JP2015222279A - 樹脂組成物、感光性樹脂組成物、及びカラーフィルター - Google Patents

樹脂組成物、感光性樹脂組成物、及びカラーフィルター Download PDF

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Publication number
JP2015222279A
JP2015222279A JP2012212582A JP2012212582A JP2015222279A JP 2015222279 A JP2015222279 A JP 2015222279A JP 2012212582 A JP2012212582 A JP 2012212582A JP 2012212582 A JP2012212582 A JP 2012212582A JP 2015222279 A JP2015222279 A JP 2015222279A
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JP
Japan
Prior art keywords
meth
resin composition
acrylate
copolymer
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012212582A
Other languages
English (en)
Japanese (ja)
Inventor
正義 柳
Masayoshi Yanagi
正義 柳
健宏 木下
Takehiro Kinoshita
健宏 木下
恭章 川口
Yasuaki Kawaguchi
恭章 川口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP2012212582A priority Critical patent/JP2015222279A/ja
Priority to PCT/JP2013/075019 priority patent/WO2014050633A1/ja
Priority to TW102134539A priority patent/TW201421153A/zh
Publication of JP2015222279A publication Critical patent/JP2015222279A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
JP2012212582A 2012-09-26 2012-09-26 樹脂組成物、感光性樹脂組成物、及びカラーフィルター Pending JP2015222279A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012212582A JP2015222279A (ja) 2012-09-26 2012-09-26 樹脂組成物、感光性樹脂組成物、及びカラーフィルター
PCT/JP2013/075019 WO2014050633A1 (ja) 2012-09-26 2013-09-17 樹脂組成物、感光性樹脂組成物、及びカラーフィルター
TW102134539A TW201421153A (zh) 2012-09-26 2013-09-25 樹脂組成物、感光性樹脂組成物及彩色濾光片

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012212582A JP2015222279A (ja) 2012-09-26 2012-09-26 樹脂組成物、感光性樹脂組成物、及びカラーフィルター

Publications (1)

Publication Number Publication Date
JP2015222279A true JP2015222279A (ja) 2015-12-10

Family

ID=50388039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012212582A Pending JP2015222279A (ja) 2012-09-26 2012-09-26 樹脂組成物、感光性樹脂組成物、及びカラーフィルター

Country Status (3)

Country Link
JP (1) JP2015222279A (zh)
TW (1) TW201421153A (zh)
WO (1) WO2014050633A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230098322A (ko) 2020-12-11 2023-07-03 가부시끼가이샤 레조낙 감광성 수지 조성물 및 감광성 수지 조성물의 제조 방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018009043A (ja) * 2014-11-14 2018-01-18 昭和電工株式会社 樹脂組成物、その製造方法、カラーフィルター及び画像表示素子
CN114539586B (zh) * 2022-04-27 2022-07-19 河南银金达新材料股份有限公司 一种聚合物膜的表面处理生产和检测工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4232410B2 (ja) * 2002-08-19 2009-03-04 チッソ株式会社 光硬化性樹脂組成物およびそれを用いた表示素子
JP2004237605A (ja) * 2003-02-06 2004-08-26 Fuji Photo Film Co Ltd 感熱性平版印刷版
JP4140924B2 (ja) * 2004-03-31 2008-08-27 富山県 塗膜形成剤及びドットパタンを有するチップの製造方法
JP2008102505A (ja) * 2006-09-21 2008-05-01 Mitsubishi Chemicals Corp カラーフィルタ用硬化性樹脂組成物、カラーフィルタ、および液晶表示装置
CN102859439B (zh) * 2010-04-27 2017-06-30 Jsr株式会社 正型感射线性组合物、显示元件用层间绝缘膜及其形成方法
JP5636918B2 (ja) * 2010-11-30 2014-12-10 Jsr株式会社 感放射線性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法、及び表示素子

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230098322A (ko) 2020-12-11 2023-07-03 가부시끼가이샤 레조낙 감광성 수지 조성물 및 감광성 수지 조성물의 제조 방법

Also Published As

Publication number Publication date
WO2014050633A1 (ja) 2014-04-03
TW201421153A (zh) 2014-06-01

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