JP6058640B2 - パターン化された層を製作するための製作装置 - Google Patents

パターン化された層を製作するための製作装置 Download PDF

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Publication number
JP6058640B2
JP6058640B2 JP2014511980A JP2014511980A JP6058640B2 JP 6058640 B2 JP6058640 B2 JP 6058640B2 JP 2014511980 A JP2014511980 A JP 2014511980A JP 2014511980 A JP2014511980 A JP 2014511980A JP 6058640 B2 JP6058640 B2 JP 6058640B2
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Japan
Prior art keywords
layer
protective material
substrate
unit
patterned
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2014511980A
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English (en)
Japanese (ja)
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JP2014517998A (ja
JP2014517998A5 (https=
Inventor
クリストフ リッカース
クリストフ リッカース
ピーター ガイスバータス マリア クルアイト
ピーター ガイスバータス マリア クルアイト
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OLEDworks GmbH
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OLEDworks GmbH
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Application filed by OLEDworks GmbH filed Critical OLEDworks GmbH
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
JP2014511980A 2011-05-23 2012-05-09 パターン化された層を製作するための製作装置 Expired - Fee Related JP6058640B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP11167070 2011-05-23
EP11167070.9 2011-05-23
PCT/IB2012/052292 WO2012160468A1 (en) 2011-05-23 2012-05-09 Fabrication apparatus for fabricating a patterned layer

Publications (3)

Publication Number Publication Date
JP2014517998A JP2014517998A (ja) 2014-07-24
JP2014517998A5 JP2014517998A5 (https=) 2015-06-25
JP6058640B2 true JP6058640B2 (ja) 2017-01-11

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ID=46208109

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JP2014511980A Expired - Fee Related JP6058640B2 (ja) 2011-05-23 2012-05-09 パターン化された層を製作するための製作装置

Country Status (5)

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US (1) US9472787B2 (https=)
EP (1) EP2715829B1 (https=)
JP (1) JP6058640B2 (https=)
CN (1) CN103548174B (https=)
WO (1) WO2012160468A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9231212B2 (en) * 2011-05-23 2016-01-05 Koninklijke Philips N.V. Fabrication apparatus for fabricating a layer structure
EP3041890A1 (en) * 2013-09-06 2016-07-13 Solvay Specialty Polymers Italy S.p.A. Electrically conducting assemblies
JP6836908B2 (ja) * 2017-01-10 2021-03-03 住友化学株式会社 有機デバイスの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030148024A1 (en) 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
WO2003055636A1 (en) * 2001-12-21 2003-07-10 Ifire Technology Inc. Method of laser ablation for patterning thin film layers for electroluminescent displays
KR100778286B1 (ko) * 2001-12-29 2007-11-22 엘지.필립스 엘시디 주식회사 유기전기발광소자의 제조 방법
US7288469B2 (en) 2004-12-03 2007-10-30 Eastman Kodak Company Methods and apparatuses for forming an article
TW200640596A (en) 2005-01-14 2006-12-01 Cabot Corp Production of metal nanoparticles
US7510951B2 (en) * 2005-05-12 2009-03-31 Lg Chem, Ltd. Method for forming high-resolution pattern with direct writing means
KR100833017B1 (ko) * 2005-05-12 2008-05-27 주식회사 엘지화학 직접 패턴법을 이용한 고해상도 패턴형성방법
CN101213682B (zh) * 2005-06-30 2011-08-03 皇家飞利浦电子股份有限公司 用于在有机功能设备中形成电极层图案的方法
KR100690930B1 (ko) * 2006-05-03 2007-03-09 한국기계연구원 깊은 제거를 이용하여 원하는 패턴 두께 혹은 높은종횡비를 가지는 고해상도 패턴 형성 방법
JP4356899B2 (ja) * 2007-03-15 2009-11-04 財団法人山形県産業技術振興機構 有機ｅｌ発光装置およびその製造方法
DE102007043182A1 (de) * 2007-09-11 2009-03-12 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung dicker Leiterbahnen auf Halbleiterbauelementen und Halbleiterbauelement
EP2086033A1 (en) * 2008-01-31 2009-08-05 Applied Materials, Inc. Method of coating a substrate and coating installation
JPWO2011155306A1 (ja) * 2010-06-07 2013-08-01 Ｎｅｃライティング株式会社 有機エレクトロルミネッセンス照明装置

Also Published As

Publication number Publication date
JP2014517998A (ja) 2014-07-24
US9472787B2 (en) 2016-10-18
EP2715829A1 (en) 2014-04-09
WO2012160468A1 (en) 2012-11-29
CN103548174A (zh) 2014-01-29
EP2715829B1 (en) 2016-06-29
US20140203250A1 (en) 2014-07-24
CN103548174B (zh) 2016-09-28

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