JP2014529086A5 - - Google Patents

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Publication number
JP2014529086A5
JP2014529086A5 JP2014533572A JP2014533572A JP2014529086A5 JP 2014529086 A5 JP2014529086 A5 JP 2014529086A5 JP 2014533572 A JP2014533572 A JP 2014533572A JP 2014533572 A JP2014533572 A JP 2014533572A JP 2014529086 A5 JP2014529086 A5 JP 2014529086A5
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JP
Japan
Prior art keywords
diffraction pattern
image
fourier transform
light source
features
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2014533572A
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English (en)
Japanese (ja)
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JP2014529086A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2012/055003 external-priority patent/WO2013048744A1/en
Publication of JP2014529086A publication Critical patent/JP2014529086A/ja
Publication of JP2014529086A5 publication Critical patent/JP2014529086A5/ja
Withdrawn legal-status Critical Current

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JP2014533572A 2011-09-30 2012-09-13 線幅測定システム Withdrawn JP2014529086A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161542061P 2011-09-30 2011-09-30
US61/542,061 2011-09-30
PCT/US2012/055003 WO2013048744A1 (en) 2011-09-30 2012-09-13 Linewidth measurement system

Publications (2)

Publication Number Publication Date
JP2014529086A JP2014529086A (ja) 2014-10-30
JP2014529086A5 true JP2014529086A5 (enExample) 2015-10-01

Family

ID=47996302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014533572A Withdrawn JP2014529086A (ja) 2011-09-30 2012-09-13 線幅測定システム

Country Status (8)

Country Link
US (1) US20140240720A1 (enExample)
EP (1) EP2761281A4 (enExample)
JP (1) JP2014529086A (enExample)
KR (1) KR20140074970A (enExample)
CN (1) CN104040323A (enExample)
BR (1) BR112014007576A2 (enExample)
SG (1) SG11201401017UA (enExample)
WO (1) WO2013048744A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021074939A1 (en) * 2019-10-16 2021-04-22 Pirelli Tyre S.P.A. Method and apparatus for dosing a continuous elongated element
CN114935315B (zh) * 2022-05-13 2024-01-16 浙江工业大学 一种通过频域计算细丝衍射条纹的直径测量方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3877776A (en) * 1971-03-01 1975-04-15 Matsushita Electric Industrial Co Ltd Speckle reduction in holography
JPS5343300B2 (enExample) * 1972-11-02 1978-11-18
JPS5334865B2 (enExample) * 1972-11-17 1978-09-22
DE2421851C3 (de) * 1974-05-06 1978-12-07 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Verfahren zur Messung des Mittelwerts der Steigung von gedrehten Fäden
CA1082811A (en) * 1976-04-05 1980-07-29 Greenwood Mills, Inc. Diffraction pattern amplitude analysis for use in fabric inspection
US4588260A (en) * 1984-04-03 1986-05-13 The United States Of America As Represented By The Secretary Of The Air Force Phase-only optical filter for use in an optical correlation system
JPS62222380A (ja) * 1986-03-25 1987-09-30 Citizen Watch Co Ltd パタ−ン欠陥検出方法
US5317651A (en) * 1988-06-24 1994-05-31 Thomson-Csf Non-linear and adaptive signal-processing device
JPH0462455A (ja) * 1990-06-29 1992-02-27 Shimadzu Corp 粒度分布測定装置
JP2906281B2 (ja) * 1990-09-05 1999-06-14 セイコーインスツルメンツ株式会社 光学的パターン認識装置
US5113286A (en) * 1990-09-27 1992-05-12 At&T Bell Laboratories Diffraction grating apparatus and method of forming a surface relief pattern in diffraction grating apparatus
JPH04299204A (ja) * 1991-03-27 1992-10-22 Toyoda Mach Works Ltd バイト端縁検出装置
JP3378032B2 (ja) * 1992-08-28 2003-02-17 浜松ホトニクス株式会社 人物照合装置
JP2796022B2 (ja) * 1992-10-29 1998-09-10 住友大阪セメント株式会社 物体識別装置
US5629802A (en) * 1995-01-05 1997-05-13 The United States Of America As Represented By The Secretary Of The Air Force Spatially multiplexed optical signal processor
US5919549A (en) * 1996-11-27 1999-07-06 Minnesota Mining And Manufacturing Company Abrasive articles and method for the manufacture of same
US6362879B1 (en) * 2000-02-25 2002-03-26 Corning Incorporated High resolution non-scanning spectrometer
US6567155B1 (en) * 2000-03-16 2003-05-20 Intel Corporation Method for improved resolution of patterning using binary masks with pupil filters
US7221760B2 (en) * 2001-03-30 2007-05-22 The University Of Connecticut Information security using digital holography
US7342659B2 (en) * 2005-01-21 2008-03-11 Carl Zeiss Meditec, Inc. Cross-dispersed spectrometer in a spectral domain optical coherence tomography system
JP2008216575A (ja) * 2007-03-02 2008-09-18 Sony Corp 画像表示方法
JP2008304292A (ja) * 2007-06-07 2008-12-18 Kyushu Institute Of Technology パルス化レーザ光を用いた回転体測定方法及びシステム
US8175739B2 (en) * 2007-07-26 2012-05-08 3M Innovative Properties Company Multi-unit process spatial synchronization
JP5364203B2 (ja) * 2010-04-30 2013-12-11 浜松ホトニクス株式会社 観察装置

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