JP2015222773A5 - - Google Patents
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- JP2015222773A5 JP2015222773A5 JP2014106457A JP2014106457A JP2015222773A5 JP 2015222773 A5 JP2015222773 A5 JP 2015222773A5 JP 2014106457 A JP2014106457 A JP 2014106457A JP 2014106457 A JP2014106457 A JP 2014106457A JP 2015222773 A5 JP2015222773 A5 JP 2015222773A5
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Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014106457A JP6448220B2 (ja) | 2014-05-22 | 2014-05-22 | 露光装置、露光方法及びデバイスの製造方法 |
| TW104112573A TWI572991B (zh) | 2014-05-22 | 2015-04-20 | 曝光設備、曝光方法、和製造裝置的方法 |
| KR1020150066380A KR101879263B1 (ko) | 2014-05-22 | 2015-05-13 | 노광장치, 노광방법 및 디바이스 제조방법 |
| US14/715,875 US9575413B2 (en) | 2014-05-22 | 2015-05-19 | Exposure apparatus, exposure method, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014106457A JP6448220B2 (ja) | 2014-05-22 | 2014-05-22 | 露光装置、露光方法及びデバイスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015222773A JP2015222773A (ja) | 2015-12-10 |
| JP2015222773A5 true JP2015222773A5 (cg-RX-API-DMAC7.html) | 2017-06-29 |
| JP6448220B2 JP6448220B2 (ja) | 2019-01-09 |
Family
ID=54555966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014106457A Active JP6448220B2 (ja) | 2014-05-22 | 2014-05-22 | 露光装置、露光方法及びデバイスの製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9575413B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6448220B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101879263B1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI572991B (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10295911B2 (en) * | 2016-05-19 | 2019-05-21 | Nikon Corporation | Extreme ultraviolet lithography system that utilizes pattern stitching |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07283106A (ja) * | 1994-04-07 | 1995-10-27 | Rohm Co Ltd | 露光装置及び露光方法 |
| JPH10256114A (ja) * | 1997-03-10 | 1998-09-25 | Sony Corp | フォトレジスト膜のパターン形成方法 |
| KR20010006432A (ko) * | 1997-04-18 | 2001-01-26 | 오노 시게오 | 노광량 제어 방법 및 장치, 노광 방법 및 장치, 및 디바이스 제조 방법 |
| JP4548969B2 (ja) * | 2001-04-20 | 2010-09-22 | パナソニック株式会社 | 露光装置、及び露光方法 |
| JP2003092252A (ja) | 2001-09-18 | 2003-03-28 | Canon Inc | 半導体露光方法および半導体露光装置 |
| JP2004281434A (ja) * | 2003-03-12 | 2004-10-07 | Toshiba Corp | ショットマップ作成方法、露光方法、プロセッサ、半導体装置の製造方法及びプログラム |
| JP2004335864A (ja) * | 2003-05-09 | 2004-11-25 | Nikon Corp | 露光装置及び露光方法 |
| JP4342844B2 (ja) | 2003-06-12 | 2009-10-14 | 株式会社アドテックエンジニアリング | 露光装置 |
| JP4688525B2 (ja) * | 2004-09-27 | 2011-05-25 | 株式会社 日立ディスプレイズ | パターン修正装置および表示装置の製造方法 |
| JP5309565B2 (ja) * | 2005-08-05 | 2013-10-09 | 株式会社ニコン | ステージ装置、露光装置、方法、露光方法、及びデバイス製造方法 |
| JP2009026962A (ja) * | 2007-07-19 | 2009-02-05 | Canon Inc | 露光装置、情報処理装置及びデバイス製造方法 |
| JP2010258085A (ja) * | 2009-04-22 | 2010-11-11 | Canon Inc | 面位置検出方法 |
| JP2012146701A (ja) * | 2011-01-06 | 2012-08-02 | Nikon Corp | 露光方法及び露光装置 |
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2014
- 2014-05-22 JP JP2014106457A patent/JP6448220B2/ja active Active
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2015
- 2015-04-20 TW TW104112573A patent/TWI572991B/zh active
- 2015-05-13 KR KR1020150066380A patent/KR101879263B1/ko active Active
- 2015-05-19 US US14/715,875 patent/US9575413B2/en active Active