JP2015213113A5 - - Google Patents

Download PDF

Info

Publication number
JP2015213113A5
JP2015213113A5 JP2014094878A JP2014094878A JP2015213113A5 JP 2015213113 A5 JP2015213113 A5 JP 2015213113A5 JP 2014094878 A JP2014094878 A JP 2014094878A JP 2014094878 A JP2014094878 A JP 2014094878A JP 2015213113 A5 JP2015213113 A5 JP 2015213113A5
Authority
JP
Japan
Prior art keywords
unit
base member
lithographic apparatus
relative position
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014094878A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015213113A (ja
JP6316084B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014094878A priority Critical patent/JP6316084B2/ja
Priority claimed from JP2014094878A external-priority patent/JP6316084B2/ja
Priority to US14/698,982 priority patent/US9947508B2/en
Publication of JP2015213113A publication Critical patent/JP2015213113A/ja
Publication of JP2015213113A5 publication Critical patent/JP2015213113A5/ja
Application granted granted Critical
Publication of JP6316084B2 publication Critical patent/JP6316084B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014094878A 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法 Expired - Fee Related JP6316084B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014094878A JP6316084B2 (ja) 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法
US14/698,982 US9947508B2 (en) 2014-05-01 2015-04-29 Lithography apparatus, and method of manufacturing an article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014094878A JP6316084B2 (ja) 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015213113A JP2015213113A (ja) 2015-11-26
JP2015213113A5 true JP2015213113A5 (enExample) 2017-06-15
JP6316084B2 JP6316084B2 (ja) 2018-04-25

Family

ID=54355729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014094878A Expired - Fee Related JP6316084B2 (ja) 2014-05-01 2014-05-01 リソグラフィ装置、および物品の製造方法

Country Status (2)

Country Link
US (1) US9947508B2 (enExample)
JP (1) JP6316084B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7178944B2 (ja) * 2019-04-09 2022-11-28 株式会社ニューフレアテクノロジー ステージ装置
JP7604330B2 (ja) * 2021-06-21 2024-12-23 株式会社ニューフレアテクノロジー 描画装置及び描画方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3704694B2 (ja) * 1996-03-22 2005-10-12 株式会社ニコン 荷電粒子線転写装置
JP2000114137A (ja) * 1998-09-30 2000-04-21 Advantest Corp 電子ビーム露光装置及びアライメント方法
KR20010095087A (ko) * 2000-03-30 2001-11-03 시마무라 테루오 노광장치, 노광방법 및 디바이스의 제조방법
JP2002198285A (ja) * 2000-12-25 2002-07-12 Nikon Corp ステージ装置およびその制振方法並びに露光装置
JP3713450B2 (ja) * 2001-05-22 2005-11-09 株式会社日立製作所 走査形電子顕微鏡
JP4205390B2 (ja) * 2002-09-12 2009-01-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP4074224B2 (ja) * 2003-06-26 2008-04-09 住友重機械工業株式会社 真空装置及び電子ビーム近接露光装置
JP2006100747A (ja) * 2004-09-30 2006-04-13 Nikon Corp ステージ装置、ステージ装置の調整方法及び露光装置
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4535991B2 (ja) * 2005-11-29 2010-09-01 京セラ株式会社 静圧スライダ
JP2009076583A (ja) * 2007-09-19 2009-04-09 Nikon Corp ステージ装置、露光装置、露光方法及びデバイス製造方法
JP2015106604A (ja) * 2013-11-29 2015-06-08 キヤノン株式会社 ビームの傾き計測方法、描画方法、描画装置、及び物品の製造方法
JP2015198121A (ja) * 2014-03-31 2015-11-09 キヤノン株式会社 リソグラフィ装置、ステージ装置、及び物品の製造方法

Similar Documents

Publication Publication Date Title
EP2947512A3 (en) Lithography apparatus, determination method, and method of manufacturing article
EP3647786A4 (en) BASIC MATERIAL FOR MANUFACTURING A SENSOR FOR ANALYSIS OF A DETECTION TARGET, SENSOR FOR ANALYSIS OF A DETECTION TARGET, METHOD FOR ANALYSIS OF THE DETECTION TARGET
JP2016535690A5 (enExample)
MX383905B (es) Dispositivo de medición de tensión residual y método de medición de tensión residual.
JP2014203935A5 (enExample)
JP2014046433A5 (ja) 情報処理システム、装置、方法及びプログラム
JP2015111657A5 (enExample)
JP2013138175A5 (enExample)
EP2801889A3 (en) Flexible device and method for detecting the shape of the flexible device
JP2015170815A5 (enExample)
TW201614188A (en) Method for controlling a distance between two objects, inspection apparatus and method
JP2016184638A5 (enExample)
JP2015220447A5 (enExample)
MX2016013016A (es) Robot humanoide con ruedas omnidireccionales basado en una posición predictiva lineal y un controlador de velocidad.
JP2015534918A5 (enExample)
TW200943006A (en) Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP2012220338A5 (enExample)
JP2012220341A5 (enExample)
JP2016213418A5 (enExample)
JP2018500996A5 (enExample)
WO2009033935A3 (de) Anordnung zum erfassen einer umgebung
FR3026842B1 (fr) Procede de detection d'un defaut de cablage d'un capteur capacitif
JP2017044773A5 (enExample)
JP2016022010A5 (enExample)
WO2016097302A3 (fr) Capteur de pression dynamique a fonctionnement ameliore