JP2014517998A5 - - Google Patents
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- Publication number
- JP2014517998A5 JP2014517998A5 JP2014511980A JP2014511980A JP2014517998A5 JP 2014517998 A5 JP2014517998 A5 JP 2014517998A5 JP 2014511980 A JP2014511980 A JP 2014511980A JP 2014511980 A JP2014511980 A JP 2014511980A JP 2014517998 A5 JP2014517998 A5 JP 2014517998A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- protective material
- substrate
- patterned
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims 36
- 238000004519 manufacturing process Methods 0.000 claims 21
- 230000001681 protective effect Effects 0.000 claims 19
- 239000000758 substrate Substances 0.000 claims 12
- 238000001035 drying Methods 0.000 claims 5
- 238000004590 computer program Methods 0.000 claims 4
- 238000002844 melting Methods 0.000 claims 4
- 230000008018 melting Effects 0.000 claims 4
- 238000010438 heat treatment Methods 0.000 claims 2
- 239000011810 insulating material Substances 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 238000002679 ablation Methods 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP11167070 | 2011-05-23 | ||
| EP11167070.9 | 2011-05-23 | ||
| PCT/IB2012/052292 WO2012160468A1 (en) | 2011-05-23 | 2012-05-09 | Fabrication apparatus for fabricating a patterned layer |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014517998A JP2014517998A (ja) | 2014-07-24 |
| JP2014517998A5 true JP2014517998A5 (https=) | 2015-06-25 |
| JP6058640B2 JP6058640B2 (ja) | 2017-01-11 |
Family
ID=46208109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014511980A Expired - Fee Related JP6058640B2 (ja) | 2011-05-23 | 2012-05-09 | パターン化された層を製作するための製作装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9472787B2 (https=) |
| EP (1) | EP2715829B1 (https=) |
| JP (1) | JP6058640B2 (https=) |
| CN (1) | CN103548174B (https=) |
| WO (1) | WO2012160468A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9231212B2 (en) * | 2011-05-23 | 2016-01-05 | Koninklijke Philips N.V. | Fabrication apparatus for fabricating a layer structure |
| EP3041890A1 (en) * | 2013-09-06 | 2016-07-13 | Solvay Specialty Polymers Italy S.p.A. | Electrically conducting assemblies |
| JP6836908B2 (ja) * | 2017-01-10 | 2021-03-03 | 住友化学株式会社 | 有機デバイスの製造方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030148024A1 (en) | 2001-10-05 | 2003-08-07 | Kodas Toivo T. | Low viscosity precursor compositons and methods for the depositon of conductive electronic features |
| WO2003055636A1 (en) * | 2001-12-21 | 2003-07-10 | Ifire Technology Inc. | Method of laser ablation for patterning thin film layers for electroluminescent displays |
| KR100778286B1 (ko) * | 2001-12-29 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | 유기전기발광소자의 제조 방법 |
| US7288469B2 (en) | 2004-12-03 | 2007-10-30 | Eastman Kodak Company | Methods and apparatuses for forming an article |
| TW200640596A (en) | 2005-01-14 | 2006-12-01 | Cabot Corp | Production of metal nanoparticles |
| US7510951B2 (en) * | 2005-05-12 | 2009-03-31 | Lg Chem, Ltd. | Method for forming high-resolution pattern with direct writing means |
| KR100833017B1 (ko) * | 2005-05-12 | 2008-05-27 | 주식회사 엘지화학 | 직접 패턴법을 이용한 고해상도 패턴형성방법 |
| CN101213682B (zh) * | 2005-06-30 | 2011-08-03 | 皇家飞利浦电子股份有限公司 | 用于在有机功能设备中形成电极层图案的方法 |
| KR100690930B1 (ko) * | 2006-05-03 | 2007-03-09 | 한국기계연구원 | 깊은 제거를 이용하여 원하는 패턴 두께 혹은 높은종횡비를 가지는 고해상도 패턴 형성 방법 |
| JP4356899B2 (ja) * | 2007-03-15 | 2009-11-04 | 財団法人山形県産業技術振興機構 | 有機ｅｌ発光装置およびその製造方法 |
| DE102007043182A1 (de) * | 2007-09-11 | 2009-03-12 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung dicker Leiterbahnen auf Halbleiterbauelementen und Halbleiterbauelement |
| EP2086033A1 (en) * | 2008-01-31 | 2009-08-05 | Applied Materials, Inc. | Method of coating a substrate and coating installation |
| JPWO2011155306A1 (ja) * | 2010-06-07 | 2013-08-01 | Ｎｅｃライティング株式会社 | 有機エレクトロルミネッセンス照明装置 |
-
2012
- 2012-05-09 US US14/117,436 patent/US9472787B2/en not_active Expired - Fee Related
- 2012-05-09 JP JP2014511980A patent/JP6058640B2/ja not_active Expired - Fee Related
- 2012-05-09 WO PCT/IB2012/052292 patent/WO2012160468A1/en not_active Ceased
- 2012-05-09 EP EP12725503.2A patent/EP2715829B1/en not_active Not-in-force
- 2012-05-09 CN CN201280024866.5A patent/CN103548174B/zh not_active Expired - Fee Related
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