JP2015232176A - ジグリシジルエーテル末端ポリシロキサン化合物と非芳香族ポリアミンとのコポリマー - Google Patents
ジグリシジルエーテル末端ポリシロキサン化合物と非芳香族ポリアミンとのコポリマー Download PDFInfo
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- JP2015232176A JP2015232176A JP2015105490A JP2015105490A JP2015232176A JP 2015232176 A JP2015232176 A JP 2015232176A JP 2015105490 A JP2015105490 A JP 2015105490A JP 2015105490 A JP2015105490 A JP 2015105490A JP 2015232176 A JP2015232176 A JP 2015232176A
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- Prior art keywords
- substrate
- copolymer
- diglycidyl ether
- metal
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 polysiloxane Polymers 0.000 title claims abstract description 35
- 150000001875 compounds Chemical class 0.000 title claims abstract description 31
- 229920001577 copolymer Polymers 0.000 title claims abstract description 26
- 229920000768 polyamine Polymers 0.000 title claims abstract description 26
- 229920001296 polysiloxane Polymers 0.000 title claims abstract description 21
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 title abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 62
- 239000003054 catalyst Substances 0.000 claims description 42
- 239000000203 mixture Substances 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 239000007795 chemical reaction product Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 10
- 238000007772 electroless plating Methods 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- 150000003973 alkyl amines Chemical class 0.000 claims description 6
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 5
- 239000004094 surface-active agent Substances 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- 125000002723 alicyclic group Chemical group 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 4
- 229910052751 metal Inorganic materials 0.000 abstract description 48
- 239000002184 metal Substances 0.000 abstract description 48
- 239000003989 dielectric material Substances 0.000 abstract description 22
- 238000007747 plating Methods 0.000 abstract description 22
- 238000001465 metallisation Methods 0.000 abstract description 13
- 230000003750 conditioning effect Effects 0.000 abstract description 9
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- 239000010949 copper Substances 0.000 description 36
- 229910052802 copper Inorganic materials 0.000 description 35
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 17
- 229910021645 metal ion Inorganic materials 0.000 description 14
- 229910052763 palladium Inorganic materials 0.000 description 11
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- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 7
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- 238000012360 testing method Methods 0.000 description 4
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- 239000000080 wetting agent Substances 0.000 description 4
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 3
- 239000001934 2,5-dimethylpyrazine Substances 0.000 description 3
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 3
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- 239000007864 aqueous solution Substances 0.000 description 3
- 150000004982 aromatic amines Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
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- 230000003287 optical effect Effects 0.000 description 3
