JP2014523136A - 投影リソグラフィのための照明光学ユニット - Google Patents

投影リソグラフィのための照明光学ユニット Download PDF

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Publication number
JP2014523136A
JP2014523136A JP2014519525A JP2014519525A JP2014523136A JP 2014523136 A JP2014523136 A JP 2014523136A JP 2014519525 A JP2014519525 A JP 2014519525A JP 2014519525 A JP2014519525 A JP 2014519525A JP 2014523136 A JP2014523136 A JP 2014523136A
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JP
Japan
Prior art keywords
mirror
optical unit
illumination
illumination optical
support frame
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Pending
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JP2014519525A
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English (en)
Japanese (ja)
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JP2014523136A5 (OSRAM
Inventor
クリシュトフ ヘンナーケス
インゴ ゼンガー
ヨルグ ツィマーマン
ヨハネス ルオッフ
マルティン マイアー
フランク シュレゼナー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2014523136A publication Critical patent/JP2014523136A/ja
Publication of JP2014523136A5 publication Critical patent/JP2014523136A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2014519525A 2011-07-11 2012-07-11 投影リソグラフィのための照明光学ユニット Pending JP2014523136A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161506250P 2011-07-11 2011-07-11
DE102011078928A DE102011078928A1 (de) 2011-07-11 2011-07-11 Beleuchtungsoptik für die Projektionslithografie
DE102011078928.6 2011-07-11
US61/506,250 2011-07-11
PCT/EP2012/063520 WO2013007731A1 (en) 2011-07-11 2012-07-11 Illumination optical unit for projection lithography

Publications (2)

Publication Number Publication Date
JP2014523136A true JP2014523136A (ja) 2014-09-08
JP2014523136A5 JP2014523136A5 (OSRAM) 2015-08-27

Family

ID=47425403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014519525A Pending JP2014523136A (ja) 2011-07-11 2012-07-11 投影リソグラフィのための照明光学ユニット

Country Status (5)

Country Link
US (1) US9507269B2 (OSRAM)
JP (1) JP2014523136A (OSRAM)
DE (1) DE102011078928A1 (OSRAM)
TW (1) TWI574115B (OSRAM)
WO (1) WO2013007731A1 (OSRAM)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012206153A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102013200394A1 (de) 2013-01-14 2014-07-17 Carl Zeiss Smt Gmbh Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung
DE102014204818A1 (de) 2014-03-14 2015-09-17 Carl Zeiss Smt Gmbh Optisches Bauelement
US20190017878A1 (en) * 2017-07-12 2019-01-17 Radiant Innovation Inc. Non-contact temperature measuring device
DE102019200193B3 (de) 2019-01-09 2020-02-06 Carl Zeiss Smt Gmbh Optisches System für eine Projektionsbelichtungsanlage
US12399431B2 (en) * 2021-11-15 2025-08-26 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor processing tool and methods of operation
CN117471633B (zh) * 2023-10-17 2025-09-30 中国科学院合肥物质科学研究院 一种红外激光光学镜的调节机构

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06181153A (ja) * 1992-12-11 1994-06-28 Mitsubishi Electric Corp 光描画装置
JPH06267891A (ja) * 1992-10-20 1994-09-22 Samsung Electron Co Ltd 投影露光装置
JP2005303084A (ja) * 2004-04-13 2005-10-27 Nikon Corp 露光装置、露光装置の製造方法、露光装置の調整方法及びマイクロデバイスの製造方法
WO2006082738A1 (ja) * 2005-02-03 2006-08-10 Nikon Corporation オプティカルインテグレータ、照明光学装置、露光装置、および露光方法
JP2007536754A (ja) * 2004-05-06 2007-12-13 カール ツァイス レーザー オプティクス ゲーエムベーハー 熱挙動が改良された光学部品
JP2008538452A (ja) * 2005-04-20 2008-10-23 カール・ツァイス・エスエムティー・アーゲー 投影露光系、このような投影露光系の補助により微細構造の構成部材を製造する方法、このような系において使用するために適応させた偏光光学素子
JP2011512659A (ja) * 2008-02-15 2011-04-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
WO2013135532A1 (en) * 2012-03-14 2013-09-19 Carl Zeiss Smt Gmbh Illumination optical unit for a projection exposure apparatus
WO2013178432A1 (en) * 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Illumination optical unit for projection lithography

Family Cites Families (9)

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EP0648348B1 (en) * 1993-03-01 1999-04-28 General Signal Corporation Variable annular illuminator for photolithographic projection imager.
US6573978B1 (en) * 1999-01-26 2003-06-03 Mcguire, Jr. James P. EUV condenser with non-imaging optics
US20050099611A1 (en) * 2002-06-20 2005-05-12 Nikon Corporation Minimizing thermal distortion effects on EUV mirror
JP5053543B2 (ja) 2005-02-02 2012-10-17 東ソー株式会社 タンタル化合物、その製造方法、タンタル含有薄膜、及びその形成方法
KR101127346B1 (ko) 2005-09-13 2012-03-29 칼 짜이스 에스엠티 게엠베하 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
US7591561B2 (en) * 2005-10-13 2009-09-22 Nikon Corporation Liquid cooled mirror for use in extreme ultraviolet lithography
DE102006039655A1 (de) * 2006-08-24 2008-03-20 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostruktuierten Bauelements mit einer derartigen Projektionsbelichtungsanlage sowie durch dieses Verfahren hergestelltes mikrostrukturiertes Bauelement
DE102008021833B4 (de) 2007-12-19 2010-04-22 Carl Zeiss Smt Ag Verfahren zur Einstellung einer Beleuchtungswinkelverteilung und gleichzeitig einer Intensitätsverteilung über ein in ein Bildfeld abzubildendes Objektfeld
DE102009029103A1 (de) 2008-11-20 2010-05-27 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine Mikrolithographische Projektionsbelichtungsanlage

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06267891A (ja) * 1992-10-20 1994-09-22 Samsung Electron Co Ltd 投影露光装置
JPH06181153A (ja) * 1992-12-11 1994-06-28 Mitsubishi Electric Corp 光描画装置
JP2005303084A (ja) * 2004-04-13 2005-10-27 Nikon Corp 露光装置、露光装置の製造方法、露光装置の調整方法及びマイクロデバイスの製造方法
JP2007536754A (ja) * 2004-05-06 2007-12-13 カール ツァイス レーザー オプティクス ゲーエムベーハー 熱挙動が改良された光学部品
WO2006082738A1 (ja) * 2005-02-03 2006-08-10 Nikon Corporation オプティカルインテグレータ、照明光学装置、露光装置、および露光方法
JP2008538452A (ja) * 2005-04-20 2008-10-23 カール・ツァイス・エスエムティー・アーゲー 投影露光系、このような投影露光系の補助により微細構造の構成部材を製造する方法、このような系において使用するために適応させた偏光光学素子
JP2011512659A (ja) * 2008-02-15 2011-04-21 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光装置に使用するファセットミラー
WO2013135532A1 (en) * 2012-03-14 2013-09-19 Carl Zeiss Smt Gmbh Illumination optical unit for a projection exposure apparatus
WO2013178432A1 (en) * 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Illumination optical unit for projection lithography

Also Published As

Publication number Publication date
TWI574115B (zh) 2017-03-11
DE102011078928A1 (de) 2013-01-17
WO2013007731A1 (en) 2013-01-17
US20140111785A1 (en) 2014-04-24
TW201321902A (zh) 2013-06-01
US9507269B2 (en) 2016-11-29

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