CN105105779B - 高深宽比x射线标靶及其用途 - Google Patents

高深宽比x射线标靶及其用途 Download PDF

Info

Publication number
CN105105779B
CN105105779B CN201510398704.3A CN201510398704A CN105105779B CN 105105779 B CN105105779 B CN 105105779B CN 201510398704 A CN201510398704 A CN 201510398704A CN 105105779 B CN105105779 B CN 105105779B
Authority
CN
China
Prior art keywords
ray
structures
hadamard matrix
aspect ratio
hadamard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201510398704.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN105105779A (zh
Inventor
N·W·帕克
M·W·乌特劳特
L·F·T·夸曼
T·G·米勒
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of CN105105779A publication Critical patent/CN105105779A/zh
Application granted granted Critical
Publication of CN105105779B publication Critical patent/CN105105779B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/046—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/20—Sources of radiation
    • G01N2223/204—Sources of radiation source created from radiated target
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/419—Imaging computed tomograph
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/086—Target geometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/147—Spot size control

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Pulmonology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Analytical Chemistry (AREA)
  • Radiology & Medical Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
CN201510398704.3A 2014-04-18 2015-04-17 高深宽比x射线标靶及其用途 Expired - Fee Related CN105105779B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201461981330P 2014-04-18 2014-04-18
US61/981330 2014-04-18
US14/645689 2015-03-12
US14/645,689 US9934930B2 (en) 2014-04-18 2015-03-12 High aspect ratio x-ray targets and uses of same

Publications (2)

Publication Number Publication Date
CN105105779A CN105105779A (zh) 2015-12-02
CN105105779B true CN105105779B (zh) 2020-02-14

Family

ID=54322599

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510398704.3A Expired - Fee Related CN105105779B (zh) 2014-04-18 2015-04-17 高深宽比x射线标靶及其用途

Country Status (3)

Country Link
US (2) US9934930B2 (OSRAM)
JP (1) JP6499498B2 (OSRAM)
CN (1) CN105105779B (OSRAM)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
CN107251094B (zh) 2014-08-16 2021-01-08 Fei公司 用于材料特性描述的断层图像重建
US10520454B2 (en) 2017-05-02 2019-12-31 Fei Company Innovative X-ray source for use in tomographic imaging
EP3413691A1 (en) * 2017-06-08 2018-12-12 Koninklijke Philips N.V. Apparatus for generating x-rays
CN109243947B (zh) * 2017-07-11 2023-05-02 Fei 公司 用于x射线生成的薄片状靶
US10566170B2 (en) * 2017-09-08 2020-02-18 Electronics And Telecommunications Research Institute X-ray imaging device and driving method thereof
JP2021082374A (ja) * 2018-03-09 2021-05-27 国立大学法人東北大学 位相イメージング用ｘ線発生装置
US10468230B2 (en) * 2018-04-10 2019-11-05 Bae Systems Information And Electronic Systems Integration Inc. Nondestructive sample imaging
CN112424591B (zh) 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) * 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN109255818B (zh) * 2018-08-12 2021-05-28 浙江农林大学 一种新型标靶及其亚像素级角点的提取方法
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
US11340179B2 (en) 2019-10-21 2022-05-24 Bae Systems Information And Electronic System Integration Inc. Nanofabricated structures for sub-beam resolution and spectral enhancement in tomographic imaging
US11996259B2 (en) * 2019-10-24 2024-05-28 Nova Measuring Instruments Inc. Patterned x-ray emitting target
EP4024436A1 (en) * 2020-12-31 2022-07-06 VEC Imaging GmbH & Co. KG Hybrid multi-source x-ray source and imaging system
CN118541772A (zh) 2022-01-13 2024-08-23 斯格瑞公司 用于生成高通量低能量x射线的微焦x射线源
WO2023168204A1 (en) 2022-03-02 2023-09-07 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3610984A (en) * 1967-12-28 1971-10-05 Tokyo Shibaura Electric Co Rotating-anode x-ray tube with multiple focal areas
US6545790B2 (en) * 1999-11-08 2003-04-08 Ralph W. Gerchberg System and method for recovering phase information of a wave front
JP3847134B2 (ja) * 2001-10-19 2006-11-15 三井造船株式会社 放射線検出装置
US6793039B2 (en) * 2002-03-13 2004-09-21 Jerome R. Schmid, Jr. Submerged water activity platform
US6947522B2 (en) * 2002-12-20 2005-09-20 General Electric Company Rotating notched transmission x-ray for multiple focal spots
US6950495B2 (en) * 2003-12-01 2005-09-27 The Boeing Company Backscatter imaging using Hadamard transform masking
WO2007033060A1 (en) * 2005-09-12 2007-03-22 Board Of Regents Of The Nevada System Of Higher Education, On Behalf Of The University Of Nevada, Reno Targets and processes for fabricating same
WO2008063695A2 (en) * 2006-04-21 2008-05-29 American Science And Engineering, Inc. X-ray imaging of baggage and personnel using arrays of discrete sources and multiple collimated beams
CA2665872C (en) * 2006-10-24 2013-04-02 Thermo Niton Analyzers Llc Apparatus for inspecting objects using coded beam
KR20100071564A (ko) * 2008-12-19 2010-06-29 삼성전기주식회사 엑스선 튜브
US20120027173A1 (en) * 2009-03-27 2012-02-02 Koninklijke Philips Electronics N.V. Structured electron emitter for coded source imaging with an x-ray tube
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
JP6202484B2 (ja) * 2012-08-10 2017-09-27 国立研究開発法人物質・材料研究機構 中性子撮像装置及びその使用方法
JP2014038742A (ja) * 2012-08-13 2014-02-27 Tokyo Electron Ltd Ｘ線発生用ターゲットの製造方法、及びｘ線発生用ターゲット
US20150092924A1 (en) 2013-09-04 2015-04-02 Wenbing Yun Structured targets for x-ray generation
US9874531B2 (en) 2013-10-31 2018-01-23 Sigray, Inc. X-ray method for the measurement, characterization, and analysis of periodic structures
EP3171163B1 (en) * 2015-11-18 2022-05-04 FEI Company X-ray imaging technique

