WO2013133021A1 - 走査型電子顕微鏡の画像処理装置、および、走査方法 - Google Patents
走査型電子顕微鏡の画像処理装置、および、走査方法 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
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- the present invention relates to an image processing apparatus for a scanning electron microscope and a scanning method.
- a scanning electron microscope scans a sample with an electron beam emitted from an electron gun, detects secondary electrons generated from the surface of the sample, and processes the obtained signal.
- An image SEM image
- the SEM image is used for sample observation and measurement.
- Scanning electron microscopes are widely applied to measurement of semiconductor devices, and with the miniaturization of semiconductor devices, the measurement technology needs to support measurement of a wide variety of pattern edges.
- one-dimensional measurement such as line and space measurement
- two-dimensional dimension measurement such as contact holes and wiring pattern edges.
- Patent Document 1 a line group that is substantially orthogonal to the pattern edge and a line group that is substantially parallel to the pattern edge are created from the shape information of the pattern edge to be inspected, and a grid defined by these line groups. It is described that the scanning direction of the electron beam perpendicular to the edge is determined from the group. As a result, the pattern edge image and the scanning direction of the electron beam are perpendicular to each other, so that a pattern edge image can be clearly obtained.
- shape distortion and brightness unevenness occur in the acquired image due to a charging phenomenon that occurs when the sample is irradiated with an electron beam.
- a charging phenomenon that occurs when the sample is irradiated with an electron beam.
- the method of Patent Document 1 is applied to a pattern edge having a curve such as a hole pattern, the electron beam irradiation areas overlap at the inner diameter of the curve, and the charge amount increases. As a result, an image drift due to a change in charge amount occurs.
- the main object of the present invention is to solve the above-described problems and acquire a highly accurate image as a pattern edge scanning result by a scanning electron microscope.
- the present invention is an image processing apparatus that processes image data captured by irradiating an imaging target with an electron beam of a scanning electron microscope, Means for causing a scanning electron microscope to photograph an imaging region including a pattern edge to be imaged, and obtaining a captured image; Means for dividing the acquired captured image into a plurality of scanning regions, and determining a scanning direction of each scanning region based on the pattern edge photographed in each scanning region in the captured image; Means for determining a scanning order in which raster scanning is performed for each pixel constituting each scanning region so that the scanning direction of each determined scanning region is a horizontal direction of raster scanning; Means for acquiring a scanned image by causing a scanning electron microscope to photograph each of the scanning regions in accordance with the determined scanning order. Other means will be described later.
- a highly accurate image can be acquired as a pattern edge scanning result by a scanning electron microscope.
- FIG. 2A shows a captured image.
- FIG. 2B shows a scanning area extracted from the lower left of the imaging area in FIG.
- FIG. 2C shows the scanning direction determined from each scanning region in FIG.
- FIG. 3A shows the scanning direction of the scanning region.
- FIG. 3B shows the relationship between the scanning direction and the scanning order.
- FIG. 3C shows the scanning order for each pixel according to the scanning direction and the scanning order.
- FIG. 5A shows a variation of the region shape indicating the range of the scanning region.
- FIG. 5B shows selectable scan direction patterns.
- FIG. 5C shows a display example of the GUI screen.
- FIG. 1 is a configuration diagram showing a scanning electron microscope system.
- the scanning electron microscope system includes an image processing apparatus 1, an external storage medium 2, an electron beam control unit 3, a housing 4, and an image generation unit 5.
- the image processing apparatus 1 is configured as a computer having a CPU (Central Processing Unit), a memory, a hard disk (storage means), and a network interface, and the computer executes each program read on the memory, thereby Operate the processing unit.
- the image processing apparatus 1 is connected to a display that is a display unit.
- the external storage medium 2 holds image data or pattern shape information (CAD data or the like).
- the electron beam control unit 3 controls the electron beam according to the scanning method determined by the image processing apparatus 1.
- the housing 4 detects an electron gun 401, a scanning coil 403 that controls the irradiation position of the electron beam 402 emitted from the electron gun, and secondary electrons 405 emitted from the sample 404 based on the irradiation position of the electron beam 402.
- the secondary electron detection unit 406 is configured.
- the image generation unit 5 generates information detected by the housing 4 as an image.
- FIG. 2 is an explanatory diagram showing each image processing for a captured image.