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 3
- 229960001124 trientine Drugs 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- 0 *N1CCN(*)CC1 Chemical compound *N1CCN(*)CC1 0.000 description 2
- OXQOBQJCDNLAPO-UHFFFAOYSA-N 2,3-Dimethylpyrazine Chemical compound CC1=NC=CN=C1C OXQOBQJCDNLAPO-UHFFFAOYSA-N 0.000 description 2
- LCZUOKDVTBMCMX-UHFFFAOYSA-N 2,5-Dimethylpyrazine Chemical compound CC1=CN=C(C)C=N1 LCZUOKDVTBMCMX-UHFFFAOYSA-N 0.000 description 2
- UQFHLJKWYIJISA-UHFFFAOYSA-N 2,6-dimethyl-1h-pyrimidin-4-one Chemical compound CC1=CC(O)=NC(C)=N1 UQFHLJKWYIJISA-UHFFFAOYSA-N 0.000 description 2
- DBZAKQWXICEWNW-UHFFFAOYSA-N 2-acetylpyrazine Chemical compound CC(=O)C1=CN=CC=N1 DBZAKQWXICEWNW-UHFFFAOYSA-N 0.000 description 2
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- 125000003545 alkoxy group Chemical group 0.000 description 2
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 2
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- 235000010350 erythorbic acid Nutrition 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- UPCIBFUJJLCOQG-UHFFFAOYSA-L ethyl-[2-[2-[ethyl(dimethyl)azaniumyl]ethyl-methylamino]ethyl]-dimethylazanium;dibromide Chemical compound [Br-].[Br-].CC[N+](C)(C)CCN(C)CC[N+](C)(C)CC UPCIBFUJJLCOQG-UHFFFAOYSA-L 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229940026239 isoascorbic acid Drugs 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229920002114 octoxynol-9 Polymers 0.000 description 1
- 229960005010 orotic acid Drugs 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- XFTQRUTUGRCSGO-UHFFFAOYSA-N pyrazin-2-amine Chemical compound NC1=CN=CC=N1 XFTQRUTUGRCSGO-UHFFFAOYSA-N 0.000 description 1
- LJXQPZWIHJMPQQ-UHFFFAOYSA-N pyrimidin-2-amine Chemical compound NC1=NC=CC=N1 LJXQPZWIHJMPQQ-UHFFFAOYSA-N 0.000 description 1
- VTGOHKSTWXHQJK-UHFFFAOYSA-N pyrimidin-2-ol Chemical compound OC1=NC=CC=N1 VTGOHKSTWXHQJK-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 150000003335 secondary amines Chemical group 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- 229940083542 sodium Drugs 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001476 sodium potassium tartrate Substances 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229940113082 thymine Drugs 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Images
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
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Abstract
Description
凝縮器、温度計および攪拌棒を備えた100mL三ツ口丸底フラスコ中で、室温で、20mLのイソプロパノールに工業グレードのテトラエチレンペンタミン(11.86g、0.062mol)を溶解することによりコポリマー2が準備された。この溶液に、ジグリシジルエーテル末端ポリ(ジメチルシロキサン)(Mn〜800、25.04g、0.031mol)が滴下添加され、そしてこのジグリシジルエーテル末端ポリ(ジメチルシロキサン)を収容しているバイアルが2mLのイソプロパノールですすがれた。加熱浴温度が96℃に上げられた。得られた混合物は4時間にわたって加熱され、次いでこの反応系は室温で一晩攪拌し続けられた。貯蔵のために、反応混合物は水でポリエチレンボトルにすすぎ込まれた。テトラエチレンペンタミン:ジグリシジルエーテル末端ポリ(ジメチルシロキサン)のモル比はモノマーモル比を基準にして2:1であると決定された。
複数のスルーホールを有する4層または8層銅クラッド試験パネル上での無電解銅カバレッジの比較が、3つの異なるコンディショナーを用いて行われた。これらパネルはTUC−662、SY−1141、SY−1000−2、IT−158、IT−180およびNPG−150積層物から構築された。TUC−662はTaiwan Union Technologyから得られ、SY−1141およびSY−1000−2はShengyiから得られた。IT−158およびIT−180はITEQ Corp.からのものであり、並びにNPG−150はNanYa.からのものである。各パネルは5cm×12cmであった。
2.これらパネルはCIRCUPOSIT(商標)MLBプロモーター3308過マンガン酸塩溶液に80℃で3分間にわたって浸漬され、次いで、流れている水道水で2分間にわたってすすがれた。
3.各パネルは3%硫酸および3%過酸化水素の中和剤水溶液に室温で1分間にわたって浸漬され、その後、流れている水道水で2分間にわたってすすがれた。
