CN103748967B - 用于光束对准的能量传感器 - Google Patents
用于光束对准的能量传感器 Download PDFInfo
- Publication number
- CN103748967B CN103748967B CN201280040305.4A CN201280040305A CN103748967B CN 103748967 B CN103748967 B CN 103748967B CN 201280040305 A CN201280040305 A CN 201280040305A CN 103748967 B CN103748967 B CN 103748967B
- Authority
- CN
- China
- Prior art keywords
- target
- light beam
- energy
- target area
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Abstract
Description
Claims (30)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161525561P | 2011-08-19 | 2011-08-19 | |
US61/525,561 | 2011-08-19 | ||
US13/249,504 US8993976B2 (en) | 2011-08-19 | 2011-09-30 | Energy sensors for light beam alignment |
US13/249,504 | 2011-09-30 | ||
PCT/US2012/046093 WO2013028272A1 (en) | 2011-08-19 | 2012-07-10 | Energy sensors for light beam alignment |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103748967A CN103748967A (zh) | 2014-04-23 |
CN103748967B true CN103748967B (zh) | 2017-03-22 |
Family
ID=47711970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201280040305.4A Active CN103748967B (zh) | 2011-08-19 | 2012-07-10 | 用于光束对准的能量传感器 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8993976B2 (zh) |
EP (1) | EP2745650A4 (zh) |
JP (1) | JP5977828B2 (zh) |
KR (1) | KR101949839B1 (zh) |
CN (1) | CN103748967B (zh) |
TW (1) | TWI536869B (zh) |
WO (1) | WO2013028272A1 (zh) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9148941B2 (en) * | 2013-01-22 | 2015-09-29 | Asml Netherlands B.V. | Thermal monitor for an extreme ultraviolet light source |
US9000405B2 (en) * | 2013-03-15 | 2015-04-07 | Asml Netherlands B.V. | Beam position control for an extreme ultraviolet light source |
US9558858B2 (en) * | 2013-08-14 | 2017-01-31 | Kla-Tencor Corporation | System and method for imaging a sample with a laser sustained plasma illumination output |
WO2015029137A1 (ja) | 2013-08-27 | 2015-03-05 | ギガフォトン株式会社 | 極端紫外光生成装置及び極端紫外光生成システム |
US9271381B2 (en) * | 2014-02-10 | 2016-02-23 | Asml Netherlands B.V. | Methods and apparatus for laser produced plasma EUV light source |
EP3142823B1 (de) * | 2014-05-13 | 2020-07-29 | Trumpf Laser- und Systemtechnik GmbH | Einrichtung zur überwachung der ausrichtung eines laserstrahls und euv-strahlungserzeugungsvorrichtung damit |
JP6678180B2 (ja) * | 2015-03-03 | 2020-04-08 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射センサ装置 |
US9927292B2 (en) | 2015-04-23 | 2018-03-27 | Asml Netherlands B.V. | Beam position sensor |
WO2017056324A1 (ja) | 2015-10-02 | 2017-04-06 | ギガフォトン株式会社 | 極端紫外光生成システム |
WO2017077584A1 (ja) | 2015-11-03 | 2017-05-11 | ギガフォトン株式会社 | 極端紫外光生成装置 |
US9536631B1 (en) * | 2015-11-19 | 2017-01-03 | Asml Netherlands B.V. | Systems and methods to avoid instability conditions in a source plasma chamber |
WO2017090167A1 (ja) * | 2015-11-26 | 2017-06-01 | ギガフォトン株式会社 | 極端紫外光生成装置 |
JP6661669B2 (ja) * | 2016-01-28 | 2020-03-11 | ギガフォトン株式会社 | 極端紫外光生成装置 |
WO2017154111A1 (ja) * | 2016-03-08 | 2017-09-14 | ギガフォトン株式会社 | 極端紫外光生成装置 |
WO2017163345A1 (ja) * | 2016-03-23 | 2017-09-28 | ギガフォトン株式会社 | 極端紫外光生成装置及び極端紫外光の重心位置の制御方法 |
US9778022B1 (en) | 2016-09-14 | 2017-10-03 | Asml Netherlands B.V. | Determining moving properties of a target in an extreme ultraviolet light source |
US10149375B2 (en) | 2016-09-14 | 2018-12-04 | Asml Netherlands B.V. | Target trajectory metrology in an extreme ultraviolet light source |
WO2018131123A1 (ja) * | 2017-01-12 | 2018-07-19 | ギガフォトン株式会社 | 極端紫外光生成システム |
WO2018131146A1 (ja) * | 2017-01-13 | 2018-07-19 | ギガフォトン株式会社 | 極端紫外光生成システム |
NL2020474A (en) * | 2017-03-20 | 2018-09-21 | Asml Netherlands Bv | Lithographic system, euv radiation source, lithographic scanning apparatus and control system |
WO2018179068A1 (ja) * | 2017-03-27 | 2018-10-04 | ギガフォトン株式会社 | Euv光生成装置及びeuv光の重心位置の制御方法 |
CN111566563A (zh) | 2017-10-26 | 2020-08-21 | Asml荷兰有限公司 | 用于监测等离子体的系统 |
KR20200138728A (ko) * | 2018-04-03 | 2020-12-10 | 에이에스엠엘 네델란즈 비.브이. | 광빔의 공간적 변조 |