- the image generation unit 5 generates two types of images (captured images and scanned images) as the imaging results of the same sample 404.
- the captured image shown in FIG. 2 (a) is obtained by capturing an imaging region (FOV: Field of View) as an imaging range.
- the imaging region is a wider range than a scanning image capturing range (referred to as a scanning region) such as 512 ⁇ 512 pixels.
- the purpose of generating the captured image is to determine the parameters for capturing the scanned image.
- the captured image is not shown to the user as the result of capturing the sample 404, but the captured image may be displayed to the user as it is.
- the scanned image is obtained by photographing a scanning area such as 5 ⁇ 5 pixels or 1 ⁇ 1 pixel as an imaging range.
- the scanning area is an area obtained by dividing one imaging area into a plurality of area shapes (squares in FIG. 2A), and there is no overlapping area between one scanning area and another scanning area.
- FIG. 2A shows that one imaging area is divided into (i + 1) ⁇ (j + 1) scanning areas, and a sample 404 (imaging target) is displayed at the lower left of the imaging area. Is taken as a pattern edge PE.
- the position of the scanning area within the imaging area is expressed as a matrix such as “A i, j ”. “A i, j ” indicates a scanning area located at the horizontal i-th position and the vertical j-th position in the imaging area.
- the image processing apparatus 1 calculates parameters (scanning direction, scanning order, pixel scanning order) for capturing a scanned image for each scanning region. For example, since the pattern edge PE is photographed from the upper left to the lower right in the scanning area “A 1, j ⁇ 2 ”, the scanning direction is set to be orthogonal when the pattern edge PE is approximated to a straight line. decide.
- the scanning direction of the adjacent scanning area “A 1, j-2 ” may be the same direction as the scanning direction (arrow from upper right to lower left).
- the process of utilizing the scanning direction of the adjacent scanning area in the scanning direction of the own scanning area may be executed regardless of whether or not the pattern edge PE is captured in the own scanning area. As a result, the scanning regions in the same scanning direction are continuous, and the movement to the scanning start position is reduced, so that the scanning time can be shortened.
- the scanning area “A 1, j-3 ” is a scanning area in which the pattern edge PE is not imaged, and therefore, the calculation of the scanning direction for this scanning area is omitted and scanning is performed.
- the scanning process (scanned image creation process) for the area “A 1, j-3 ” may be omitted (or scanned faster than other scanning areas). Thereby, the shrinkage by electron beam irradiation can also be reduced.
- FIG. 3 is an explanatory diagram illustrating a process of determining the pixel scanning order for each scanning region.
- the scanning direction of the scanning area “A 1, j-2 ” is calculated as an arrow from the upper right to the lower left as described in FIG. 2B.
- the scanning order of the scanning area “A 1, j-2 ” is set to be orthogonal to the scanning direction.
- the scanning order for each pixel in the scanning area “A 1, j-2 ” (hereinafter referred to as pixel scanning order) covers the scanning area according to the scanning order.
- This setting process can be said to be raster scanning for a scanning area when the scanning direction is the horizontal direction in raster scanning and the scanning order is the vertical direction in raster scanning.
- FIG. 4 is a flowchart showing each process by the scanning electron microscope system. Each procedure shown in these flowcharts is realized by the image processing apparatus 1 reading a program stored in the external storage medium 2 in advance into the memory and executing it.
- the image processing apparatus 1 acquires the pattern edge PE in the imaging region from the external storage medium 2 and holds it as edge information in the image processing apparatus 1.
- Edge information to be acquired includes a captured image or CAD data acquired in advance.
- the information on the pattern edge PE held by the image processing apparatus 1 is converted into image data of the number of pixels that can be set by the electron beam control unit 3.
- S11 to S14 shown below an example of acquiring information on the pattern edge PE from a captured image acquired in advance is shown.
- the image processing apparatus 1 determines the shooting magnification (determines the size of the imaging area). For example, when observing a semiconductor integrated circuit wafer, an image of the entire wafer cannot be acquired at once. Therefore, the user designates an imaging region on a GUI (Graphical User Interface) screen displayed on the display unit of the image processing apparatus 1, and acquires the designated imaging region as an image of 512 ⁇ 512 pixels or the like.
