JP2015144982A5 - - Google Patents

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Publication number
JP2015144982A5
JP2015144982A5 JP2014017845A JP2014017845A JP2015144982A5 JP 2015144982 A5 JP2015144982 A5 JP 2015144982A5 JP 2014017845 A JP2014017845 A JP 2014017845A JP 2014017845 A JP2014017845 A JP 2014017845A JP 2015144982 A5 JP2015144982 A5 JP 2015144982A5
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JP
Japan
Prior art keywords
electrode portion
distance
intersection
origin
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014017845A
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English (en)
Japanese (ja)
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JP2015144982A (ja
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Publication date
Application filed filed Critical
Priority to JP2014017845A priority Critical patent/JP2015144982A/ja
Priority claimed from JP2014017845A external-priority patent/JP2015144982A/ja
Priority to US14/603,659 priority patent/US9415127B2/en
Publication of JP2015144982A publication Critical patent/JP2015144982A/ja
Publication of JP2015144982A5 publication Critical patent/JP2015144982A5/ja
Pending legal-status Critical Current

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JP2014017845A 2014-01-31 2014-01-31 プラズマ処理方法 Pending JP2015144982A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2014017845A JP2015144982A (ja) 2014-01-31 2014-01-31 プラズマ処理方法
US14/603,659 US9415127B2 (en) 2014-01-31 2015-01-23 Plasma treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014017845A JP2015144982A (ja) 2014-01-31 2014-01-31 プラズマ処理方法

Publications (2)

Publication Number Publication Date
JP2015144982A JP2015144982A (ja) 2015-08-13
JP2015144982A5 true JP2015144982A5 (enExample) 2017-06-01

Family

ID=53753943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014017845A Pending JP2015144982A (ja) 2014-01-31 2014-01-31 プラズマ処理方法

Country Status (2)

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US (1) US9415127B2 (enExample)
JP (1) JP2015144982A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017064740A1 (en) * 2015-10-13 2017-04-20 Suntory Holdings Limited Sterilizing device
US10703653B2 (en) * 2016-02-17 2020-07-07 Panasonic Intellectual Property Management Co., Ltd. Liquid treatment device utilizing plasma
WO2017221134A1 (en) * 2016-06-21 2017-12-28 Medident Technologies Inc. Plasmaclave device
CN107519510A (zh) * 2017-09-28 2017-12-29 刘欣妮 等离子体手机消毒装置
CN110124474B (zh) * 2019-06-12 2024-07-26 青岛海琅智能装备有限公司 用于恶臭废气处理的双介质阻挡放电装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302343A (en) * 1987-02-25 1994-04-12 Adir Jacob Process for dry sterilization of medical devices and materials
FR2814079B1 (fr) * 2000-09-15 2005-05-13 Absys Systeme de sterilisation par plasma
JP4077704B2 (ja) * 2001-09-27 2008-04-23 積水化学工業株式会社 プラズマ処理装置
US20040055698A1 (en) * 2002-09-24 2004-03-25 Tran Hai Q. Method of improving lamination quality by treating media with plasma
WO2006096716A2 (en) * 2005-03-07 2006-09-14 Mounir Laroussi Plasma generator
JP2007275789A (ja) * 2006-04-07 2007-10-25 Canon Inc プラズマガス処理装置
JPWO2011065171A1 (ja) 2009-11-27 2013-04-11 日本碍子株式会社 プラズマ処理装置
JP2012079429A (ja) * 2010-09-30 2012-04-19 Ngk Insulators Ltd プラズマ処理装置
JPWO2012120928A1 (ja) 2011-03-09 2014-07-17 日本碍子株式会社 リアクタ構造及びプラズマ処理装置
JP5224560B2 (ja) * 2011-11-24 2013-07-03 国立大学法人京都大学 プラズマ生成装置、表面処理装置、表示装置、および流体改質装置
US20150010430A1 (en) * 2012-01-13 2015-01-08 Osaka University Active species radiation device and active species radiation method
JP6010839B2 (ja) * 2012-02-23 2016-10-19 国立大学法人名古屋大学 滅菌表示装置および滅菌装置

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