CN104302806B - 真空蒸镀源加热系统和真空蒸镀系统 - Google Patents

真空蒸镀源加热系统和真空蒸镀系统 Download PDF

Info

Publication number
CN104302806B
CN104302806B CN201380014110.7A CN201380014110A CN104302806B CN 104302806 B CN104302806 B CN 104302806B CN 201380014110 A CN201380014110 A CN 201380014110A CN 104302806 B CN104302806 B CN 104302806B
Authority
CN
China
Prior art keywords
vacuum evaporation
power supply
evaporation source
heating system
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201380014110.7A
Other languages
English (en)
Other versions
CN104302806A (zh
Inventor
J·马蒂亚松
M·克辛格
F·克劳泽
T·阿尔格伦
S·施泰因贝格
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Zuqiang Energy Co ltd
Original Assignee
Beijing Apollo Ding Rong Solar Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Apollo Ding Rong Solar Technology Co Ltd filed Critical Beijing Apollo Ding Rong Solar Technology Co Ltd
Publication of CN104302806A publication Critical patent/CN104302806A/zh
Application granted granted Critical
Publication of CN104302806B publication Critical patent/CN104302806B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/26Connections in which at least one of the connecting parts has projections which bite into or engage the other connecting part in order to improve the contact
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/28Clamped connections, spring connections
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/28Clamped connections, spring connections
    • H01R4/48Clamped connections, spring connections utilising a spring, clip, or other resilient member

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Resistance Heating (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

本发明涉及一种真空蒸镀源加热系统并且涉及具有该加热系统的真空蒸镀系统。所述真空蒸镀源加热系统能够安装到真空蒸镀系统中并且包括:设计用于加热蒸镀源的加热元件(1),与加热元件电连接的用于向加热元件(1)提供电能的电源供应元件(2);将电源供应元件(2)电连接到加热元件的连接件(3),从而使电源供应元件以弹性的方式机械安装到连接件(3),并且由此使得连接件包括由弹性的碳材料制成的弹簧元件(31)。