CN112771999A (zh) * | 2018-09-25 | 2021-05-07 | Asml荷兰有限公司 | 在euv光源中用于靶量测和改变的激光系统 |
WO2020086901A1 (en) * | 2018-10-26 | 2020-04-30 | Asml Netherlands B.V. | Monitoring light emissions |
TW202041103A (zh) | 2019-01-30 | 2020-11-01 | 荷蘭商Asml荷蘭公司 | 判定在極紫外光光源中之目標之移動性質 |
CN112629654A (zh) * | 2020-12-11 | 2021-04-09 | 苏州瑞派宁科技有限公司 | 检测装置、激光等离子光源及其调节方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7598509B2 (en) | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
DE10251435B3 (de) * | 2002-10-30 | 2004-05-27 | Xtreme Technologies Gmbh | Strahlungsquelle zur Erzeugung von extrem ultravioletter Strahlung |
US7217940B2 (en) * | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Collector for EUV light source |
US7217941B2 (en) * | 2003-04-08 | 2007-05-15 | Cymer, Inc. | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
JP4917014B2 (ja) * | 2004-03-10 | 2012-04-18 | サイマー インコーポレイテッド | Euv光源 |
US7164144B2 (en) * | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
ATE525678T1 (de) * | 2004-06-24 | 2011-10-15 | Nikon Corp | Euv-lichtquelle, euv-belichtungsanlage und verfahren zur herstellung einer halbleitervorrichtung |
US8766212B2 (en) * | 2006-07-19 | 2014-07-01 | Asml Netherlands B.V. | Correction of spatial instability of an EUV source by laser beam steering |
US7633070B2 (en) | 2006-12-18 | 2009-12-15 | Kla-Tencor Technologies Corporation | Substrate processing apparatus and method |
NL1036803A (nl) * | 2008-09-09 | 2010-03-15 | Asml Netherlands Bv | Radiation system and lithographic apparatus. |
JP5553833B2 (ja) * | 2008-09-11 | 2014-07-16 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源およびリソグラフィ装置 |
US8138487B2 (en) | 2009-04-09 | 2012-03-20 | Cymer, Inc. | System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber |
JP5252586B2 (ja) * | 2009-04-15 | 2013-07-31 | ウシオ電機株式会社 | レーザー駆動光源 |
JP5612579B2 (ja) | 2009-07-29 | 2014-10-22 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体 |
US8000212B2 (en) | 2009-12-15 | 2011-08-16 | Cymer, Inc. | Metrology for extreme ultraviolet light source |
US8173985B2 (en) | 2009-12-15 | 2012-05-08 | Cymer, Inc. | Beam transport system for extreme ultraviolet light source |
-
2011
- 2011-09-30 US US13/249,504 patent/US8993976B2/en active Active
-
2012
- 2012-07-10 CN CN201280040305.4A patent/CN103748967B/zh active Active
- 2012-07-10 KR KR1020147007197A patent/KR101949839B1/ko active IP Right Grant
- 2012-07-10 WO PCT/US2012/046093 patent/WO2013028272A1/en active Application Filing
- 2012-07-10 JP JP2014527148A patent/JP5977828B2/ja active Active
- 2012-07-10 EP EP12825084.2A patent/EP2745650A4/en not_active Withdrawn
- 2012-08-01 TW TW101127771A patent/TWI536869B/zh active
Also Published As
Publication number | Publication date |
---|---|
US8993976B2 (en) | 2015-03-31 |
JP5977828B2 (ja) | 2016-08-24 |
TW201311057A (zh) | 2013-03-01 |
TWI536869B (zh) | 2016-06-01 |
WO2013028272A1 (en) | 2013-02-28 |
JP2014531743A (ja) | 2014-11-27 |
KR20140053347A (ko) | 2014-05-07 |
EP2745650A4 (en) | 2015-05-13 |
US20130043401A1 (en) | 2013-02-21 |
KR101949839B1 (ko) | 2019-02-19 |
EP2745650A1 (en) | 2014-06-25 |
CN103748967A (zh) | 2014-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: ASML NETHERLANDS B. V. Free format text: FORMER OWNER: CYMER INC. Effective date: 20150108 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20150108 Address after: Horn, Holland Applicant after: ASML HOLLAND INC. Address before: American California Applicant before: CYMER, INC. |
|
C53 | Correction of patent for invention or patent application | ||
CB02 | Change of applicant information |
Address after: Holland Weide Eindhoven Applicant after: ASML Holland Co., Ltd. Address before: Horn, Holland Applicant before: ASML HOLLAND INC. |
|
COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: ASML NETHERLANDS B. V. TO: ASML HOLLAND CO., LTD. Free format text: CORRECT: ADDRESS; FROM: |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |