JP2015520508A5 - - Google Patents

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Publication number
JP2015520508A5
JP2015520508A5 JP2015508993A JP2015508993A JP2015520508A5 JP 2015520508 A5 JP2015520508 A5 JP 2015520508A5 JP 2015508993 A JP2015508993 A JP 2015508993A JP 2015508993 A JP2015508993 A JP 2015508993A JP 2015520508 A5 JP2015520508 A5 JP 2015520508A5
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JP
Japan
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output spectrum
spectrum
array
measured
endpoint
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JP2015508993A
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English (en)
Japanese (ja)
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JP2015520508A (ja
JP6234438B2 (ja
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Priority claimed from US13/456,035 external-priority patent/US9011202B2/en
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Publication of JP2015520508A5 publication Critical patent/JP2015520508A5/ja
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JP2015508993A 2012-04-25 2013-04-05 回折効果を用いた光学モデルの測定スペクトルへの適合 Active JP6234438B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/456,035 US9011202B2 (en) 2012-04-25 2012-04-25 Fitting of optical model with diffraction effects to measured spectrum
US13/456,035 2012-04-25
PCT/US2013/035510 WO2013162855A1 (en) 2012-04-25 2013-04-05 Fitting of optical model with diffraction effects to measured spectrum

Publications (3)

Publication Number Publication Date
JP2015520508A JP2015520508A (ja) 2015-07-16
JP2015520508A5 true JP2015520508A5 (enExample) 2016-06-02
JP6234438B2 JP6234438B2 (ja) 2017-11-22

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ID=49477711

Family Applications (1)

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JP2015508993A Active JP6234438B2 (ja) 2012-04-25 2013-04-05 回折効果を用いた光学モデルの測定スペクトルへの適合

Country Status (5)

Country Link
US (1) US9011202B2 (enExample)
JP (1) JP6234438B2 (enExample)
KR (1) KR101917344B1 (enExample)
TW (1) TWI546154B (enExample)
WO (1) WO2013162855A1 (enExample)

Families Citing this family (11)

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Publication number Priority date Publication date Assignee Title
KR101892914B1 (ko) * 2012-03-08 2018-08-29 어플라이드 머티어리얼스, 인코포레이티드 측정된 스펙트럼에 대한 광학 모델의 피팅
US9011202B2 (en) * 2012-04-25 2015-04-21 Applied Materials, Inc. Fitting of optical model with diffraction effects to measured spectrum
US9248544B2 (en) * 2012-07-18 2016-02-02 Applied Materials, Inc. Endpoint detection during polishing using integrated differential intensity
US20140242880A1 (en) * 2013-02-26 2014-08-28 Applied Materials, Inc. Optical model with polarization direction effects for comparison to measured spectrum
US20140242881A1 (en) * 2013-02-27 2014-08-28 Applied Materials, Inc. Feed forward parameter values for use in theoretically generating spectra
JP5958627B1 (ja) * 2015-09-08 2016-08-02 株式会社豊田中央研究所 摺動装置
JP7197999B2 (ja) 2018-05-11 2022-12-28 キオクシア株式会社 研磨装置および研磨パッド
JP7472111B2 (ja) 2018-09-24 2024-04-22 アプライド マテリアルズ インコーポレイテッド Ｃｍｐプロセス制御アルゴリズムへの入力としてのマシンビジョン
JP2020181959A (ja) 2019-04-26 2020-11-05 東京エレクトロン株式会社 学習方法、管理装置および管理プログラム
JP7585357B2 (ja) * 2021-03-03 2024-11-18 アプライド マテリアルズ インコーポレイテッド 分光モニタリング用の機械学習システム向けにトレーニングスペクトルにラベル付けするためのインシトゥモニタリング
US20250256371A1 (en) * 2024-02-13 2025-08-14 Applied Materials, Inc. Endpoint control for inconsistent underlayer

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JP5293186B2 (ja) * 2006-11-10 2013-09-18 住友電気工業株式会社 Ｓｉ−Ｏ含有水素化炭素膜とそれを含む光学デバイスおよびそれらの製造方法
JP5254668B2 (ja) * 2008-06-03 2013-08-07 株式会社荏原製作所 研磨終点検出方法
US20100120331A1 (en) * 2008-11-07 2010-05-13 Applied Materials, Inc. Endpoint control of multiple-wafer chemical mechanical polishing
US8751033B2 (en) 2008-11-14 2014-06-10 Applied Materials, Inc. Adaptive tracking spectrum features for endpoint detection
JP5728239B2 (ja) * 2010-03-02 2015-06-03 株式会社荏原製作所 研磨監視方法、研磨方法、研磨監視装置、および研磨装置
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US20120278028A1 (en) 2011-04-28 2012-11-01 Jeffrey Drue David Generating model based spectra library for polishing
US9011202B2 (en) * 2012-04-25 2015-04-21 Applied Materials, Inc. Fitting of optical model with diffraction effects to measured spectrum

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