JP2015213113A5 - - Google Patents

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Publication number
JP2015213113A5
JP2015213113A5 JP2014094878A JP2014094878A JP2015213113A5 JP 2015213113 A5 JP2015213113 A5 JP 2015213113A5 JP 2014094878 A JP2014094878 A JP 2014094878A JP 2014094878 A JP2014094878 A JP 2014094878A JP 2015213113 A5 JP2015213113 A5 JP 2015213113A5
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JP
Japan
Prior art keywords
unit
base member
lithographic apparatus
relative position
stage
Prior art date
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JP2014094878A
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English (en)
Japanese (ja)
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JP2015213113A (ja
JP6316084B2 (ja
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Priority to JP2014094878A priority Critical patent/JP6316084B2/ja
Priority claimed from JP2014094878A external-priority patent/JP6316084B2/ja
Priority to US14/698,982 priority patent/US9947508B2/en
Publication of JP2015213113A publication Critical patent/JP2015213113A/ja
Publication of JP2015213113A5 publication Critical patent/JP2015213113A5/ja
Application granted granted Critical
Publication of JP6316084B2 publication Critical patent/JP6316084B2/ja
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JP2014094878A 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法 Active JP6316084B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014094878A JP6316084B2 (ja) 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法
US14/698,982 US9947508B2 (en) 2014-05-01 2015-04-29 Lithography apparatus, and method of manufacturing an article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014094878A JP6316084B2 (ja) 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015213113A JP2015213113A (ja) 2015-11-26
JP2015213113A5 true JP2015213113A5 (enExample) 2017-06-15
JP6316084B2 JP6316084B2 (ja) 2018-04-25

Family

ID=54355729

Family Applications (1)

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JP2014094878A Active JP6316084B2 (ja) 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法

Country Status (2)

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US (1) US9947508B2 (enExample)
JP (1) JP6316084B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7178944B2 (ja) * 2019-04-09 2022-11-28 株式会社ニューフレアテクノロジー ステージ装置
JP7604330B2 (ja) * 2021-06-21 2024-12-23 株式会社ニューフレアテクノロジー 描画装置及び描画方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3704694B2 (ja) * 1996-03-22 2005-10-12 株式会社ニコン 荷電粒子線転写装置
JP2000114137A (ja) * 1998-09-30 2000-04-21 Advantest Corp 電子ビーム露光装置及びアライメント方法
US6614504B2 (en) * 2000-03-30 2003-09-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2002198285A (ja) * 2000-12-25 2002-07-12 Nikon Corp ステージ装置およびその制振方法並びに露光装置
JP3713450B2 (ja) * 2001-05-22 2005-11-09 株式会社日立製作所 走査形電子顕微鏡
JP4205390B2 (ja) * 2002-09-12 2009-01-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP4074224B2 (ja) * 2003-06-26 2008-04-09 住友重機械工業株式会社 真空装置及び電子ビーム近接露光装置
JP2006100747A (ja) * 2004-09-30 2006-04-13 Nikon Corp ステージ装置、ステージ装置の調整方法及び露光装置
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4535991B2 (ja) * 2005-11-29 2010-09-01 京セラ株式会社 静圧スライダ
JP2009076583A (ja) * 2007-09-19 2009-04-09 Nikon Corp ステージ装置、露光装置、露光方法及びデバイス製造方法
JP2015106604A (ja) * 2013-11-29 2015-06-08 キヤノン株式会社 ビームの傾き計測方法、描画方法、描画装置、及び物品の製造方法
JP2015198121A (ja) * 2014-03-31 2015-11-09 キヤノン株式会社 リソグラフィ装置、ステージ装置、及び物品の製造方法

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