CN104302806B - 真空蒸镀源加热系统和真空蒸镀系统 - Google Patents
真空蒸镀源加热系统和真空蒸镀系统 Download PDFInfo
- Publication number
- CN104302806B CN104302806B CN201380014110.7A CN201380014110A CN104302806B CN 104302806 B CN104302806 B CN 104302806B CN 201380014110 A CN201380014110 A CN 201380014110A CN 104302806 B CN104302806 B CN 104302806B
- Authority
- CN
- China
- Prior art keywords
- vacuum evaporation
- power supply
- evaporation source
- heating system
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 73
- 238000007738 vacuum evaporation Methods 0.000 title claims abstract description 33
- 239000003575 carbonaceous material Substances 0.000 claims abstract description 6
- 238000007740 vapor deposition Methods 0.000 claims abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 17
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 10
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 9
- 229920000049 Carbon (fiber) Polymers 0.000 claims description 5
- 239000004917 carbon fiber Substances 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- 230000008878 coupling Effects 0.000 description 8
- 238000010168 coupling process Methods 0.000 description 8
- 238000005859 coupling reaction Methods 0.000 description 8
- 229910052582 BN Inorganic materials 0.000 description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 4
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000002360 explosive Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000007770 graphite material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/26—Connections in which at least one of the connecting parts has projections which bite into or engage the other connecting part in order to improve the contact
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/28—Clamped connections, spring connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/28—Clamped connections, spring connections
- H01R4/48—Clamped connections, spring connections utilising a spring, clip, or other resilient member
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Resistance Heating (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012102210A DE102012102210A1 (de) | 2012-03-15 | 2012-03-15 | Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung |
DE102012102210.0 | 2012-03-15 | ||
PCT/EP2013/054481 WO2013135537A1 (en) | 2012-03-15 | 2013-03-06 | Vacuum deposition source heating system and vacuum deposition system |
Publications (2)
Publication Number | Publication Date |
---|---|
CN104302806A CN104302806A (zh) | 2015-01-21 |
CN104302806B true CN104302806B (zh) | 2016-04-27 |
Family
ID=48047979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201380014110.7A Active CN104302806B (zh) | 2012-03-15 | 2013-03-06 | 真空蒸镀源加热系统和真空蒸镀系统 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20150000593A1 (zh) |
EP (1) | EP2825684B1 (zh) |
JP (1) | JP6461608B2 (zh) |
KR (1) | KR101638269B1 (zh) |
CN (1) | CN104302806B (zh) |
DE (1) | DE102012102210A1 (zh) |
WO (1) | WO2013135537A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012102210A1 (de) * | 2012-03-15 | 2013-09-19 | Solibro Gmbh | Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung |
KR101649471B1 (ko) * | 2014-06-10 | 2016-08-22 | 엘지디스플레이 주식회사 | 디스플레이장치 제조용 가열장치 |
CN112933648A (zh) * | 2021-01-29 | 2021-06-11 | 杨立娟 | 一种带水性纳米涂层材料制备装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2351496A1 (fr) * | 1976-05-11 | 1977-12-09 | Radiotechnique Compelec | Dispositifs de mise en pression de contacts electriques d'elements chauffants fonctionnant sous vide |
DE2827647A1 (de) * | 1977-06-24 | 1979-01-18 | Saint Gobain | Vorrichtung zur befestigung und stromspeisung von einrichtungen zur thermischen vakuumverdampfung eines metalls |
CN101184863A (zh) * | 2005-05-31 | 2008-05-21 | 桑德维克知识产权股份公司 | 诸如电接触弹簧的金属条状产品及其制造方法 |
CN201247830Y (zh) * | 2008-08-27 | 2009-05-27 | 李林林 | 一种新式碳纤维电热芯电极连接 |
CN101652901A (zh) * | 2006-08-21 | 2010-02-17 | 佛姆法克特股份有限公司 | 碳纳米管接触结构 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1232558B (de) * | 1961-03-06 | 1967-01-19 | Siemens Ag | Verfahren zum Herstellen von kristallinem, insbesondere einkristallinem Bor |
US3395674A (en) * | 1963-09-23 | 1968-08-06 | Int Resistance Co | Apparatus for vapor coating tumbling substrates |
JPS5016230Y1 (zh) * | 1970-07-27 | 1975-05-20 | ||
US4022530A (en) * | 1974-03-22 | 1977-05-10 | Bodenseewerk Perkin-Elmer & Co. Gmbh | Device for atomizing a sample for flameless atomic absorption measurements |
US5182567A (en) * | 1990-10-12 | 1993-01-26 | Custom Metallizing Services, Inc. | Retrofittable vapor source for vacuum metallizing utilizing spatter reduction means |
