JP2015515544A - 真空蒸着ソース加熱システムと真空蒸着システム - Google Patents
真空蒸着ソース加熱システムと真空蒸着システム Download PDFInfo
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- JP2015515544A JP2015515544A JP2014561365A JP2014561365A JP2015515544A JP 2015515544 A JP2015515544 A JP 2015515544A JP 2014561365 A JP2014561365 A JP 2014561365A JP 2014561365 A JP2014561365 A JP 2014561365A JP 2015515544 A JP2015515544 A JP 2015515544A
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- power supply
- heating system
- vacuum deposition
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- source heating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/26—Connections in which at least one of the connecting parts has projections which bite into or engage the other connecting part in order to improve the contact
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/28—Clamped connections, spring connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/28—Clamped connections, spring connections
- H01R4/48—Clamped connections, spring connections utilising a spring, clip, or other resilient member
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Resistance Heating (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (11)
- 真空蒸着システムに搭載可能な真空蒸着ソース加熱システムであって、
蒸着ソースを加熱するよう設計された加熱素子(1)と、
前記加熱素子(1)に電力を供給するために前記加熱素子に電気的に接続された電力供給素子(2)と、
前記電力供給素子(2)を前記加熱素子に電気的に接続する接続部材(3)と、
を含み、
前記電力供給素子は弾性的に前記接続部材に機械的に搭載され、
前記接続部材(3)は弾性炭素材料でできたばね素子(31)を含む、
真空蒸着ソース加熱システム。 - 前記ばね素子が炭素繊維/CFC(炭素繊維強化炭素)および/または熱分解性炭素で形成されていることを特徴とする、
請求項1に記載の真空蒸着ソース加熱システム。 - 前記ばね素子が泡状炭素または炭素フェルトで形成されていることを特徴とする、
請求項1または2に記載の真空蒸着ソース加熱システム。 - 前記ばね素子が少なくとも50%、60%、70%、80%、または90%の炭素を含み、または、実質上完全に炭素から形成されていることを特徴とする、
請求項1〜3のいずれかに記載の真空蒸着ソース加熱システム。 - 前記電力供給素子(2)が前記ばね素子を介して前記加熱素子(1)に電気的に接続されていることを特徴とする、
請求項1〜4のいずれかに記載の真空蒸着ソース加熱システム。 - 前記電力供給素子(2)が延長された形状を有していることを特徴とする、
請求項1〜5のいずれかに記載の真空蒸着ソース加熱システム。 - 前記電力供給素子(2)が平面、矩形、正方形、楕円、あるいは円形の断面をもつロッド形状を有することを特徴とする、
請求項6に記載の真空蒸着ソース加熱システム。 - 前記電力供給素子(2)が炭素で形成されていることを特徴とする、
請求項1〜7のいずれかに記載の真空蒸着ソース加熱システム。 - 前記電力供給素子(2)が電気絶縁材料の絶縁カバー(21)で少なくとも部分的に覆われていることを特徴とする、
請求項1〜8のいずれかに記載の真空蒸着ソース加熱システム。 - 前記絶縁カバー(21)が酸化アルミニウムで形成されていることを特徴とする、
請求項1〜9のいずれかに記載の真空蒸着ソース加熱システム。 - 請求項1〜10のいずれかに記載の真空蒸着ソース加熱システムを含む、
真空蒸着システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012102210.0 | 2012-03-15 | ||
DE102012102210A DE102012102210A1 (de) | 2012-03-15 | 2012-03-15 | Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung |
PCT/EP2013/054481 WO2013135537A1 (en) | 2012-03-15 | 2013-03-06 | Vacuum deposition source heating system and vacuum deposition system |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015515544A true JP2015515544A (ja) | 2015-05-28 |
JP6461608B2 JP6461608B2 (ja) | 2019-01-30 |
Family
ID=48047979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014561365A Expired - Fee Related JP6461608B2 (ja) | 2012-03-15 | 2013-03-06 | 真空蒸着ソース加熱システムと真空蒸着システム |
Country Status (7)
Country | Link |
---|---|
US (1) | US20150000593A1 (ja) |
EP (1) | EP2825684B1 (ja) |
JP (1) | JP6461608B2 (ja) |
KR (1) | KR101638269B1 (ja) |
CN (1) | CN104302806B (ja) |
DE (1) | DE102012102210A1 (ja) |
WO (1) | WO2013135537A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20140111347A (ko) * | 2012-03-15 | 2014-09-18 | 하너지 홀딩 그룹 리미티드 | 진공 증착 소스 가열 시스템 및 진공 증착 시스템 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101649471B1 (ko) * | 2014-06-10 | 2016-08-22 | 엘지디스플레이 주식회사 | 디스플레이장치 제조용 가열장치 |
CN112933648A (zh) * | 2021-01-29 | 2021-06-11 | 杨立娟 | 一种带水性纳米涂层材料制备装置 |
Citations (6)
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DE102012102210A1 (de) * | 2012-03-15 | 2013-09-19 | Solibro Gmbh | Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung |
-
2012
- 2012-03-15 DE DE102012102210A patent/DE102012102210A1/de not_active Ceased
-
2013
- 2013-03-06 EP EP13714217.0A patent/EP2825684B1/en not_active Not-in-force
- 2013-03-06 CN CN201380014110.7A patent/CN104302806B/zh active Active
- 2013-03-06 KR KR1020147022687A patent/KR101638269B1/ko active IP Right Grant
- 2013-03-06 WO PCT/EP2013/054481 patent/WO2013135537A1/en active Application Filing
- 2013-03-06 US US14/376,925 patent/US20150000593A1/en not_active Abandoned
- 2013-03-06 JP JP2014561365A patent/JP6461608B2/ja not_active Expired - Fee Related
Patent Citations (6)
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JPS5016230Y1 (ja) * | 1970-07-27 | 1975-05-20 | ||
US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
JPH0620522A (ja) * | 1992-07-03 | 1994-01-28 | Akira Tatai | 炭素繊維電線 |
JPH09502484A (ja) * | 1993-09-10 | 1997-03-11 | アドバンスド セラミックス コーポレイション | 蒸着ボート用クランプアセンブリ |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20140111347A (ko) * | 2012-03-15 | 2014-09-18 | 하너지 홀딩 그룹 리미티드 | 진공 증착 소스 가열 시스템 및 진공 증착 시스템 |
KR101638269B1 (ko) | 2012-03-15 | 2016-07-08 | 하너지 홀딩 그룹 리미티드 | 진공 증착 소스 가열 시스템 및 진공 증착 시스템 |
Also Published As
Publication number | Publication date |
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CN104302806A (zh) | 2015-01-21 |
EP2825684B1 (en) | 2016-05-18 |
CN104302806B (zh) | 2016-04-27 |
DE102012102210A1 (de) | 2013-09-19 |
KR101638269B1 (ko) | 2016-07-08 |
US20150000593A1 (en) | 2015-01-01 |
WO2013135537A1 (en) | 2013-09-19 |
JP6461608B2 (ja) | 2019-01-30 |
EP2825684A1 (en) | 2015-01-21 |
KR20140111347A (ko) | 2014-09-18 |
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