Description

真空蒸镀源加热系统和真空蒸镀系统
技术领域
本发明涉及一种真空蒸镀源加热系统并且涉及具有该加热系统的真空蒸镀系统。
背景技术
真空蒸镀依赖于对源材料的加热,使源材料在特定的蒸发温度蒸发并且凝结在基片上,基片与源材料一起放置在真空中。源材料可以放置在由电阻丝加热的坩埚中,或者可以使电阻丝自身构成容纳源材料的容器。电阻丝通常是由耐热性导电材料制成,并且与电流供应源连接。还可以使用其它用于加热源材料的设计。然而,在所有情况中均通过电源元件向加热元件供应电流,加热元件可以是导线或者其它某些刚性引线。
经常发生在加热元件和电源元件之间的刚性接触问题由它们之间的温度差所导致。通常,由靠近或者位于加热元件接触点上的绝缘体覆盖电源元件。然而,如果触点本身冷于加热元件,蒸发的原材料还可能凝结在触点或者电源元件上,并且导致短路。另一方面,如果触点保持高温,由于热膨胀可能导致其拱起,使接触变得不可靠。
解决该问题的一种方法是,如前所述通过直接接触加热元件的绝缘件,以及通过同时加热其中电源元件暴露在外的触点自身来保护电源元件。可以使其维持在700至1500摄氏度中的任何温度或者更高的温度。此外,为了避免由热膨胀造成的任何接触失效,通过弹簧在电源元件和加热元件之间的触点上施加压力,由此抵消温度膨胀的影响。
一种这样的设计在WO2010/019218A2中得到了描述。其中描述的系统包括加热器,并通过金属电源条带供应电流到该加热器。所述电源条带夹在接触垫圈和导电垫圈之间。通过压力销将电源条带和两个垫圈一同推向加热器。为了施加的可靠接触压力,通过高温分解氮化硼制成的平弹簧对压力销进行加载。在WO2010/019218A2公开的配置中,氮化硼弹簧只能够用作间接的压力元件,用于将电能带条推向加热器的触点。因为氮化硼本身不是导电材料,由氮化硼制成的弹簧自身不能用于导电。这会使得加热系统的设计灵活性更少。
可能考虑不同的设计,在电源线和加热器之间设置弹簧支撑接触,其具有钨弹簧。然而,当在压力下且在某温度之上进行加热时,钨会具有蠕变的缺点。因此,在高温下,钨弹簧很快失去弹性或者弹力。在这种情况中,在电源线和加热器之间,弹簧不再保持可靠的接触。
发明内容
本发明的目的是提供一种用于真空蒸镀源的源加热系统以及在非常高的温度下仍具有可靠接触的真空蒸镀系统,同时允许其具有灵活的设计。
根据本发明,该目的是通过具有独立权利要求所述特征的真空蒸镀源加热系统以及真空蒸镀系统来实现。在从属权利要求中本发明的有益实施例得以陈述。
本发明基于使用弹性碳材料制成弹簧元件的构思,该弹簧元件负责真空蒸镀源的电源和加热元件之间的弹性连接。有利地,弹性碳材料以弹性石墨材料的形式来实现。连接件是由一些元件构成的实体,负责电源供应元件与加热元件之间的连接。弹簧元件是连接件的一部分,并且负责使得连接件和电源供应元件之间的机械连接变得有弹性。由碳材料比如碳纤维制成的弹性元件,甚至在高温下均能保持电接触所需的压力。因此,形成可靠的电连接。弹簧元件可暴露在高达700至1500摄氏度的温度或者更高的温度下。
真空蒸镀系统包括真空蒸镀源加热系统,其带有电源供应和加热元件之间的至少一个这样的弹性连接。然而,有利地,两个这样的连接针对加热元件形成,一个针对电源供应的每个端子形成。有利地,在真空蒸镀源中设置有两个或更多的加热器,在这样的情况中,一个或所有加热器的一个或者所有电源端子中的每一个都可以通过弹性连接接触相应的电源供应元件,弹性连接包括如上所述和如下所述的弹簧元件。
加热元件可以包括坩埚、用于坩埚的夹持工具以及用于从电源供应元件传递电能到坩埚的传导体。除了弹簧元件之外的连接件可以包括紧固元件,例如螺丝、夹具、扣件等,用于与电源供应元件机械配合以及与加热元件建立电连接。连接件还可以包括加热元件本身的夹持器。
连接件的弹簧元件可以具有棒状或者板状的形状。其具有至少为20、30、40、50毫米或者更多的长度。优选地,其具有的长度尺寸在20到150毫米之间,有利地在40到120毫米之间。其可以制成弹性的,使得在具有40到120毫米之间的长度时能够弯曲至少1到3毫米。
可以弯曲弹簧元件以产生弹性力。例如,当弹簧元件具有棒状或者矩形板的形状时,可以沿其长度方向弯曲。替代地或者叠加地,可以压缩弹簧元件以产生弹性力。在后一种情况中,可以顺着最小的尺寸即是顺着弹簧元件的厚度方向进行压缩。为了实现这样的压缩,例如可以用碳泡沫或者碳毡制作弹簧元件。
在一个优选的实施例中,弹簧元件是由碳纤维/CFC(碳纤维增强碳)和/或热分解碳制成。该热分解碳例如可以通过气相沉积法工艺比如化学气相沉积(CVD)制成。
