JP2013535824A5 - - Google Patents

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Publication number
JP2013535824A5
JP2013535824A5 JP2013520753A JP2013520753A JP2013535824A5 JP 2013535824 A5 JP2013535824 A5 JP 2013535824A5 JP 2013520753 A JP2013520753 A JP 2013520753A JP 2013520753 A JP2013520753 A JP 2013520753A JP 2013535824 A5 JP2013535824 A5 JP 2013535824A5
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JP
Japan
Prior art keywords
light beam
amplified light
focal plane
target
wavefront
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JP2013520753A
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English (en)
Japanese (ja)
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JP5952274B2 (ja
JP2013535824A (ja
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Priority claimed from US12/841,728 external-priority patent/US8648999B2/en
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Publication of JP2013535824A publication Critical patent/JP2013535824A/ja
Publication of JP2013535824A5 publication Critical patent/JP2013535824A5/ja
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Publication of JP5952274B2 publication Critical patent/JP5952274B2/ja
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JP2013520753A 2010-07-22 2011-07-14 光源焦点のアラインメント Active JP5952274B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/841,728 US8648999B2 (en) 2010-07-22 2010-07-22 Alignment of light source focus
US12/841,728 2010-07-22
PCT/US2011/044058 WO2012012267A1 (en) 2010-07-22 2011-07-14 Alignment of light source focus

Publications (3)

Publication Number Publication Date
JP2013535824A JP2013535824A (ja) 2013-09-12
JP2013535824A5 true JP2013535824A5 (enExample) 2014-09-04
JP5952274B2 JP5952274B2 (ja) 2016-07-13

Family

ID=45493359

Family Applications (1)

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JP2013520753A Active JP5952274B2 (ja) 2010-07-22 2011-07-14 光源焦点のアラインメント

Country Status (6)

Country Link
US (2) US8648999B2 (enExample)
EP (1) EP2595702A4 (enExample)
JP (1) JP5952274B2 (enExample)
KR (1) KR101885748B1 (enExample)
TW (1) TWI519209B (enExample)
WO (1) WO2012012267A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus
JP5846572B2 (ja) * 2011-07-27 2016-01-20 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置および極端紫外光生成装置の制御方法
US8598552B1 (en) * 2012-05-31 2013-12-03 Cymer, Inc. System and method to optimize extreme ultraviolet light generation
US8681427B2 (en) * 2012-05-31 2014-03-25 Cymer, Inc. System and method for separating a main pulse and a pre-pulse beam from a laser source
EP2870834B1 (en) 2012-07-06 2017-02-01 ETH Zürich Method for controlling an interaction between droplet targets and a laser and apparatus for conducting said method
DE102012217120A1 (de) 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
DE102012217520A1 (de) 2012-09-27 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und Verfahren zum Einstellen des Öffnungswinkels eines Laserstrahls
TWI611731B (zh) 2012-12-21 2018-01-11 Gigaphoton Inc 雷射束控制裝置及極端紫外光產生裝置
US8872144B1 (en) * 2013-09-24 2014-10-28 Asml Netherlands B.V. System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
WO2014149435A1 (en) * 2013-03-15 2014-09-25 Cymer, Llc Beam position control for an extreme ultraviolet light source
US9000405B2 (en) * 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source
US9209595B2 (en) * 2014-01-31 2015-12-08 Asml Netherlands B.V. Catalytic conversion of an optical amplifier gas medium
WO2015118687A1 (ja) 2014-02-10 2015-08-13 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
KR102422784B1 (ko) * 2015-08-03 2022-07-19 엘지이노텍 주식회사 광파 탐지 및 거리 측정 장치
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
WO2017090167A1 (ja) * 2015-11-26 2017-06-01 ギガフォトン株式会社 極端紫外光生成装置
KR101897869B1 (ko) 2016-07-07 2018-10-04 고려대학교 산학협력단 비구면거울이 내장된 레이저수술장치
JP6278427B1 (ja) * 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法
EP3370486A1 (en) * 2017-03-02 2018-09-05 ASML Netherlands B.V. Radiation source
US10048199B1 (en) 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10969690B2 (en) 2017-09-29 2021-04-06 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet control system for adjusting droplet illumination parameters
US11013097B2 (en) 2017-11-15 2021-05-18 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
US11588293B2 (en) * 2017-11-21 2023-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems
KR102675689B1 (ko) * 2018-05-14 2024-06-14 트럼프 레이저시스템즈 포 세미컨덕터 매뉴팩처링 게엠베하 초점 조정 장치 및 이를 구비한 euv 방사선 발생 장치
US12363818B2 (en) 2019-04-04 2025-07-15 Asml Netherlands B.V. EUV radiation system including maximizing droplet velocity change transverse to main pulse propagation
US11340531B2 (en) 2020-07-10 2022-05-24 Taiwan Semiconductor Manufacturing Company, Ltd. Target control in extreme ultraviolet lithography systems using aberration of reflection image
US11852978B2 (en) * 2022-03-07 2023-12-26 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system with 3D sensing and tunning modules

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
JPS60185230A (ja) * 1984-03-02 1985-09-20 Pioneer Electronic Corp 焦点誤差検出装置
JPS6310326A (ja) 1986-07-01 1988-01-16 Sanyo Electric Co Ltd 光ピツクアツプ装置
JP3626003B2 (ja) 1997-10-06 2005-03-02 富士通株式会社 光学的情報記憶装置
EP1184727A1 (en) 2000-09-01 2002-03-06 Asm Lithography B.V. Lithographic apparatus
US6710856B2 (en) 2000-09-01 2004-03-23 Asml Netherlands B.V. Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured thereby
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7170587B2 (en) 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7534552B2 (en) * 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7709816B2 (en) * 2007-08-16 2010-05-04 Sematech, Inc. Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication
WO2010017892A1 (en) 2008-08-14 2010-02-18 Asml Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
US8445876B2 (en) * 2008-10-24 2013-05-21 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5368261B2 (ja) 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8173985B2 (en) 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus

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