JP2015174176A - 研磨パッド及びその製造方法 - Google Patents
研磨パッド及びその製造方法 Download PDFInfo
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- JP2015174176A JP2015174176A JP2014051945A JP2014051945A JP2015174176A JP 2015174176 A JP2015174176 A JP 2015174176A JP 2014051945 A JP2014051945 A JP 2014051945A JP 2014051945 A JP2014051945 A JP 2014051945A JP 2015174176 A JP2015174176 A JP 2015174176A
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- Prior art keywords
- polishing
- polishing pad
- isocyanate
- component
- polyurethane resin
- Prior art date
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Abstract
Description
(式中、XはOR1又はOHであり、R1はそれぞれ独立に炭素数1〜4のアルキル基である。)
(式中、XはOR1又はOHであり、R1はそれぞれ独立に炭素数1〜4のアルキル基であり、R2は炭素数1〜6のアルキレン基である。)
前記工程は、下記一般式(2)で表されるアルコキシシリル基含有イソシアネートを含むイソシアネート成分、3官能以上のポリオールを含むポリオール成分を含有するプレポリマー原料組成物の反応物であるアルコキシシリル基含有イソシアネート末端プレポリマーを含む第1成分にシリコーン系界面活性剤を第1成分及び第2成分の合計重量に対して0.05〜10重量%になるように添加し、さらに前記第1成分を非反応性気体と撹拌して前記非反応性気体を気泡として分散させた気泡分散液を調製した後、前記気泡分散液に鎖延長剤を含む第2成分を混合し、硬化してポリウレタン樹脂発泡体を作製する工程であることを特徴とする研磨パッドの製造方法、に関する。
(式中、XはOR1又はOHであり、R1はそれぞれ独立に炭素数1〜4のアルキル基であり、R2は炭素数1〜6のアルキレン基である。)
(式中、XはOR1又はOHであり、R1はそれぞれ独立に炭素数1〜4のアルキル基である。)
(式中、XはOR1又はOHであり、R1はそれぞれ独立に炭素数1〜4のアルキル基であり、R2は炭素数1〜6のアルキレン基である。)
1)アルコキシシリル基含有イソシアネート末端プレポリマーの気泡分散液を作製する発泡工程
アルコキシシリル基含有イソシアネート末端プレポリマー(第1成分)にシリコーン系界面活性剤を添加し、非反応性気体の存在下で撹拌し、非反応性気体を気泡として分散させて気泡分散液とする。前記プレポリマーが常温で固体の場合には適宜の温度に予熱し、溶融して使用する。
2)鎖延長剤の混合工程
上記の気泡分散液に鎖延長剤(第2成分)を添加、混合、撹拌して発泡反応液とする。
3)注型工程
上記の発泡反応液を金型に流し込む。
4)硬化工程
金型に流し込まれた発泡反応液を加熱し、反応硬化させる。
(平均気泡径の測定)
作製したポリウレタン樹脂発泡体を厚み1mm以下になるべく薄くミクロトームカッターで平行に切り出したものを測定用試料とした。試料表面を走査型電子顕微鏡(日立サイエンスシステムズ社製、S−3500N)で100倍にて撮影した。そして、画像解析ソフト(MITANIコーポレーション社製、WIN−ROOF)を用いて、任意範囲の全気泡の円相当径を測定し、その測定値から平均気泡径を算出した。
JIS Z8807−1976に準拠して行った。作製したポリウレタン樹脂発泡体を4cm×8.5cmの短冊状(厚み:任意)に切り出したものを比重測定用試料とし、温度23℃±2℃、湿度50%±5%の環境で16時間静置した。測定には比重計(ザルトリウス社製)を用い、比重を測定した。