根据本发明的一个有益实施例,弹簧元件由碳泡沫或者碳毡制成。其实际上是弹簧元件由于弯曲而施加弹性力的情况,而不是前述的由于弹簧元件的压缩的情况。
根据上述权利要求中任一项所述的真空蒸镀源加热系统,其特征在于,弹簧元件包含至少50%、60%、70%、80%或90%的碳,或者弹簧元件基本上完全由碳制成。在此情况中,词语“基本”指的是,除了任何非预期的杂质或者由于制作过程产生的杂质之外,弹簧元件完全由碳制成。在一些实施例中,电源供应元件通过弹簧元件电连接到加热元件。在一些实施例中,电流将会流经弹簧元件,从而到达加热器。然而,在替代的实施例中,电流不必流经弹簧元件。
经由连接件与加热元件电连接的电源供应元件,被设计为从电源提供电能到加热元件。电源供应元件可以是以导线、带条、片、带、棒或者任何其它合适形状的传导体。此外,电源供应元件可以是柔性的或刚性的其中一种或者两者,即是,其可以具有柔性部分和刚性部分。
有利地,电源供应元件具有细长的形状。在优选的实施例中,电源供应元件具有棒状的形状并且带有平的、矩形的、正方形的、椭圆形的或者圆形的横截面。电源供应元件可以优选地由碳,尤其以石墨的形式形成。
在一个尤其可靠的实施例中,电源供应元件至少被电绝缘材料制成的绝缘盖部分覆盖。在一个优选的实施例中,绝缘盖是由氧化铝制成,例如,其氧化铝的密度至少为3.50g/cm3或者更高。特别地,经由连接元件机械地连接到加热元件或者机械地连接到连接元件自身的部分电源供应元件可以优选地暴露出来,而剩下的电源供应元件则由绝缘盖覆盖。电源供应元件自身可以与电源连接或者包含电连接的部分电源供应件可以与电源连接。
附图说明
下文将参照附图并基于示例性实施例对本发明进行解析。其中:
图1所示为根据一个优选实施例的加热元件和电源供应元件之间的采用连接件的连接的爆炸图;以及
图2所示为根据另一个优选实施例的加热元件和电源供应元件之间的采用连接件的连接的爆炸图。
具体实施方式
图1所示为加热元件1和电源供应元件2之间连接的分解视图。示出的加热元件1具有圆筒的形状,在其中直接放置用于加热填充有源材料的坩埚或者用于以其它方式加热源材料的不同零件。电源供应元件2加载电流使加热元件1工作。加热元件1和电源供应元件2之间的电和机械连接是由放置在它们之间的连接件3来实施。在替代的实施例中,连接件3还可以相对于加热元件1,部分地放置在电源供应元件2的远侧,例如,连接件3可以部分地或者完全地围绕或者包覆电源供应元件2布置。
在图1中,连接件3包括三个部分,下文讲对其进行详细描述。连接件3的中间部分为弹性碳材料制成的弹簧元件31,其负责提供加热元件1和电源元件2之间的机械弹力。此外,连接件3包括用于固定弹簧元件31的夹持元件32以及用于连接电源供应元件2的接合器33。夹持元件32具有托架形状,其支撑板形弹簧元件31的两个离远的边缘并且使弹簧元件31在这两个离远的边缘之间的中间区域弯曲。夹持元件32自身固定到导电垫圈4,导电垫圈4安装到加热元件1上。
接合器33附着至弹簧元件31的弯曲区域并且承载电源供应元件2。接合器33使电源供应元件2的压力更均匀地散布到弹簧元件31上。电源供应元件2本身为棒状并且是刚性的。除了顶端之外,电源供应元件2被绝缘盖21所覆盖,暴露其顶端是为了形成与接合器33连接的触点。绝缘盖21可以由氧化铝制成,从而实现耐热并且保持绝缘。
在图1所示的设置中,流经电源供应元件2的电流还继续流经接合器33、弹簧件31和托架形状的夹持元件32,然后到达导电垫圈并且最终到达加热元件1。从加热元件1处进行观察时,弹簧元件31还可以放置在电源供应元件2的另一侧(远侧)而不是放置在电流路径中。在这种情况下,弹簧元件1推动电源供应元件2,并且没有从中承载电流。
图2所示为用于形成加热元件1和电源供应元件2之间的电和机械接触的连接件3的不同实施例的分解视图。这里,弹簧元件31为短圆柱或者药丸的形状。通过这种形状,弹簧元件31可以由碳泡沫材料或者碳毡制成,从而实现可压缩。因此,在该实施例中,弹簧元件31的弹性或者弹力源于其自身的可压缩性。
在该实施例中,夹持元件32和接合器33形成碉堡的形状以封装弹簧元件31。然而,弹簧元件31沿其纵轴的具有足够的高度,使得弹簧元件31在接合器33在夹持元件32上停止移动前具有可观的压缩长度。与图1的实施例一样,这里从电源供应元件2流向加热元件1的电流也流经弹簧元件31。
附图标记:
1加热元件;
2电源供应元件;
21绝缘盖;
3连接件;
31弹簧元件;
32夹持元件(托架);
33接合器;
4导电垫圈。

