JP2014531743A5 - - Google Patents

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Publication number
JP2014531743A5
JP2014531743A5 JP2014527148A JP2014527148A JP2014531743A5 JP 2014531743 A5 JP2014531743 A5 JP 2014531743A5 JP 2014527148 A JP2014527148 A JP 2014527148A JP 2014527148 A JP2014527148 A JP 2014527148A JP 2014531743 A5 JP2014531743 A5 JP 2014531743A5
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Japan
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target
sensors
light beam
amplified light
mixture
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JP2014527148A
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English (en)
Japanese (ja)
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JP5977828B2 (ja
JP2014531743A (ja
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Priority claimed from US13/249,504 external-priority patent/US8993976B2/en
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JP2014527148A 2011-08-19 2012-07-10 光ビームアラインメントのためのエネルギセンサ Active JP5977828B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161525561P 2011-08-19 2011-08-19
US61/525,561 2011-08-19
US13/249,504 US8993976B2 (en) 2011-08-19 2011-09-30 Energy sensors for light beam alignment
US13/249,504 2011-09-30
PCT/US2012/046093 WO2013028272A1 (en) 2011-08-19 2012-07-10 Energy sensors for light beam alignment

Publications (3)

Publication Number Publication Date
JP2014531743A JP2014531743A (ja) 2014-11-27
JP2014531743A5 true JP2014531743A5 (enExample) 2015-08-13
JP5977828B2 JP5977828B2 (ja) 2016-08-24

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JP2014527148A Active JP5977828B2 (ja) 2011-08-19 2012-07-10 光ビームアラインメントのためのエネルギセンサ

Country Status (7)

Country Link
US (1) US8993976B2 (enExample)
EP (1) EP2745650A4 (enExample)
JP (1) JP5977828B2 (enExample)
KR (1) KR101949839B1 (enExample)
CN (1) CN103748967B (enExample)
TW (1) TWI536869B (enExample)
WO (1) WO2013028272A1 (enExample)

