JP2015205837A5 - - Google Patents

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Publication number
JP2015205837A5
JP2015205837A5 JP2014087310A JP2014087310A JP2015205837A5 JP 2015205837 A5 JP2015205837 A5 JP 2015205837A5 JP 2014087310 A JP2014087310 A JP 2014087310A JP 2014087310 A JP2014087310 A JP 2014087310A JP 2015205837 A5 JP2015205837 A5 JP 2015205837A5
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JP
Japan
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group
carbon atoms
hydrocarbon group
represented
general formulas
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JP2014087310A
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English (en)
Japanese (ja)
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JP2015205837A (ja
JP6343481B2 (ja
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Priority claimed from JP2014087310A external-priority patent/JP6343481B2/ja
Priority to JP2014087310A priority Critical patent/JP6343481B2/ja
Priority to US15/303,845 priority patent/US10351584B2/en
Priority to KR1020167029729A priority patent/KR102375179B1/ko
Priority to EP15782391.5A priority patent/EP3135664B1/en
Priority to PCT/JP2015/059903 priority patent/WO2015163090A1/ja
Priority to TW104111262A priority patent/TWI652274B/zh
Publication of JP2015205837A publication Critical patent/JP2015205837A/ja
Priority to IL248335A priority patent/IL248335B/en
Publication of JP2015205837A5 publication Critical patent/JP2015205837A5/ja
Publication of JP6343481B2 publication Critical patent/JP6343481B2/ja
Application granted granted Critical
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JP2014087310A 2014-04-21 2014-04-21 薄膜形成用原料、薄膜の製造方法及びアルコール化合物 Active JP6343481B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2014087310A JP6343481B2 (ja) 2014-04-21 2014-04-21 薄膜形成用原料、薄膜の製造方法及びアルコール化合物
PCT/JP2015/059903 WO2015163090A1 (ja) 2014-04-21 2015-03-30 アルコキシド化合物、薄膜形成用原料、薄膜の製造方法及びアルコール化合物
KR1020167029729A KR102375179B1 (ko) 2014-04-21 2015-03-30 알콕사이드 화합물, 박막 형성용 원료, 박막의 제조방법 및 알코올 화합물
EP15782391.5A EP3135664B1 (en) 2014-04-21 2015-03-30 Alkoxide compound, raw material for forming thin film, method for producing thin film, and alcohol compound
US15/303,845 US10351584B2 (en) 2014-04-21 2015-03-30 Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound
TW104111262A TWI652274B (zh) 2014-04-21 2015-04-08 烷氧化合物，薄膜形成用原料，薄膜的製造方法及醇化合物
IL248335A IL248335B (en) 2014-04-21 2016-10-13 Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014087310A JP6343481B2 (ja) 2014-04-21 2014-04-21 薄膜形成用原料、薄膜の製造方法及びアルコール化合物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2018011074A Division JP6408178B2 (ja) 2018-01-26 2018-01-26 アルコキシド化合物

Publications (3)

Publication Number Publication Date
JP2015205837A JP2015205837A (ja) 2015-11-19
JP2015205837A5 true JP2015205837A5 (https=) 2017-03-16
JP6343481B2 JP6343481B2 (ja) 2018-06-13

Family

ID=54332259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014087310A Active JP6343481B2 (ja) 2014-04-21 2014-04-21 薄膜形成用原料、薄膜の製造方法及びアルコール化合物

Country Status (7)

Country Link
US (1) US10351584B2 (https=)
EP (1) EP3135664B1 (https=)
JP (1) JP6343481B2 (https=)
KR (1) KR102375179B1 (https=)
IL (1) IL248335B (https=)
TW (1) TWI652274B (https=)
WO (1) WO2015163090A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102592325B1 (ko) * 2016-07-14 2023-10-20 삼성전자주식회사 알루미늄 화합물과 이를 이용한 박막 형성 방법 및 집적회로 소자의 제조 방법
US20200148706A1 (en) * 2017-06-21 2020-05-14 Adeka Corporation Metal alkoxide compound, thin-film-forming raw material and method of producing thin film
WO2019118845A1 (en) * 2017-12-17 2019-06-20 Applied Materials, Inc. Silicide films through selective deposition
US12371778B2 (en) * 2021-07-12 2025-07-29 Adeka Corporation Cobalt compound, thin-film forming raw material, thin-film, and method of producing thin-film

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006057503A1 (en) * 2004-11-25 2006-06-01 Lg Life Sciences, Ltd. NOVEL COMPOUNDS AS AGONIST FOR PPARϜ AND PPARα, METHOD FOR PREPARATION OF THE SAME, AND PHARMACEUTICAL COMPOSITION CONTAINING THE SAME
US7462732B2 (en) 2005-04-07 2008-12-09 Korea Research Institute Of Chemical Technology Volatile nickel aminoalkoxide complex and deposition of nickel thin film using same
JP4781012B2 (ja) 2005-05-30 2011-09-28 株式会社Ａｄｅｋａ アルコール化合物を配位子とした金属化合物及び薄膜形成用原料並びに薄膜の製造方法
KR100675983B1 (ko) 2006-03-06 2007-01-30 한국화학연구원 신규의 코발트 아미노알콕사이드 화합물 및 그 제조 방법
JP5690684B2 (ja) 2011-08-02 2015-03-25 株式会社Adeka アルコキシド化合物
US9714464B2 (en) * 2012-06-11 2017-07-25 Wayne State University Precursors for atomic layer deposition
CN103664803A (zh) * 2012-09-17 2014-03-26 王天桃 2,3,5,6-四甲基吡嗪新的合成方法
CN104470892B (zh) * 2012-11-13 2017-05-17 株式会社艾迪科 金属醇盐化合物、薄膜形成用原料、薄膜的制造方法和醇化合物
US9758866B2 (en) * 2013-02-13 2017-09-12 Wayne State University Synthesis and characterization of first row transition metal complexes containing α-imino alkoxides as precursors for deposition of metal films

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