Claims (11)

1.真空蒸镀源加热系统,安装在真空蒸镀系统中并且包括:
-设计用于加热蒸镀源的加热元件(1),
-与所述加热元件电连接并用于向加热元件(I)提供电能的电源供应元件(2);
-将电源供应元件(2)电连接到所述加热元件的连接件(3),
据此所述电源供应元件以弹性的方式机械安装至连接件(3),并且据此所述连接件包括由弹性碳材料制成的弹簧元件(31)。
2.根据权利要求1所述的真空蒸镀源加热系统,其特征在于,所述弹簧元件由碳纤维或CFC(碳纤维增强碳)、和/或热分解碳制成。
3.根据权利要求1或2所述的真空蒸镀源加热系统,其特征在于,所述弹簧元件是由碳泡沫或者碳毡制成。
4.根据权利要求1或2所述的真空蒸镀源加热系统,其特征在于,所述弹簧元件包含至少50%、60%、70%、80%或90%的碳,或者完全由碳制成。
5.根据权利要求1或2所述的真空蒸镀源加热系统,其特征在于,所述电源供应元件(2)通过弹簧元件与加热元件(1)电连接。
6.根据权利要求1或2所述的真空蒸镀源加热系统,其特征在于,所述电源供应元件(2)具有细长的形状。
7.根据权利要求6所述的真空蒸镀源加热系统,其特征在于,所述电源供应元件(2)具有棒状的形状,并带有平的、矩形的、正方形的、椭圆形的或者圆形的横截面。
8.根据权利要求1或2所述的真空蒸镀源加热系统,其特征在于,所述电源供应元件(2)由碳制成。
9.根据权利要求1或2所述的真空蒸镀源加热系统,其特征在于,所述电源供应元件(2)被电绝缘材料的绝缘盖(21)至少部分覆盖。
10.根据权利要求9所述的真空蒸镀源加热系统,其特征在于,所述绝缘盖(21)由氧化铝制成。
11.真空蒸镀系统,含有根据上述权利要求中任一项所述的真空蒸镀源加热系统。
CN201380014110.7A 2012-03-15 2013-03-06 真空蒸镀源加热系统和真空蒸镀系统 Active CN104302806B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102012102210A DE102012102210A1 (de) 2012-03-15 2012-03-15 Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung
DE102012102210.0 2012-03-15
PCT/EP2013/054481 WO2013135537A1 (en) 2012-03-15 2013-03-06 Vacuum deposition source heating system and vacuum deposition system

Publications (2)

Publication Number Publication Date
CN104302806A CN104302806A (zh) 2015-01-21
CN104302806B true CN104302806B (zh) 2016-04-27

Family

ID=48047979

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380014110.7A Active CN104302806B (zh) 2012-03-15 2013-03-06 真空蒸镀源加热系统和真空蒸镀系统

Country Status (7)

