JP2013535824A5 - - Google Patents

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Publication number
JP2013535824A5
JP2013535824A5 JP2013520753A JP2013520753A JP2013535824A5 JP 2013535824 A5 JP2013535824 A5 JP 2013535824A5 JP 2013520753 A JP2013520753 A JP 2013520753A JP 2013520753 A JP2013520753 A JP 2013520753A JP 2013535824 A5 JP2013535824 A5 JP 2013535824A5
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JP
Japan
Prior art keywords
light beam
amplified light
focal plane
target
wavefront
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JP2013520753A
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English (en)
Japanese (ja)
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JP5952274B2 (ja
JP2013535824A (ja
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Priority claimed from US12/841,728 external-priority patent/US8648999B2/en
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Publication of JP2013535824A publication Critical patent/JP2013535824A/ja
Publication of JP2013535824A5 publication Critical patent/JP2013535824A5/ja
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Publication of JP5952274B2 publication Critical patent/JP5952274B2/ja
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JP2013520753A 2010-07-22 2011-07-14 光源焦点のアラインメント Active JP5952274B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/841,728 US8648999B2 (en) 2010-07-22 2010-07-22 Alignment of light source focus
US12/841,728 2010-07-22
PCT/US2011/044058 WO2012012267A1 (en) 2010-07-22 2011-07-14 Alignment of light source focus

Publications (3)

Publication Number Publication Date
JP2013535824A JP2013535824A (ja) 2013-09-12
JP2013535824A5 true JP2013535824A5 (enExample) 2014-09-04
JP5952274B2 JP5952274B2 (ja) 2016-07-13

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ID=45493359

Family Applications (1)

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JP2013520753A Active JP5952274B2 (ja) 2010-07-22 2011-07-14 光源焦点のアラインメント

Country Status (6)

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US (2) US8648999B2 (enExample)
EP (1) EP2595702A4 (enExample)
JP (1) JP5952274B2 (enExample)
KR (1) KR101885748B1 (enExample)
TW (1) TWI519209B (enExample)
WO (1) WO2012012267A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus
JP5846572B2 (ja) * 2011-07-27 2016-01-20 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置および極端紫外光生成装置の制御方法
US8598552B1 (en) * 2012-05-31 2013-12-03 Cymer, Inc. System and method to optimize extreme ultraviolet light generation
US8681427B2 (en) * 2012-05-31 2014-03-25 Cymer, Inc. System and method for separating a main pulse and a pre-pulse beam from a laser source
JP2015524599A (ja) 2012-07-06 2015-08-24 イーティーエイチ・チューリッヒ 液滴ターゲットとレーザとの間の相互作用を制御するための方法、および、前記方法を行なうための装置
DE102012217120A1 (de) 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
DE102012217520A1 (de) 2012-09-27 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und Verfahren zum Einstellen des Öffnungswinkels eines Laserstrahls
TWI611731B (zh) 2012-12-21 2018-01-11 Gigaphoton Inc 雷射束控制裝置及極端紫外光產生裝置
US9000405B2 (en) * 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
US8872144B1 (en) * 2013-09-24 2014-10-28 Asml Netherlands B.V. System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
JP6374481B2 (ja) * 2013-03-15 2018-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のビーム位置制御を行うシステム又は方法
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source
US9209595B2 (en) * 2014-01-31 2015-12-08 Asml Netherlands B.V. Catalytic conversion of an optical amplifier gas medium
WO2015118687A1 (ja) 2014-02-10 2015-08-13 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
KR102422784B1 (ko) 2015-08-03 2022-07-19 엘지이노텍 주식회사 광파 탐지 및 거리 측정 장치
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
WO2017090167A1 (ja) 2015-11-26 2017-06-01 ギガフォトン株式会社 極端紫外光生成装置
KR101897869B1 (ko) 2016-07-07 2018-10-04 고려대학교 산학협력단 비구면거울이 내장된 레이저수술장치
JP6278427B1 (ja) * 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法
EP3370486A1 (en) * 2017-03-02 2018-09-05 ASML Netherlands B.V. Radiation source
US10048199B1 (en) 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10969690B2 (en) 2017-09-29 2021-04-06 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet control system for adjusting droplet illumination parameters
US11013097B2 (en) * 2017-11-15 2021-05-18 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
US11588293B2 (en) * 2017-11-21 2023-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems
CN112189160A (zh) 2018-05-14 2021-01-05 通快激光系统半导体制造有限公司 聚焦装置和具有该聚焦装置的euv辐射产生设备
NL2025032A (en) 2019-04-04 2020-10-08 Asml Netherlands Bv Radiation system
US11340531B2 (en) 2020-07-10 2022-05-24 Taiwan Semiconductor Manufacturing Company, Ltd. Target control in extreme ultraviolet lithography systems using aberration of reflection image
US11852978B2 (en) * 2022-03-07 2023-12-26 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system with 3D sensing and tunning modules

Family Cites Families (19)

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JPS60185230A (ja) * 1984-03-02 1985-09-20 Pioneer Electronic Corp 焦点誤差検出装置
JPS6310326A (ja) 1986-07-01 1988-01-16 Sanyo Electric Co Ltd 光ピツクアツプ装置
JP3626003B2 (ja) 1997-10-06 2005-03-02 富士通株式会社 光学的情報記憶装置
KR100583692B1 (ko) * 2000-09-01 2006-05-25 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 작동 방법, 리소그래피 장치, 디바이스제조방법, 및 이것에 의해 제조된 디바이스
EP1184727A1 (en) 2000-09-01 2002-03-06 Asm Lithography B.V. Lithographic apparatus
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7170587B2 (en) 2002-03-18 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7534552B2 (en) * 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7453077B2 (en) * 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7709816B2 (en) * 2007-08-16 2010-05-04 Sematech, Inc. Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication
US9207548B2 (en) 2008-08-14 2015-12-08 Asml Netherlands B.V. Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method
US8445876B2 (en) * 2008-10-24 2013-05-21 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8283643B2 (en) 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
US8138487B2 (en) 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8173985B2 (en) 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus

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