- GUI Graphic User Interface
- the image processing apparatus 1 determines a pattern in the scanning direction of the electron beam. For example, a scanning direction that is perpendicular to the pattern edge displayed in the imaging region is determined. When there are a plurality of pattern edge directions displayed in the imaging region, the image processing apparatus 1 determines a scanning direction that is perpendicular to each pattern edge.
- the image processing apparatus 1 scans the electron beam according to the scanning direction that has not been used for imaging among the patterns in the scanning direction determined in S12, images the imaging area, and stores it as a captured image. That is, the scanning direction determined in S12 is set in the electron beam control unit 3, the set scanning direction is set in the electron beam control unit 3 from the image processing apparatus 1, an image is generated by the image generation unit 5, and image processing is performed. It is stored in the external storage medium 2 via the device 1.
- the image processing apparatus 1 determines whether or not the captured image has been captured. When there is a pattern that is not used for photographing in S13 among the patterns in the scanning direction determined in S12, imaging is not completed (S14, No), and the process returns to S13.
- the image processing apparatus 1 divides the captured image indicating the imaging region determined in S11 into a plurality of scanning regions.
- the image processing apparatus 1 evaluates the captured image divided in S21 for each scanning region, and determines the scanning direction for each scanning region. For example, as shown in FIG. 3, the image evaluation may determine the scanning direction by linear approximation of the pattern edge PE, or may be included in the captured image taken for each pattern in the scanning direction determined in S12. The scanning direction of the captured image in which the pattern edge PE is most clearly captured may be determined as the scanning direction of the scanning region.
- an evaluation function of the degree of clear imaging for example, an evaluation function that is clearly captured as the difference in pixel values (for example, brightness values) between adjacent pixels in the captured image increases. It may be used.
- the image processing apparatus 1 creates a pixel scanning order for each scanning region for each scanning region from the scanning direction determined in S22, as shown in FIGS. 3B to 3C. Thereby, the scanning of the electron beam is performed in the scanning direction substantially perpendicular to the pattern edge PE.
- the image processing apparatus 1 sets the pixel scanning order determined in S23 in the electron beam control unit 3, images the scanning area, and stores the imaging result as a scanned image. Scanned images are taken for each scanning area, and there are no overlapping areas between the scanning areas, so the electron beam irradiation areas do not overlap. It becomes.
- the image processing apparatus 1 displays the scanned image on the GUI screen displayed on the display unit of the image processing apparatus 1.
- the shooting parameters such as the scanning region and the scanning direction in combination with the scanning image, the influence of the scanning direction on the image can be analyzed.
- FIG. 5 is an explanatory diagram showing details of each process of FIG.
- FIG. 5A shows a variation of the area shape indicating the range of one scanning area when the captured image of S21 is divided into a plurality of scanning areas.
- the area shape of the scanning area is not limited to a square, but may be an L shape, a concave shape, a convex shape, or the like.
- FIG. 5B shows an example of scanning directions that can be selected when determining the pattern in the scanning direction of the electron beam in S12. In this case, a total of eight directions including the licking direction in addition to the top, bottom, left, and right are selected as patterns to be selected in the scanning direction.
- FIG. 5A shows a variation of the area shape indicating the range of one scanning area when the captured image of S21 is divided into a plurality of scanning areas.
- the area shape of the scanning area is not limited to a square, but may be an L shape, a concave shape, a convex shape, or the like.
- 5C shows an example in which image data or CAD data input from the external storage medium 2 is displayed on the GUI screen displayed on the display unit of the image processing apparatus 1 as the display processing in S25.
- square scanning areas are laid out (divided) in a grid pattern (tile pattern), and an arrow indicating the scanning direction is described in the scanning area where the pattern edge PE exists.
- the scanning of S24 is omitted (not indicated by an arrow) in the scanning area where the pattern edge PE does not exist.
- an imaging area set as an observation condition is divided into scanning areas with an arbitrary area shape such as a square or L shape, and image processing is performed in the scanning area, and the imaging area exists in the scanning area.
- a scanning direction that is perpendicular to the pattern edge to be determined is determined.
- the scanning area is scanned according to the pixel scanning order indicated by the determined scanning direction to create a scanned image.
- the electron beam irradiation regions do not overlap each other, and an image with reduced charge can be acquired as a highly accurate image suitable for two-dimensional dimension measurement. That is, a highly accurate image can be acquired by suppressing the influence of different charging depending on imaging conditions such as scan speed and pattern shape.