JPH0620522A (ja) * | 1992-07-03 | 1994-01-28 | Akira Tatai | 炭素繊維電線 |
JP3045889B2 (ja) * | 1993-03-15 | 2000-05-29 | 株式会社アクロス | 炭素繊維炭素複合材料製コイルばねの製造方法 |
US5410631A (en) * | 1993-09-10 | 1995-04-25 | Advanced Ceramics Corporation | Clamp assembly for a vaporization boat |
JP2592461Y2 (ja) * | 1993-12-07 | 1999-03-24 | 日本カーボン株式会社 | 炭素繊維強化炭素製ワッシャー |
JPH08267647A (ja) * | 1995-01-11 | 1996-10-15 | Matsushita Electric Ind Co Ltd | グラファイトクラッド構造材及びそれを用いたグラファイト部品 |
JP4430769B2 (ja) * | 1999-12-09 | 2010-03-10 | 信越化学工業株式会社 | セラミックス加熱治具 |
DE10138214A1 (de) * | 2001-08-03 | 2003-02-20 | Bayer Ag | Elektrolysezelle und Verfahren zur elektrochemischen Herstellung von Chlor |
JP4314514B2 (ja) * | 2003-06-24 | 2009-08-19 | 日産自動車株式会社 | 固体電解質型燃料電池及び集電体の製造方法 |
EP2321444B1 (en) * | 2008-08-11 | 2013-07-24 | Veeco Instruments Inc. | Electrical contacts for use with vacuum deposition sources |
EP2088646A1 (en) | 2008-09-16 | 2009-08-12 | Tyco Electronics AMP GmbH | Electrical connector |
JP5365413B2 (ja) * | 2009-08-25 | 2013-12-11 | 富士電機機器制御株式会社 | 回路遮断器 |
KR101415552B1 (ko) * | 2009-12-21 | 2014-07-07 | 주식회사 미코 | 접지구조물, 이를 구비하는 히터 및 화학기상 증착장치 |
DE102012102210A1 (de) | 2012-03-15 | 2013-09-19 | Solibro Gmbh | Heizsystem für eine Vakuumabscheidequelle und Vakuumabscheidevorrichtung |
-
2012
- 2012-03-15 DE DE102012102210A patent/DE102012102210A1/de not_active Ceased
-
2013
- 2013-03-06 CN CN201380014110.7A patent/CN104302806B/zh active Active
- 2013-03-06 US US14/376,925 patent/US20150000593A1/en not_active Abandoned
- 2013-03-06 KR KR1020147022687A patent/KR101638269B1/ko active IP Right Grant
- 2013-03-06 JP JP2014561365A patent/JP6461608B2/ja not_active Expired - Fee Related
- 2013-03-06 WO PCT/EP2013/054481 patent/WO2013135537A1/en active Application Filing
- 2013-03-06 EP EP13714217.0A patent/EP2825684B1/en not_active Not-in-force
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2351496A1 (fr) * | 1976-05-11 | 1977-12-09 | Radiotechnique Compelec | Dispositifs de mise en pression de contacts electriques d'elements chauffants fonctionnant sous vide |
DE2827647A1 (de) * | 1977-06-24 | 1979-01-18 | Saint Gobain | Vorrichtung zur befestigung und stromspeisung von einrichtungen zur thermischen vakuumverdampfung eines metalls |
CN101184863A (zh) * | 2005-05-31 | 2008-05-21 | 桑德维克知识产权股份公司 | 诸如电接触弹簧的金属条状产品及其制造方法 |
CN101652901A (zh) * | 2006-08-21 | 2010-02-17 | 佛姆法克特股份有限公司 | 碳纳米管接触结构 |
CN201247830Y (zh) * | 2008-08-27 | 2009-05-27 | 李林林 | 一种新式碳纤维电热芯电极连接 |
Also Published As
Publication number | Publication date |
---|---|
EP2825684B1 (en) | 2016-05-18 |
DE102012102210A1 (de) | 2013-09-19 |
US20150000593A1 (en) | 2015-01-01 |
JP2015515544A (ja) | 2015-05-28 |
CN104302806A (zh) | 2015-01-21 |
WO2013135537A1 (en) | 2013-09-19 |
KR101638269B1 (ko) | 2016-07-08 |
KR20140111347A (ko) | 2014-09-18 |
EP2825684A1 (en) | 2015-01-21 |
JP6461608B2 (ja) | 2019-01-30 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20160301 Address after: 100176 Beijing economic and Technological Development Zone, Kangding street, No. 11, building three, floor 11 Applicant after: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd. Address before: 100176 No. 7 Fairview street, Beijing economic and Technological Development Zone, Beijing Applicant before: APOLLO PRECISION (BEIJING) Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 100176 3rd floor, 11 Kangding Street, Beijing Economic and Technological Development Zone Patentee after: Beijing Dingrong Photovoltaic Technology Co.,Ltd. Address before: 100176 3rd floor, 11 Kangding Street, Beijing Economic and Technological Development Zone Patentee before: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210330 Address after: Room 201, Building A, 1 Qianwan Road, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province Patentee after: Shenzhen Zhengyue development and Construction Co.,Ltd. Address before: 100176 3rd floor, 11 Kangding Street, Beijing Economic and Technological Development Zone Patentee before: Beijing Dingrong Photovoltaic Technology Co.,Ltd. |
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TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210831 Address after: No.66210, 3rd floor, Pudong Free Trade Zone, Shanghai, China Patentee after: Shanghai zuqiang Energy Co.,Ltd. Address before: Room 201, Building A, 1 Qianwan Road, Qianhai Shenzhen-Hong Kong Cooperation Zone, Shenzhen, Guangdong Province Patentee before: Shenzhen Zhengyue development and Construction Co.,Ltd. |
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PP01 | Preservation of patent right |
Effective date of registration: 20240930 Granted publication date: 20160427 |