、請求項1に記載のスタック。
- 前記TiN−X層の厚さは約30nm未満である、請求項1に記載のスタック。
- CrRuおよびMgOのうちの1つ以上を含む軟磁性下地層をさらに備え、前記TiN−X層は前記軟磁性下地層の上に配置される、請求項1に記載のスタック。
- 前記TiN−X層の厚さは約5nmと約10nmとの間である、請求項10に記載のスタック。
- XはTiO2であり、前記TiN−X層は、TiO0.45N0.55を含む、請求項1に記載のスタック。
- 前記基板と前記TiN−X層との間に配置される非ドープTiN層をさらに備える、請求項1に記載のスタック。
- スタック表面に対して垂直な前記TiN−X層の熱伝導は、前記TiN−X層における横方向の熱伝導よりも大きい、請求項13に記載のスタック。
- 前記スタック表面に垂直な方向において前記TiN−X層のXの量が変化する、請求項1に記載のスタック。
- 前記TiN−X層はTiOyN1−yを含み、yは前記スタックの表面に垂直な方向において変化する、請求項15に記載のスタック。
- 前記TiN−X層はZrTiOyN1−yを含み、yは前記スタックの表面に垂直な方向において変化する、請求項15に記載のスタック。
- 方法であって、
TiNとXとを共堆積させることによってTiN−X層を形成するステップを備え、Xは、MgO、TiO、TiO2、ZrN、ZrO、ZrO2、HfN、HfO、AlN、およびAl2O3のうち少なくとも1つを含み、方法はさらに、
前記TiN−X層上にFePt磁気層をエピタキシャル成長させるステップを備える、方法。 - Xの量は、0より大きく、約40体積%未満である、請求項18に記載の方法。
- 軟磁性下地層を形成するステップをさらに備え、前記TiN−X層は軟磁性下地層上に成長する、請求項18に記載の方法。
- 前記軟磁性下地層は、CrRuおよびMgOのうち1つ以上を含む、請求項18に記載の方法。
- TiN層を形成するステップをさらに備え、前記TiN−X層は前記TiN層の上に形成される、請求項18に記載の方法。
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261706317P | 2012-09-27 | 2012-09-27 | |
US201261706314P | 2012-09-27 | 2012-09-27 | |
US61/706,314 | 2012-09-27 | ||
US61/706,317 | 2012-09-27 | ||
US201261733202P | 2012-12-04 | 2012-12-04 | |
US61/733,202 | 2012-12-04 | ||
PCT/US2013/061505 WO2014052344A1 (en) | 2012-09-27 | 2013-09-24 | Magnetic stack including tin-x intermediate layer |
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JP2015530691A true JP2015530691A (ja) | 2015-10-15 |
JP2015530691A5 JP2015530691A5 (ja) | 2016-08-18 |
JP6185591B2 JP6185591B2 (ja) | 2017-08-23 |
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US (1) | US9368142B2 (ja) |
JP (1) | JP6185591B2 (ja) |
CN (1) | CN105027202B (ja) |
MY (1) | MY178275A (ja) |
SG (1) | SG11201502412YA (ja) |
WO (1) | WO2014052344A1 (ja) |
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WO2014052344A1 (en) | 2014-04-03 |
JP6185591B2 (ja) | 2017-08-23 |
US9368142B2 (en) | 2016-06-14 |
US20140093748A1 (en) | 2014-04-03 |
MY178275A (en) | 2020-10-07 |
CN105027202B (zh) | 2018-04-13 |
SG11201502412YA (en) | 2015-05-28 |
CN105027202A (zh) | 2015-11-04 |
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