JP2015205837A5 - - Google Patents
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- JP2015205837A5 JP2015205837A5 JP2014087310A JP2014087310A JP2015205837A5 JP 2015205837 A5 JP2015205837 A5 JP 2015205837A5 JP 2014087310 A JP2014087310 A JP 2014087310A JP 2014087310 A JP2014087310 A JP 2014087310A JP 2015205837 A5 JP2015205837 A5 JP 2015205837A5
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- Japan
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- carbon atoms
- hydrocarbon group
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Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014087310A JP6343481B2 (ja) | 2014-04-21 | 2014-04-21 | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
| KR1020167029729A KR102375179B1 (ko) | 2014-04-21 | 2015-03-30 | 알콕사이드 화합물, 박막 형성용 원료, 박막의 제조방법 및 알코올 화합물 |
| PCT/JP2015/059903 WO2015163090A1 (ja) | 2014-04-21 | 2015-03-30 | アルコキシド化合物、薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
| US15/303,845 US10351584B2 (en) | 2014-04-21 | 2015-03-30 | Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound |
| EP15782391.5A EP3135664B1 (en) | 2014-04-21 | 2015-03-30 | Alkoxide compound, raw material for forming thin film, method for producing thin film, and alcohol compound |
| TW104111262A TWI652274B (zh) | 2014-04-21 | 2015-04-08 | 烷氧化合物，薄膜形成用原料，薄膜的製造方法及醇化合物 |
| IL248335A IL248335B (en) | 2014-04-21 | 2016-10-13 | Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014087310A JP6343481B2 (ja) | 2014-04-21 | 2014-04-21 | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018011074A Division JP6408178B2 (ja) | 2018-01-26 | 2018-01-26 | アルコキシド化合物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015205837A JP2015205837A (ja) | 2015-11-19 |
| JP2015205837A5 true JP2015205837A5 (https=) | 2017-03-16 |
| JP6343481B2 JP6343481B2 (ja) | 2018-06-13 |
Family
ID=54332259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014087310A Active JP6343481B2 (ja) | 2014-04-21 | 2014-04-21 | 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10351584B2 (https=) |
| EP (1) | EP3135664B1 (https=) |
| JP (1) | JP6343481B2 (https=) |
| KR (1) | KR102375179B1 (https=) |
| IL (1) | IL248335B (https=) |
| TW (1) | TWI652274B (https=) |
| WO (1) | WO2015163090A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102592325B1 (ko) * | 2016-07-14 | 2023-10-20 | 삼성전자주식회사 | 알루미늄 화합물과 이를 이용한 박막 형성 방법 및 집적회로 소자의 제조 방법 |
| CN110709381A (zh) | 2017-06-21 | 2020-01-17 | 株式会社Adeka | 金属醇盐化合物、薄膜形成用原料及薄膜的制造方法 |
| KR102358527B1 (ko) * | 2017-12-17 | 2022-02-08 | 어플라이드 머티어리얼스, 인코포레이티드 | 선택적 증착에 의한 실리사이드 막들 |
| KR20240032935A (ko) * | 2021-07-12 | 2024-03-12 | 가부시키가이샤 아데카 | 코발트 화합물, 박막 형성용 원료, 박막 및 박막의 제조 방법 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060058632A (ko) * | 2004-11-25 | 2006-05-30 | 주식회사 엘지생명과학 | ＰＰＡＲ ｇａｍｍａ와 ＰＰＡＲ ａｌｐｈａ의 활성을항진시키는 신규 화합물, 그것의 제조방법, 및 그것을함유한 약제 조성물 |
| JP4700103B2 (ja) | 2005-04-07 | 2011-06-15 | コリア リサーチ インスティチュート オブ ケミカル テクノロジイ | 揮発性ニッケルアミノアルコキシド錯体及びそれを用いたニッケル薄膜の蒸着法 |
| JP4781012B2 (ja) | 2005-05-30 | 2011-09-28 | 株式会社Ａｄｅｋａ | アルコール化合物を配位子とした金属化合物及び薄膜形成用原料並びに薄膜の製造方法 |
| KR100675983B1 (ko) | 2006-03-06 | 2007-01-30 | 한국화학연구원 | 신규의 코발트 아미노알콕사이드 화합물 및 그 제조 방법 |
| JP5690684B2 (ja) | 2011-08-02 | 2015-03-25 | 株式会社Adeka | アルコキシド化合物 |
| US9714464B2 (en) * | 2012-06-11 | 2017-07-25 | Wayne State University | Precursors for atomic layer deposition |
| CN103664803A (zh) * | 2012-09-17 | 2014-03-26 | 王天桃 | 2,3,5,6-四甲基吡嗪新的合成方法 |
| CN104470892B (zh) * | 2012-11-13 | 2017-05-17 | 株式会社艾迪科 | 金属醇盐化合物、薄膜形成用原料、薄膜的制造方法和醇化合物 |
| US9758866B2 (en) | 2013-02-13 | 2017-09-12 | Wayne State University | Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal films |
-
2014
- 2014-04-21 JP JP2014087310A patent/JP6343481B2/ja active Active
-
2015
- 2015-03-30 KR KR1020167029729A patent/KR102375179B1/ko active Active
- 2015-03-30 WO PCT/JP2015/059903 patent/WO2015163090A1/ja not_active Ceased
- 2015-03-30 US US15/303,845 patent/US10351584B2/en active Active
- 2015-03-30 EP EP15782391.5A patent/EP3135664B1/en active Active
- 2015-04-08 TW TW104111262A patent/TWI652274B/zh active
-
2016
- 2016-10-13 IL IL248335A patent/IL248335B/en active IP Right Grant
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