Country Link
US (1) US20150000593A1 (zh)
EP (1) EP2825684B1 (zh)
JP (1) JP6461608B2 (zh)
KR (1) KR101638269B1 (zh)
CN (1) CN104302806B (zh)
DE (1) DE102012102210A1 (zh)
WO (1) WO2013135537A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012102210A1 (de) * 2012-03-15 2013-09-19 Solibro Gmbh Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung
KR101649471B1 (ko) * 2014-06-10 2016-08-22 엘지디스플레이 주식회사 디스플레이장치 제조용 가열장치
CN112933648A (zh) * 2021-01-29 2021-06-11 杨立娟 一种带水性纳米涂层材料制备装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2351496A1 (fr) * 1976-05-11 1977-12-09 Radiotechnique Compelec Dispositifs de mise en pression de contacts electriques d'elements chauffants fonctionnant sous vide
DE2827647A1 (de) * 1977-06-24 1979-01-18 Saint Gobain Vorrichtung zur befestigung und stromspeisung von einrichtungen zur thermischen vakuumverdampfung eines metalls
CN101184863A (zh) * 2005-05-31 2008-05-21 桑德维克知识产权股份公司 诸如电接触弹簧的金属条状产品及其制造方法
CN201247830Y (zh) * 2008-08-27 2009-05-27 李林林 一种新式碳纤维电热芯电极连接
CN101652901A (zh) * 2006-08-21 2010-02-17 佛姆法克特股份有限公司 碳纳米管接触结构

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1232558B (de) * 1961-03-06 1967-01-19 Siemens Ag Verfahren zum Herstellen von kristallinem, insbesondere einkristallinem Bor
US3395674A (en) * 1963-09-23 1968-08-06 Int Resistance Co Apparatus for vapor coating tumbling substrates
JPS5016230Y1 (zh) * 1970-07-27 1975-05-20
US4022530A (en) * 1974-03-22 1977-05-10 Bodenseewerk Perkin-Elmer & Co. Gmbh Device for atomizing a sample for flameless atomic absorption measurements
US5182567A (en) * 1990-10-12 1993-01-26 Custom Metallizing Services, Inc. Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means
JPH0620522A (ja) * 1992-07-03 1994-01-28 Akira Tatai 炭素繊維電線
JP3045889B2 (ja) * 1993-03-15 2000-05-29 株式会社アクロス 炭素繊維炭素複合材料製コイルばねの製造方法
US5410631A (en) * 1993-09-10 1995-04-25 Advanced Ceramics Corporation Clamp assembly for a vaporization boat
JP2592461Y2 (ja) * 1993-12-07 1999-03-24 日本カーボン株式会社 炭素繊維強化炭素製ワッシャー
JPH08267647A (ja) * 1995-01-11 1996-10-15 Matsushita Electric Ind Co Ltd グラファイトクラッド構造材及びそれを用いたグラファイト部品
JP4430769B2 (ja) * 1999-12-09 2010-03-10 信越化学工業株式会社 セラミックス加熱治具
DE10138214A1 (de) * 2001-08-03 2003-02-20 Bayer Ag Elektrolysezelle und Verfahren zur elektrochemischen Herstellung von Chlor
JP4314514B2 (ja) * 2003-06-24 2009-08-19 日産自動車株式会社 固体電解質型燃料電池及び集電体の製造方法
EP2321444B1 (en) * 2008-08-11 2013-07-24 Veeco Instruments Inc. Electrical contacts for use with vacuum deposition sources
EP2088646A1 (en) 2008-09-16 2009-08-12 Tyco Electronics AMP GmbH Electrical connector
JP5365413B2 (ja) * 2009-08-25 2013-12-11 富士電機機器制御株式会社 回路遮断器
KR101415552B1 (ko) * 2009-12-21 2014-07-07 주식회사 미코 접지구조물, 이를 구비하는 히터 및 화학기상 증착장치
DE102012102210A1 (de) 2012-03-15 2013-09-19 Solibro Gmbh Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2351496A1 (fr) * 1976-05-11 1977-12-09 Radiotechnique Compelec Dispositifs de mise en pression de contacts electriques d'elements chauffants fonctionnant sous vide
DE2827647A1 (de) * 1977-06-24 1979-01-18 Saint Gobain Vorrichtung zur befestigung und stromspeisung von einrichtungen zur thermischen vakuumverdampfung eines metalls
CN101184863A (zh) * 2005-05-31 2008-05-21 桑德维克知识产权股份公司 诸如电接触弹簧的金属条状产品及其制造方法
CN101652901A (zh) * 2006-08-21 2010-02-17 佛姆法克特股份有限公司 碳纳米管接触结构
CN201247830Y (zh) * 2008-08-27 2009-05-27 李林林 一种新式碳纤维电热芯电极连接