4.次いで、これらパネルは2種類のコンディショナー溶液:APTES、60℃、および実施例1の表におけるコポリマー2、60℃、のうちの一方に90秒間にわたって浸漬され、その後、流れている水道水で2分間にわたってすすがれた。
5.次いで、これらパネルは1%硫酸および75g/Lの過硫酸ナトリウムの溶液で、室温で40秒間にわたってエッチングされ、その後、DI水で1分間にわたってすすがれた。
6.各パネルは、1%硝酸の酸性プレディップ中に、または1g/Lの炭酸カリウム塩基性プレディップ中に室温で30秒間にわたって浸漬された。
7.200ppmのパラジウムイオン、208ppmの2,6−ジメチルピラジンおよび1g/Lの炭酸カリウムの水性イオン性触媒(硝酸を用いてpHが9.5に調節された)をこれらパネルに40℃で2分間にわたって適用して、その後、DI水で30秒間にわたってこれらパネルをすすいだ。
8.次いで、各パネルは0.25Mジ亜リン酸ナトリウム還元剤溶液中に50℃で90秒間にわたって浸漬され、その後、DI水で20秒間にわたってすすがれた。
9.これらパネルはCIRCUPOSIT(商標)4500無電解銅浴中に52℃で5分間にわたって浸漬されて、これらパネルのスルーホールの壁上に銅をめっきした。
10.銅めっき後、これらパネルは流れている水道水で4分間にわたってすすがれた。
NP−175、370HR、TUC−752、TUC−662、SY−1141、SY−1000−2、IT−158、NPG−150およびIT−180積層材料から構築された、複数のスルーホールを有する4層または8層銅クラッド試験パネル上での無電解銅カバレッジの比較が、実施例1の表からのコポリマー1〜8のコンディショナーを使用して行われた。コンディショナー溶液は実施例2に記載される様に調製された。各パネルは5cm×12cmであり、以下のように処理された。
1.これらパネルはCIRCUPOSIT(商標)MLBプロモーター3308過マンガン酸塩溶液に80℃で3分間にわたって浸漬され、次いで、流れている水道水で2分間にわたってすすがれた。
2.各パネルは3%硫酸および3%過酸化水素の中和剤水溶液に室温で1分間にわたって浸漬され、その後、流れている水道水で2分間にわたってすすがれた。
3.次いで、これらパネルは8種類のコポリマーコンディショナー溶液に60℃で90秒間にわたって浸漬され、その後、流れている水道水で2分間にわたってすすがれた。
4.次いで、これらパネルは1%硫酸および75g/Lの過硫酸ナトリウムの溶液で、室温で40秒間にわたってエッチングされ、その後、DI水で1分間にわたってすすがれた。
5.各パネルは、1g/Lの炭酸カリウム塩基性プレディップ中に室温で30秒間にわたって浸漬された。
6.200ppmのパラジウムイオン、225ppmの6−ヒドロキシ−2,4−ジメチルピリミジンおよび1g/Lの炭酸カリウムの水性イオン性触媒(硝酸を用いてpHが9.5に調節された)をこれらパネルに40℃で2分間にわたって適用して、その後、DI水で30秒間にわたってこれらパネルをすすいだ。
7.次いで、各パネルは0.25Mジ亜リン酸ナトリウム還元剤溶液中に50℃で90秒間にわたって浸漬され、その後、DI水で20秒間にわたってすすがれた。
8.これらパネルはCIRCUPOSIT(商標)4500無電解銅浴中に52℃で5分間にわたって浸漬されて、これらパネルのスルーホールの壁上に銅をめっきした。
9.銅めっき後、これらパネルは流れている水道水で4分間にわたってすすがれた。
Claims (12)
- 1種以上のジグリシジルエーテル末端ポリシロキサン化合物と1種以上の非芳香族ポリアミンとの反応生成物を含むコポリマー。
- 前記1種以上の非芳香族ポリアミンが脂肪族ポリアミンおよび脂環式ポリアミンから選択される請求項1に記載のコポリマー。
- 前記1種以上の非芳香族ポリアミンが式
を有する請求項1に記載のコポリマー。 - 1種以上のジグリシジルエーテル末端ポリシロキサン化合物と1種以上の非芳香族ポリアミンとの反応生成物、並びに1種以上の有機溶媒を含む組成物。
- 前記1種以上の非芳香族ポリアミンが脂肪族ポリアミンおよび脂環式ポリアミンから選択される請求項5に記載の組成物。
- 1種以上の添加剤をさらに含む請求項6に記載の組成物。
- 前記1種以上の添加剤が有機溶媒、界面活性剤およびpH調節剤から選択される請求項8に記載の組成物。
- a)誘電体を含む基体を提供し、
b)1種以上のジグリシジルエーテル末端ポリシロキサン化合物と1種以上の非芳香族ポリアミンとの反応生成物を含む組成物を前記基体と接触させ、
c)前記基体に触媒を適用し、並びに
d)前記基体を無電解めっきする
ことを含む方法。 - 前記触媒がイオン性触媒である請求項10に記載の方法。
- 前記基体が複数のスルーホール、バイアまたはこれらの組み合わせをさらに含む、請求項10に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US14/287,075 | 2014-05-26 | ||
US14/287,075 US9499912B2 (en) | 2014-05-26 | 2014-05-26 | Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines |
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CN109762168B (zh) * | 2019-02-01 | 2021-04-16 | 哈尔滨工业大学 | 一种室温高效自修复有机硅柔性材料及其制备方法 |
CN112300666A (zh) * | 2020-12-02 | 2021-02-02 | 陕西科技大学 | 一种高耐磨抗腐蚀的石墨烯/环氧超滑移涂层及其制备方法 |
US20220348789A1 (en) * | 2021-04-22 | 2022-11-03 | Rohm and Haas Electronics Materials CMP Holdings, Inc. | Surface modified silanized colloidal silica particles |
US20220348790A1 (en) * | 2021-04-22 | 2022-11-03 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing composition and method |
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US20160102404A1 (en) | 2016-04-14 |
CN105330821B (zh) | 2018-08-28 |
EP2949715B1 (en) | 2019-05-08 |
CN105330821A (zh) | 2016-02-17 |
KR20150136030A (ko) | 2015-12-04 |
US9518324B2 (en) | 2016-12-13 |
TWI568776B (zh) | 2017-02-01 |
EP2949715A1 (en) | 2015-12-02 |
US20150342063A1 (en) | 2015-11-26 |
JP6642980B2 (ja) | 2020-02-12 |
US9499912B2 (en) | 2016-11-22 |
TW201609875A (zh) | 2016-03-16 |
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