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Abstract
Description
これにより、パターンエッジの進行方向と、電子ビームの走査方向とが垂直になることで、パターンエッジの画像を鮮明に取得することができる。
例えば、ホールパターンなどの曲線を持つパターンエッジに対して特許文献1の方式を適用した場合、曲線の内径では電子ビームの照射領域は重なってしまい、帯電量が増加してしまう。その結果、帯電量の変化による像ドリフトが発生してしまう。
前記撮影対象のパターンエッジを含む撮像領域を走査型電子顕微鏡に撮影させて撮像画像を取得する手段と、
取得した前記撮像画像を複数の走査領域へと分割し、前記撮像画像内の前記各走査領域に撮影されている前記パターンエッジをもとに、前記各走査領域の走査方向を決定する手段と、
決定された前記各走査領域の前記走査方向がラスタ走査の水平方向となるように、前記各走査領域を構成するピクセルごとにラスタ走査を行う走査順番を決定する手段と、
前記各走査領域について、決定された前記走査順番に従って走査型電子顕微鏡に撮影させて走査画像を取得する手段と、を有することを特徴とする。
その他の手段は、後記する。
画像処理装置1は、CPU(Central Processing Unit)とメモリとハードディスク(記憶手段)とネットワークインタフェースを有するコンピュータとして構成され、このコンピュータは、CPUが、メモリ上に読み込んだプログラムを実行することにより、各処理部を動作させる。画像処理装置1は、表示部であるディスプレイと接続されている。
電子ビーム制御部3は、画像処理装置1で決定した走査方法に従い電子ビームを制御する。
筐体4は、電子銃401と、電子銃から出射された電子ビーム402の照射位置を制御する走査コイル403と、電子ビーム402の照射位置により試料404から放出される2次電子405を検出する2次電子検出部406から構成される。
画像生成部5は、筐体4にて検出された情報を画像として生成する。
画像生成部5は、同じ試料404の撮影結果として、2種類の画像(撮像画像、走査画像)を生成する。
図2(a)では、1つの撮像領域が、(i+1)×(j+1)個の走査領域へと分割されている旨が示されており、撮像領域の左下には、試料404(撮影対象)の輪郭がパターンエッジPEとして撮影されている。以下、撮像領域内での走査領域の位置を「Ai,j」のように行列表記する。「Ai,j」とは、撮像領域内で横i番目、縦j番目に位置する走査領域を示す。
画像処理装置1は、各走査領域について、走査画像を撮影するためのパラメータ(走査方向、走査順序、ピクセル走査順番)を計算する。例えば、走査領域「A1,j-2」には、左上から右下に向かってパターンエッジPEが撮影されているので、このパターンエッジPEを直線に近似したときに直交するように走査方向を決定する。
これにより、同じ走査方向の走査領域が連続し、走査開始位置への移動が減るため、走査時間を短縮することができる。
これにより、電子ビーム照射によるシュリンクも低減することができる。
図3(a)として、走査領域「A1,j-2」の走査方向は、図2(b)で説明したように、右上から左下への矢印として計算されている。
図3(b)として、走査領域「A1,j-2」の走査順序は、走査方向に直交するように設定する。
図3(c)として、走査領域「A1,j-2」のピクセルごとの走査順番(以下、ピクセル走査順番とする)は、走査方向への走査を走査順序に従って走査領域を網羅するように設定する。この設定処理は、走査方向をラスタ走査における水平方向とし、走査順序をラスタ走査における垂直方向としたときの走査領域に対するラスタ走査ともいえる。
以下に示すS11~S14では、事前に取得された撮像画像からパターンエッジPEの情報を取得する一例を示す。
S22では、画像処理装置1は、S21で分割された撮像画像を走査領域ごとに画像評価し、走査領域ごとの走査方向を決定する。画像評価とは、例えば、図3で示したように、パターンエッジPEの直線近似により、走査方向を決定してもよいし、S12で決定した走査方向のパターンごとに撮影された撮像画像内に最もパターンエッジPEが鮮明に撮像されている撮像画像の走査方向を、その走査領域の走査方向として決定してもよい。