Also Published As

Publication number Publication date
EP2825684B1 (en) 2016-05-18
DE102012102210A1 (de) 2013-09-19
US20150000593A1 (en) 2015-01-01
JP2015515544A (ja) 2015-05-28
CN104302806A (zh) 2015-01-21
WO2013135537A1 (en) 2013-09-19
KR101638269B1 (ko) 2016-07-08
KR20140111347A (ko) 2014-09-18
EP2825684A1 (en) 2015-01-21
JP6461608B2 (ja) 2019-01-30

Similar Documents

Publication Publication Date Title
CN104302806B (zh) 真空蒸镀源加热系统和真空蒸镀系统
KR100658699B1 (ko) 유연성을 갖는 열전 모듈
KR20080093021A (ko) 전기 가열 장치용 발열 엘리먼트 및 그 제조 방법
NZ612090A (en) Reduced ceramic heating element
CN104221142A (zh) 热传导体以及使用其的电子设备
CN109950653A (zh) 散热结构体及具备其的蓄电池
CN1897770B (zh) 加热体
KR101208700B1 (ko) 접지용 스트랩을 구비한 세라믹 히터
KR20190123620A (ko) 배관 동파 방지 장치
EP3389124B1 (en) Heatable garment
CN111225459B (zh) 电加热装置
CN101796341B (zh) 模块化加热器系统
WO2016131296A1 (zh) 导热件和电子终端
CN101902004A (zh) 灯插座和用于所述插座的触头
CN116746016A (zh) 用于将电流轨保持和固定在基底、尤其金属壳体上的装置
US9601796B2 (en) Fuel cell arrangement
CN107430041A (zh) 燃烧压力传感器
CN109936969A (zh) 一种宇航产品中有浮空金属壳的器件的孤立导体处理装置及安装方法
KR101185486B1 (ko) 온수관 밀폐장치
JP2000208236A (ja) 炉壁へのセラミックヒ―タ取付構造
CN216019116U (zh) 发热元件及气溶胶产生装置
KR20100004283A (ko) 평판형 전열장치
CN221918227U (zh) 一种电极引出结构及热炉
JP5646930B2 (ja) 湯沸かし器
KR101480395B1 (ko) 대기중에서 사용가능한 초고온 발열 장치

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20160301

Address after: 100176 Beijing economic and Technological Development Zone, Kangding street, No. 11, building three, floor 11

Applicant after: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd.

Address before: 100176 No. 7 Fairview street, Beijing economic and Technological Development Zone, Beijing

Applicant before: APOLLO PRECISION (BEIJING) Ltd.

C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: 100176 3rd floor, 11 Kangding Street, Beijing Economic and Technological Development Zone

Patentee after: Beijing Dingrong Photovoltaic Technology Co.,Ltd.

Address before: 100176 3rd floor, 11 Kangding Street, Beijing Economic and Technological Development Zone

Patentee before: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd.

CP01 Change in the name or title of a patent holder
TR01 Transfer of patent right

Effective date of registration: 20210330

Address after: Room 201, Building A, 1 Qianwan Road, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province

Patentee after: Shenzhen Zhengyue development and Construction Co.,Ltd.

Address before: 100176 3rd floor, 11 Kangding Street, Beijing Economic and Technological Development Zone

Patentee before: Beijing Dingrong Photovoltaic Technology Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20210831

Address after: No.66210, 3rd floor, Pudong Free Trade Zone, Shanghai, China

Patentee after: Shanghai zuqiang Energy Co.,Ltd.

Address before: Room 201, Building A, 1 Qianwan Road, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province

Patentee before: Shenzhen Zhengyue development and Construction Co.,Ltd.

TR01 Transfer of patent right
PP01 Preservation of patent right

Effective date of registration: 20240930

Granted publication date: 20160427