TWI519209B - 遠紫外光系統及用於產生遠紫外光的方法 - Google Patents

遠紫外光系統及用於產生遠紫外光的方法 Download PDF

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Publication number
TWI519209B
TWI519209B TW100122412A TW100122412A TWI519209B TW I519209 B TWI519209 B TW I519209B TW 100122412 A TW100122412 A TW 100122412A TW 100122412 A TW100122412 A TW 100122412A TW I519209 B TWI519209 B TW I519209B
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TW
Taiwan
Prior art keywords
target
focal plane
amplified
wavefront
reflected
Prior art date
Application number
TW100122412A
Other languages
English (en)
Chinese (zh)
Other versions
TW201215245A (en
Inventor
馬修Ｒ 葛拉漢
威廉Ｎ 派特洛
史蒂芬 陳
羅伯特Ａ 貝格斯泰德
Original Assignee
Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ａｓｍｌ荷蘭公司 filed Critical Ａｓｍｌ荷蘭公司
Publication of TW201215245A publication Critical patent/TW201215245A/zh
Application granted granted Critical
Publication of TWI519209B publication Critical patent/TWI519209B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)
TW100122412A 2010-07-22 2011-06-27 遠紫外光系統及用於產生遠紫外光的方法 TWI519209B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/841,728 US8648999B2 (en) 2010-07-22 2010-07-22 Alignment of light source focus

Publications (2)

Publication Number Publication Date
TW201215245A TW201215245A (en) 2012-04-01
TWI519209B true TWI519209B (zh) 2016-01-21

Family

ID=45493359

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100122412A TWI519209B (zh) 2010-07-22 2011-06-27 遠紫外光系統及用於產生遠紫外光的方法

Country Status (6)

Country Link
US (2) US8648999B2 (enExample)
EP (1) EP2595702A4 (enExample)
JP (1) JP5952274B2 (enExample)
KR (1) KR101885748B1 (enExample)
TW (1) TWI519209B (enExample)
WO (1) WO2012012267A1 (enExample)

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US8598552B1 (en) * 2012-05-31 2013-12-03 Cymer, Inc. System and method to optimize extreme ultraviolet light generation
US8681427B2 (en) * 2012-05-31 2014-03-25 Cymer, Inc. System and method for separating a main pulse and a pre-pulse beam from a laser source
JP2015524599A (ja) 2012-07-06 2015-08-24 イーティーエイチ・チューリッヒ 液滴ターゲットとレーザとの間の相互作用を制御するための方法、および、前記方法を行なうための装置
DE102012217120A1 (de) 2012-09-24 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh EUV-Strahlungserzeugungsvorrichtung und Betriebsverfahren dafür
DE102012217520A1 (de) 2012-09-27 2014-03-27 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und Verfahren zum Einstellen des Öffnungswinkels eines Laserstrahls
TWI611731B (zh) 2012-12-21 2018-01-11 Gigaphoton Inc 雷射束控制裝置及極端紫外光產生裝置
US9000405B2 (en) * 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
US8872144B1 (en) * 2013-09-24 2014-10-28 Asml Netherlands B.V. System and method for laser beam focus control for extreme ultraviolet laser produced plasma source
JP6374481B2 (ja) * 2013-03-15 2018-08-15 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線光源のビーム位置制御を行うシステム又は方法
US9232623B2 (en) * 2014-01-22 2016-01-05 Asml Netherlands B.V. Extreme ultraviolet light source
US9209595B2 (en) * 2014-01-31 2015-12-08 Asml Netherlands B.V. Catalytic conversion of an optical amplifier gas medium
WO2015118687A1 (ja) 2014-02-10 2015-08-13 ギガフォトン株式会社 レーザ装置及び極端紫外光生成システム
US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
KR102422784B1 (ko) 2015-08-03 2022-07-19 엘지이노텍 주식회사 광파 탐지 및 거리 측정 장치
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
WO2017090167A1 (ja) 2015-11-26 2017-06-01 ギガフォトン株式会社 極端紫外光生成装置
KR101897869B1 (ko) 2016-07-07 2018-10-04 고려대학교 산학협력단 비구면거울이 내장된 레이저수술장치
JP6278427B1 (ja) * 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法
EP3370486A1 (en) * 2017-03-02 2018-09-05 ASML Netherlands B.V. Radiation source
US10048199B1 (en) 2017-03-20 2018-08-14 Asml Netherlands B.V. Metrology system for an extreme ultraviolet light source
US10969690B2 (en) 2017-09-29 2021-04-06 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet control system for adjusting droplet illumination parameters
US11013097B2 (en) * 2017-11-15 2021-05-18 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
US11588293B2 (en) * 2017-11-21 2023-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Methods and systems for aligning master oscillator power amplifier systems
CN112189160A (zh) 2018-05-14 2021-01-05 通快激光系统半导体制造有限公司 聚焦装置和具有该聚焦装置的euv辐射产生设备
NL2025032A (en) 2019-04-04 2020-10-08 Asml Netherlands Bv Radiation system
US11340531B2 (en) 2020-07-10 2022-05-24 Taiwan Semiconductor Manufacturing Company, Ltd. Target control in extreme ultraviolet lithography systems using aberration of reflection image
US11852978B2 (en) * 2022-03-07 2023-12-26 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system with 3D sensing and tunning modules

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US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus

Also Published As

Publication number Publication date
EP2595702A4 (en) 2016-03-16
US20140151583A1 (en) 2014-06-05
US20120019826A1 (en) 2012-01-26
US8648999B2 (en) 2014-02-11
JP5952274B2 (ja) 2016-07-13
KR101885748B1 (ko) 2018-09-10
JP2013535824A (ja) 2013-09-12
WO2012012267A1 (en) 2012-01-26
TW201215245A (en) 2012-04-01
US9832853B2 (en) 2017-11-28
EP2595702A1 (en) 2013-05-29
KR20130129351A (ko) 2013-11-28

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