JP2015146342A5 - - Google Patents

Download PDF

Info

Publication number
JP2015146342A5
JP2015146342A5 JP2014017744A JP2014017744A JP2015146342A5 JP 2015146342 A5 JP2015146342 A5 JP 2015146342A5 JP 2014017744 A JP2014017744 A JP 2014017744A JP 2014017744 A JP2014017744 A JP 2014017744A JP 2015146342 A5 JP2015146342 A5 JP 2015146342A5
Authority
JP
Japan
Prior art keywords
optical
pair
lithographic apparatus
measurement
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014017744A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015146342A (ja
JP6338386B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2014017744A priority Critical patent/JP6338386B2/ja
Priority claimed from JP2014017744A external-priority patent/JP6338386B2/ja
Priority to US14/590,379 priority patent/US9547242B2/en
Publication of JP2015146342A publication Critical patent/JP2015146342A/ja
Publication of JP2015146342A5 publication Critical patent/JP2015146342A5/ja
Application granted granted Critical
Publication of JP6338386B2 publication Critical patent/JP6338386B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2014017744A 2014-01-31 2014-01-31 リソグラフィ装置、及び物品の製造方法 Expired - Fee Related JP6338386B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014017744A JP6338386B2 (ja) 2014-01-31 2014-01-31 リソグラフィ装置、及び物品の製造方法
US14/590,379 US9547242B2 (en) 2014-01-31 2015-01-06 Lithography apparatus, and method of manufacturing article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014017744A JP6338386B2 (ja) 2014-01-31 2014-01-31 リソグラフィ装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2015146342A JP2015146342A (ja) 2015-08-13
JP2015146342A5 true JP2015146342A5 (https=) 2017-03-02
JP6338386B2 JP6338386B2 (ja) 2018-06-06

Family

ID=53754586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014017744A Expired - Fee Related JP6338386B2 (ja) 2014-01-31 2014-01-31 リソグラフィ装置、及び物品の製造方法

Country Status (2)

Country Link
US (1) US9547242B2 (https=)
JP (1) JP6338386B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10114297B2 (en) * 2016-07-22 2018-10-30 Applied Materials, Inc. Active eye-to-eye with alignment by X-Y capacitance measurement
CN110244520B (zh) * 2019-05-22 2020-09-15 上海交通大学 用电子束光刻实现加工硅纳米圆柱的方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2606285B2 (ja) * 1988-06-07 1997-04-30 株式会社ニコン 露光装置および位置合わせ方法
JP2893823B2 (ja) * 1990-03-20 1999-05-24 株式会社ニコン 位置合わせ方法及び装置
KR100381629B1 (ko) * 1994-08-16 2003-08-21 가부시키가이샤 니콘 노광장치
US6798516B1 (en) 1996-11-14 2004-09-28 Nikon Corporation Projection exposure apparatus having compact substrate stage
US6160628A (en) * 1999-06-29 2000-12-12 Nikon Corporation Interferometer system and method for lens column alignment
JP2001168018A (ja) * 1999-12-13 2001-06-22 Canon Inc 荷電粒子線露光装置、荷電粒子線露光方法及び露光補正データの決定方法、該方法を適用したデバイスの製造方法。
JP2001308003A (ja) 2000-02-15 2001-11-02 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
US6674512B2 (en) * 2001-08-07 2004-01-06 Nikon Corporation Interferometer system for a semiconductor exposure system
JP3890233B2 (ja) * 2002-01-07 2007-03-07 キヤノン株式会社 位置決めステージ装置、露光装置及び半導体デバイスの製造方法
US20050151947A1 (en) 2002-07-31 2005-07-14 Nikon Corporation Position measuring method, position control method, exposure method and exposure apparatus, and device manufacturing method
JP4078485B2 (ja) 2002-10-31 2008-04-23 株式会社ニコン 露光装置、ステージ装置、及びステージ装置の制御方法
JP2004165076A (ja) * 2002-11-15 2004-06-10 Advantest Corp 偏向器の製造方法、偏向器、及び露光装置
US7075619B2 (en) * 2002-12-12 2006-07-11 Zygo Corporation In-process correction of stage mirror deformations during a photolithography exposure cycle
JP4164414B2 (ja) * 2003-06-19 2008-10-15 キヤノン株式会社 ステージ装置
US7864293B2 (en) * 2005-01-25 2011-01-04 Nikon Corporation Exposure apparatus, exposure method, and producing method of microdevice
JP4868113B2 (ja) * 2005-06-27 2012-02-01 株式会社ニコン 支持装置、ステージ装置及び露光装置
KR20080032213A (ko) * 2005-07-29 2008-04-14 후지필름 가부시키가이샤 묘화 방법 및 장치
US7336369B2 (en) * 2005-09-30 2008-02-26 Applied Materials, Inc. Multi-axis interferometer system using independent, single axis interferometers
US7876452B2 (en) * 2007-03-05 2011-01-25 Nikon Corporation Interferometric position-measuring devices and methods

Similar Documents

Publication Publication Date Title
WO2016012425A3 (de) Abbildende optik für ein metrologiesystem zur untersuchung einer lithographiemaske
JP2013186088A5 (https=)
EP3503837C0 (en) PROCEDURE FOR VISUALIZING AND FABRICATION OF AN ALIGNER BY MODIFICATION OF TEETH POSITION
JP2016027325A5 (https=)
EP3693798A4 (en) CONTROL DEVICE, LITHOGRAPHY DEVICE, MEASURING DEVICE, PROCESSING DEVICE, PLANNING DEVICE AND METHOD FOR MANUFACTURING GOODS
MX2015008589A (es) Produccion de un objeto voluminoso mediante litografia, con resolucion espacial mejorada.
JP2017096725A5 (https=)
MY183579A (en) Wafer producing method and processing feed direction detecting method
EP3543957A4 (en) LIGHT-HOMOGENIZATION PROCESS FOR 3D PRINTING WITH LARGE-SCALE MULTI-SOURCE SURFACE EXPOSURE
WO2015177784A3 (en) System for tomography and/or topography measurements of a layered object
JP2017534315A5 (https=)
WO2016184571A3 (de) Messverfahren und messanordnung für ein abbildendes optisches system
JP2015121823A5 (https=)
GB2538274A8 (en) A monitoring system
WO2015124372A3 (en) Lithographic system
WO2017099107A3 (en) Microscope system
US9551571B2 (en) Method and device for measuring a decentration and tilt of faces of an optical element
MX2017017056A (es) Sistema y método para generar información de una superficie tridimensional correspondiente a una lámina de vidrio contorneada.
MX390407B (es) Sistema y procedimiento para desarrollar información superficial tridimensional correspondiente a una hoja contorneada.
EP3467037A4 (en) FILM COMPOSITION WITH TANNIC ACID DERIVATIVE AND METHOD FOR PRODUCING THIS FILM COMPOSITION
EP3690428A4 (en) TEST ITEM SPECIFICATION PROCEDURE, PROCESS FOR GENERATING THREE-DIMENSIONAL IMAGES AND TESTING DEVICE
TW201612509A (en) Process monitoring device and process monitoring method
FR3036473B1 (fr) Procede de mesure de la position d'une structure mobile
JP2016129212A5 (https=)
JP2015146342A5 (https=)