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US9000405B2 (en) * 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
US9558858B2 (en) * 2013-08-14 2017-01-31 Kla-Tencor Corporation System and method for imaging a sample with a laser sustained plasma illumination output
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US9209595B2 (en) * 2014-01-31 2015-12-08 Asml Netherlands B.V. Catalytic conversion of an optical amplifier gas medium
US9271381B2 (en) * 2014-02-10 2016-02-23 Asml Netherlands B.V. Methods and apparatus for laser produced plasma EUV light source
EP3142823B1 (de) * 2014-05-13 2020-07-29 Trumpf Laser- und Systemtechnik GmbH Einrichtung zur überwachung der ausrichtung eines laserstrahls und euv-strahlungserzeugungsvorrichtung damit
WO2016139022A1 (en) * 2015-03-03 2016-09-09 Asml Netherlands B.V. Radiation sensor apparatus
US9927292B2 (en) 2015-04-23 2018-03-27 Asml Netherlands B.V. Beam position sensor
JP6649958B2 (ja) 2015-10-02 2020-02-19 ギガフォトン株式会社 極端紫外光生成システム
WO2017077584A1 (ja) 2015-11-03 2017-05-11 ギガフォトン株式会社 極端紫外光生成装置
US9536631B1 (en) * 2015-11-19 2017-01-03 Asml Netherlands B.V. Systems and methods to avoid instability conditions in a source plasma chamber
WO2017090167A1 (ja) * 2015-11-26 2017-06-01 ギガフォトン株式会社 極端紫外光生成装置
WO2017130346A1 (ja) * 2016-01-28 2017-08-03 ギガフォトン株式会社 極端紫外光生成装置
WO2017154111A1 (ja) * 2016-03-08 2017-09-14 ギガフォトン株式会社 極端紫外光生成装置
WO2017163345A1 (ja) * 2016-03-23 2017-09-28 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光の重心位置の制御方法
US9778022B1 (en) 2016-09-14 2017-10-03 Asml Netherlands B.V. Determining moving properties of a target in an extreme ultraviolet light source
US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
WO2018131123A1 (ja) * 2017-01-12 2018-07-19 ギガフォトン株式会社 極端紫外光生成システム
WO2018131146A1 (ja) * 2017-01-13 2018-07-19 ギガフォトン株式会社 極端紫外光生成システム
WO2018172012A1 (en) * 2017-03-20 2018-09-27 Asml Netherlands B.V. Lithographic system, euv radiation source, lithographic scanning apparatus and control system
JP6866471B2 (ja) * 2017-03-27 2021-04-28 ギガフォトン株式会社 Ｅｕｖ光生成装置
US11266002B2 (en) 2017-10-26 2022-03-01 Asml Netherlands B.V. System for monitoring a plasma
JP7356439B2 (ja) * 2018-04-03 2023-10-04 エーエスエムエル ネザーランズ ビー．ブイ． 光ビームの空間変調
US20210194202A1 (en) * 2018-09-12 2021-06-24 Cymer, Llc Metrology for a body of a gas discharge stage
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
WO2020086901A1 (en) * 2018-10-26 2020-04-30 Asml Netherlands B.V. Monitoring light emissions
TWI886110B (zh) 2019-01-30 2025-06-11 荷蘭商Ａｓｍｌ荷蘭公司 估計移動目標之性質之方法及裝置
WO2020173683A1 (en) 2019-02-26 2020-09-03 Asml Netherlands B.V. Target supply control apparatus and method in an extreme ultraviolet light source
TWI853016B (zh) * 2019-04-29 2024-08-21 荷蘭商Ａｓｍｌ荷蘭公司 使用機械濾光器之度量衡裝置及方法
US11320744B2 (en) * 2020-05-22 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for controlling extreme ultraviolet light
KR20230016620A (ko) * 2020-05-28 2023-02-02 에이에스엠엘 네델란즈 비.브이. 극자외 광원의 정렬 기술
KR20230031288A (ko) * 2020-07-06 2023-03-07 에이에스엠엘 네델란즈 비.브이. 레이저-대-액적 정렬을 위한 시스템 및 방법
CN112629654A (zh) * 2020-12-11 2021-04-09 苏州瑞派宁科技有限公司 检测装置、激光等离子光源及其调节方法
DE102020134109B3 (de) * 2020-12-18 2022-05-25 Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Vorrichtung und Verfahren zur Fokuslagen-Bestimmung

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US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
DE10251435B3 (de) * 2002-10-30 2004-05-27 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung von extrem ultravioletter Strahlung
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
JP4917014B2 (ja) * 2004-03-10 2012-04-18 サイマー インコーポレイテッド Ｅｕｖ光源
US7164144B2 (en) 2004-03-10 2007-01-16 Cymer Inc. EUV light source
EP1775756B1 (en) * 2004-06-24 2011-09-21 Nikon Corporation Euv light source, euv exposure equipment and semiconductor device manufacturing method
US8766212B2 (en) * 2006-07-19 2014-07-01 Asml Netherlands B.V. Correction of spatial instability of an EUV source by laser beam steering
US7633070B2 (en) 2006-12-18 2009-12-15 Kla-Tencor Technologies Corporation Substrate processing apparatus and method
NL1036803A (nl) * 2008-09-09 2010-03-15 Asml Netherlands Bv Radiation system and lithographic apparatus.
WO2010028899A1 (en) * 2008-09-11 2010-03-18 Asml Netherlands B.V. Radiation source and lithographic apparatus
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
JP5252586B2 (ja) * 2009-04-15 2013-07-31 ウシオ電機株式会社 レーザー駆動光源
WO2011013779A1 (ja) 2009-07-29 2011-02-03 株式会社小松製作所 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
US8173985B2 (en) 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8000212B2 (en) 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source

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