なお、鮮明に撮像されている度合いの評価関数としては、例えば、撮像画像内の隣接する画素間での画素値(例えば明るさ値)の差分が大きいほど、鮮明に撮像されている評価関数を用いてもよい。
これにより、パターンエッジPEに対してほぼ垂直な走査方向にて、電子ビームの走査が行われる。
図5(a)は、S21の撮像画像を複数の走査領域に分割するときの1つの走査領域の範囲を示す領域形状のバリエーションを示す。走査領域の領域形状は、四角だけでなく、L形や凹形や凸形などでもよい。
図5(b)は、S12で電子線の走査方向のパターンを決定するときに選択可能な走査方向の一例を示す。ここでは、上下左右に加えて、ななめ方向を加えた合計8方向を、走査方向のパターンの選択対象とする。
図5(c)は、S25の表示処理として、画像処理装置1の表示部に表示されるGUI画面に、外部記憶媒体2より入力した画像データあるいはCADデータを表示する例を示している。4つのパターンエッジPEを撮影するために、正方形の走査領域が格子状(タイル状)に敷き詰められ(分割され)、パターンエッジPEが存在する走査領域にはその走査方向を示す矢印が記載されるとともに、パターンエッジPEが存在しない走査領域にはS24の走査を省略する旨(矢印の非記載)が示されている。
これにより、電子ビームの照射領域(ピクセル走査順番)が互いに重複せず、帯電を低減した画像を、2次元寸法計測に適した高精度な画像として取得できる。つまり、スキャンスピードやパターン形状などの撮像条件により異なる帯電の影響を抑制することで、高精度な画像を取得することができる。
2 外部記憶媒体
3 電子ビーム制御部
4 筐体
5 画像生成部
401 電子銃
402 電子ビーム
403 走査コイル
404 試料
405 2次電子
406 2次電子検出部
PE パターンエッジ
Claims (5)
- 走査型電子顕微鏡の電子ビームを撮影対象に照射することで撮影される画像データを処理する画像処理装置であって、
前記撮影対象のパターンエッジを含む撮像領域を走査型電子顕微鏡に撮影させて撮像画像を取得する手段と、
取得した前記撮像画像を複数の走査領域へと分割し、前記撮像画像内の前記各走査領域に撮影されている前記パターンエッジをもとに、前記各走査領域の走査方向を決定する手段と、
決定された前記各走査領域の前記走査方向がラスタ走査の水平方向となるように、前記各走査領域を構成するピクセルごとにラスタ走査を行う走査順番を決定する手段と、
前記各走査領域について、決定された前記走査順番に従って走査型電子顕微鏡に撮影させて走査画像を取得する手段と、を有することを特徴とする
画像処理装置。 - 前記画像処理装置は、さらに、取得した前記走査画像と、その走査画像の撮影に使用された前記走査方向とを併せて表示装置に表示させる手段を有することを特徴とする
請求の範囲第1項に記載の画像処理装置。 - 前記各走査領域の前記走査方向を決定する手段は、前記撮像画像内の前記各走査領域に撮影されている前記パターンエッジを直線近似し、その直線に直交する方向の前記走査方向を決定することを特徴とする
請求の範囲第1項または第2項に記載の画像処理装置。 - 前記各走査領域の前記走査方向を決定する手段は、前記撮像画像内の前記各走査領域に撮影されている画素値について、隣接する画素間の差分が大きい前記撮像画像の前記走査方向を、前記走査領域の前記走査方向として決定することを特徴とする
請求の範囲第1項または第2項に記載の画像処理装置。 - 走査型電子顕微鏡の電子ビームを撮影対象に照射することで撮影される画像データを処理する画像処理装置による走査方法であって、
前記画像処理装置は、
前記撮影対象のパターンエッジを含む撮像領域を走査型電子顕微鏡に撮影させて撮像画像を取得する手順と、
取得した前記撮像画像を複数の走査領域へと分割し、前記撮像画像内の前記各走査領域に撮影されている前記パターンエッジをもとに、前記各走査領域の走査方向を決定する手順と、
決定された前記各走査領域の前記走査方向がラスタ走査の水平方向となるように、前記各走査領域を構成するピクセルごとにラスタ走査を行う走査順番を決定する手順と、
前記各走査領域について、決定された前記走査順番に従って走査型電子顕微鏡に撮影させて走査画像を取得する手順と、を実行することを特徴とする
走査方法。
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