JIS K6253−1997に準拠して行った。作製したポリウレタン樹脂発泡体を2cm×2cm(厚み:任意)の大きさに切り出したものを硬度測定用試料とし、温度23℃±2℃、湿度50%±5%の環境で16時間静置した。測定時には、試料を重ね合わせ、厚み6mm以上とした。硬度計(高分子計器社製、アスカーD型硬度計)を用い、硬度を測定した。また、試料を水に48時間浸漬し、その後、試料を取出して表面の水分を軽く拭き取った後、同様の方法で硬度を測定した。
研磨装置としてMAT-ARW-8C1A(MAT(株)製)を用い、作製した研磨パッドを用いて、研磨特性の評価を行った。研磨速度は、8インチのシリコンウエハに熱酸化膜を1μm製膜したものを、60秒研磨してこのときの研磨量より算出した。酸化膜の膜厚測定には、光干渉式膜厚測定装置(ナノメトリクス社製、装置名:Nanospec)を用いた。研磨条件としては、スラリーとして、シリカスラリー(SS12、キャボット社製)を研磨中に流量120ml/min添加した。研磨荷重としては4.5psi、研磨定盤回転数93rpm、ウエハ回転数90rpmとした。
反応容器内に、3−イソシアネートプロピルトリエトキシシラン(信越化学株式会社製、KBE−9007)10.2重量部、トルエンジイソシアネート(2,4−体/2,6−体=80/20の混合物、TDI−80)37.8重量部、ポリカプロラクトントリオール(ダイセル化学工業社製、PCL305、水酸基価:305mgKOH/g、官能基数3)22.6重量部、数平均分子量650のポリテトラメチレンエーテルグリコール(PTMG650)26.5重量部、及びジエチレングリコール(DEG)2.9重量部を入れ(NCO Index:1.9)、75℃で3時間反応させてアルコキシシリル基含有イソシアネート末端プレポリマー(NCO重量%:9.12重量%、以下、Si−プレポリマーという)を得た。
表1に記載の配合を採用した以外は実施例1と同様の方法で研磨パッドを作製した。なお、表1中の親水性プレポリマーは下記方法で作製した。
2:研磨定盤
3:研磨剤(スラリー)
4:研磨対象物(半導体ウエハ)
5:支持台(ポリシングヘッド)
6、7:回転軸
Claims (8)
- 前記アルコキシシリル基含有イソシアネートが、3−イソシアネートプロピルトリエトキシシランである請求項2記載の研磨パッド。
- 前記アルコキシシリル基含有イソシアネートの含有量は、ポリウレタン原料組成物中に1〜10重量%である請求項2又は3記載の研磨パッド。
- イソシアネート末端プレポリマーを含む第1成分と鎖延長剤を含む第2成分とを混合し、硬化してポリウレタン樹脂発泡体を作製する工程を含む研磨パッドの製造方法において、
前記工程は、下記一般式(2)で表されるアルコキシシリル基含有イソシアネートを含むイソシアネート成分、3官能以上のポリオールを含むポリオール成分を含有するプレポリマー原料組成物の反応物であるアルコキシシリル基含有イソシアネート末端プレポリマーを含む第1成分にシリコーン系界面活性剤を第1成分及び第2成分の合計重量に対して0.05〜10重量%になるように添加し、さらに前記第1成分を非反応性気体と撹拌して前記非反応性気体を気泡として分散させた気泡分散液を調製した後、前記気泡分散液に鎖延長剤を含む第2成分を混合し、硬化してポリウレタン樹脂発泡体を作製する工程であることを特徴とする研磨パッドの製造方法。
(式中、XはOR1又はOHであり、R1はそれぞれ独立に炭素数1〜4のアルキル基であり、R2は炭素数1〜6のアルキレン基である。) - 前記アルコキシシリル基含有イソシアネートが、3−イソシアネートプロピルトリエトキシシランである請求項5記載の研磨パッドの製造方法。
- 前記アルコキシシリル基含有イソシアネートの含有量は、前記第1成分及び前記第2成分の合計重量中に1〜10重量%である請求項5又は6記載の研磨パッドの製造方法。
- 請求項1〜4のいずれかに記載の研磨パッドを用いて半導体ウエハの表面を研磨する工程を含む半導体デバイスの製造方法。
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