JP2015207559A5 - - Google Patents

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Publication number
JP2015207559A5
JP2015207559A5 JP2015085117A JP2015085117A JP2015207559A5 JP 2015207559 A5 JP2015207559 A5 JP 2015207559A5 JP 2015085117 A JP2015085117 A JP 2015085117A JP 2015085117 A JP2015085117 A JP 2015085117A JP 2015207559 A5 JP2015207559 A5 JP 2015207559A5
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JP
Japan
Prior art keywords
ray
structures
hadamard matrix
high aspect
aspect ratio
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JP2015085117A
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English (en)
Japanese (ja)
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JP6499498B2 (ja
JP2015207559A (ja
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Priority claimed from US14/645,689 external-priority patent/US9934930B2/en
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Publication of JP2015207559A publication Critical patent/JP2015207559A/ja
Publication of JP2015207559A5 publication Critical patent/JP2015207559A5/ja
Application granted granted Critical
Publication of JP6499498B2 publication Critical patent/JP6499498B2/ja
Expired - Fee Related legal-status Critical Current
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JP2015085117A 2014-04-18 2015-04-17 高アスペクト比ｘ線ターゲットおよびその使用 Expired - Fee Related JP6499498B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201461981330P 2014-04-18 2014-04-18
US61/981,330 2014-04-18
US14/645,689 US9934930B2 (en) 2014-04-18 2015-03-12 High aspect ratio x-ray targets and uses of same
US14/645,689 2015-03-12

Publications (3)

Publication Number Publication Date
JP2015207559A JP2015207559A (ja) 2015-11-19
JP2015207559A5 true JP2015207559A5 (OSRAM) 2018-06-07
JP6499498B2 JP6499498B2 (ja) 2019-04-10

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Family Applications (1)

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JP2015085117A Expired - Fee Related JP6499498B2 (ja) 2014-04-18 2015-04-17 高アスペクト比ｘ線ターゲットおよびその使用

Country Status (3)

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US (2) US9934930B2 (OSRAM)
JP (1) JP6499498B2 (OSRAM)
CN (1) CN105105779B (OSRAM)

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USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
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US10520454B2 (en) 2017-05-02 2019-12-31 Fei Company Innovative X-ray source for use in tomographic imaging
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CN109243947B (zh) * 2017-07-11 2023-05-02 Fei 公司 用于x射线生成的薄片状靶
US10566170B2 (en) * 2017-09-08 2020-02-18 Electronics And Telecommunications Research Institute X-ray imaging device and driving method thereof
JP2021082374A (ja) * 2018-03-09 2021-05-27 国立大学法人東北大学 位相イメージング用ｘ線発生装置
US10468230B2 (en) * 2018-04-10 2019-11-05 Bae Systems Information And Electronic Systems Integration Inc. Nondestructive sample imaging
CN112424591B (zh) 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) * 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN109255818B (zh) * 2018-08-12 2021-05-28 浙江农林大学 一种新型标靶及其亚像素级角点的提取方法
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
US11340179B2 (en) 2019-10-21 2022-05-24 Bae Systems Information And Electronic System Integration Inc. Nanofabricated structures for sub-beam resolution and spectral enhancement in tomographic imaging
US11996259B2 (en) * 2019-10-24 2024-05-28 Nova Measuring Instruments Inc. Patterned x-ray emitting target
EP4024436A1 (en) * 2020-12-31 2022-07-06 VEC Imaging GmbH & Co. KG Hybrid multi-source x-ray source and imaging system
CN118541772A (zh) 2022-01-13 2024-08-23 斯格瑞公司 用于生成高通量低能量x射线的微焦x射线源
WO2023168204A1 (en) 2022-03-02 2023-09-07 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

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US6545790B2 (en) * 1999-11-08 2003-04-08 Ralph W. Gerchberg System and method for recovering phase information of a wave front
JP3847134B2 (ja) * 2001-10-19 2006-11-15 三井造船株式会社 放射線検出装置
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WO2007033060A1 (en) * 2005-09-12 2007-03-22 Board Of Regents Of The Nevada System Of Higher Education, On Behalf Of The University Of Nevada, Reno Targets and processes for fabricating same
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