Also Published As

Publication number Publication date
JP6499498B2 (ja) 2019-04-10
US20150303021A1 (en) 2015-10-22
US10366860B2 (en) 2019-07-30
US9934930B2 (en) 2018-04-03
US20180190467A1 (en) 2018-07-05
CN105105779A (zh) 2015-12-02
JP2015207559A (ja) 2015-11-19

Similar Documents

Publication Publication Date Title
US10366860B2 (en) High aspect ratio X-ray targets and uses of same
JP6905555B2 (ja) 荷電粒子ビーム装置、荷電粒子ビーム装置のためのマルチビームブランカ、および荷電粒子ビーム装置を動作させるための方法
JP7250948B2 (ja) 電流測定一体型アパーチャアレイ
JP6845900B2 (ja) 荷電粒子ビーム装置、荷電粒子ビーム装置のためのマルチビームブランカ、および荷電粒子ビーム装置を動作させるための方法
US9618460B2 (en) Method of performing tomographic imaging of a sample in a charged-particle microscope
US9275830B2 (en) Scanning charged particle microscope, image acquisition method, and electron detection method
US9535020B2 (en) Analyzing an object using a particle beam apparatus
JP5805831B2 (ja) 切り換え型マルチパースペクティブ検出器、切り換え型マルチパースペクティブ検出器用光学系、及び切り換え型マルチパースペクティブ検出器の動作方法
EP2068345B1 (en) High resolution gas field ion column with reduced sample load
JP2026040580A (ja) 走査型電子顕微鏡および走査型電子顕微鏡の２次電子検出方法
EP2355125A2 (en) Particle beam device and method for operation of a particle beam device
TW201624523A (zh) 高解析度帶電粒子束裝置及其操作方法
Notte et al. An Introduction to Helium Ion Microscopy and its Nanotechnology Applications
US20110049364A1 (en) Reducing particle implantation
JP5586593B2 (ja) 試料検査方法、システム及び構成要素
JP7505794B2 (ja) 球面収差調整カソードレンズ、球面収差補正静電型レンズ、電子分光装置、及び光電子顕微鏡
JP2025506560A (ja) 試料上の粒子ビーム誘起痕を低減させるためのマルチビーム粒子顕微鏡
Roberts et al. A miniature, all-electrostatic, field emission electron column for surface analytical microscopy
Park et al. FIB overview
Ul-Hamid Specialized SEM Techniques
WO2010126958A1 (en) Voltage contrast imaging
Egerton Experimental techniques and instrumentation
CN121693795A (zh) 带电粒子检测系统
Liebl Ion probe microscopy
WO2009079195A1 (en) Ion beam imaging

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20200214

Termination date: 20210417