JP2014513390A5 - - Google Patents
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- Publication number
- JP2014513390A5 JP2014513390A5 JP2014502755A JP2014502755A JP2014513390A5 JP 2014513390 A5 JP2014513390 A5 JP 2014513390A5 JP 2014502755 A JP2014502755 A JP 2014502755A JP 2014502755 A JP2014502755 A JP 2014502755A JP 2014513390 A5 JP2014513390 A5 JP 2014513390A5
- Authority
- JP
- Japan
- Prior art keywords
- grid
- ion
- incident
- energy analyzer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002500 ions Chemical class 0.000 claims 106
- 239000000758 substrate Substances 0.000 claims 36
- 238000000034 method Methods 0.000 claims 28
- 230000004907 flux Effects 0.000 claims 15
- 239000011521 glass Substances 0.000 claims 11
- 239000012212 insulator Substances 0.000 claims 9
- 238000005036 potential barrier Methods 0.000 claims 7
- 238000009826 distribution Methods 0.000 claims 5
- 230000015556 catabolic process Effects 0.000 claims 4
- 239000004020 conductor Substances 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 239000010703 silicon Substances 0.000 claims 4
- 238000010304 firing Methods 0.000 claims 3
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims 2
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims 2
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical group [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 claims 1
- 238000005513 bias potential Methods 0.000 claims 1
- 230000006378 damage Effects 0.000 claims 1
- 238000005553 drilling Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 238000002955 isolation Methods 0.000 claims 1
- 238000003754 machining Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- 230000000149 penetrating effect Effects 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161468187P | 2011-03-28 | 2011-03-28 | |
| US61/468,187 | 2011-03-28 | ||
| PCT/US2012/030960 WO2012135351A2 (en) | 2011-03-28 | 2012-03-28 | Ion energy analyzer, methods of electrical signaling therein, and methods of manufacturing and operating the same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014513390A JP2014513390A (ja) | 2014-05-29 |
| JP2014513390A5 true JP2014513390A5 (cg-RX-API-DMAC7.html) | 2015-05-14 |
| JP6023787B2 JP6023787B2 (ja) | 2016-11-09 |
Family
ID=46925972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014502755A Expired - Fee Related JP6023787B2 (ja) | 2011-03-28 | 2012-03-28 | イオンエネルギーアナライザ、イオンエネルギーアナライザを有する診断用ウエハ |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US9087677B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6023787B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101967490B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN103534780B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI505318B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2012135351A2 (cg-RX-API-DMAC7.html) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI485024B (zh) * | 2013-01-15 | 2015-05-21 | Univ Nat Yunlin Sci & Tech | Laser processing device with auxiliary plate |
| TWI493194B (zh) * | 2013-07-15 | 2015-07-21 | Mpi Corp | Probe module with feedback test function |
| US9500675B2 (en) | 2013-07-15 | 2016-11-22 | Mpi Corporation | Probe module supporting loopback test |
| CN104422478B (zh) * | 2013-08-23 | 2017-05-17 | 中国科学院空间科学与应用研究中心 | 一种超高速撞击中瞬态等离子体参数测量的方法 |
| US20180218895A1 (en) * | 2013-12-31 | 2018-08-02 | DH Technologies Development Pte Ltd. | Method for Removing Trapped Ions from a Multipole Device |
| CN105607107B (zh) * | 2014-11-21 | 2018-05-04 | 中国科学院空间科学与应用研究中心 | 一种利用栅网调控的空间能量粒子的多方向探测装置 |
| US9595424B2 (en) | 2015-03-02 | 2017-03-14 | Lam Research Corporation | Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes |
| US10553411B2 (en) * | 2015-09-10 | 2020-02-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | Ion collector for use in plasma systems |
| US9761414B2 (en) | 2015-10-08 | 2017-09-12 | Lam Research Corporation | Uniformity control circuit for use within an impedance matching circuit |
| DE102016204679B4 (de) * | 2016-03-22 | 2019-03-21 | Airbus Defence and Space GmbH | Ionensensor |
| US10026592B2 (en) | 2016-07-01 | 2018-07-17 | Lam Research Corporation | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing |
| KR102543349B1 (ko) * | 2016-07-11 | 2023-06-30 | 삼성전자주식회사 | 플라즈마 모니터링 장치 |
| US20180122670A1 (en) * | 2016-11-01 | 2018-05-03 | Varian Semiconductor Equipment Associates, Inc. | Removable substrate plane structure ring |
| KR20190014623A (ko) * | 2017-08-03 | 2019-02-13 | 삼성전자주식회사 | 플라즈마 공정 장치 및 이를 이용한 반도체 장치 제조 방법 |
| CN108022824A (zh) * | 2017-11-21 | 2018-05-11 | 中国科学技术大学 | 高精度离子能量分析仪 |
| US11153960B1 (en) * | 2018-06-08 | 2021-10-19 | Innoveering, LLC | Plasma-based electro-optical sensing and methods |
| JP7202972B2 (ja) | 2018-06-29 | 2023-01-12 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ状態検出方法およびプラズマ状態検出プログラム |
| WO2020004091A1 (ja) | 2018-06-29 | 2020-01-02 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ状態検出方法およびプラズマ状態検出プログラム |
| WO2021089127A1 (de) * | 2019-11-05 | 2021-05-14 | Ev Group E. Thallner Gmbh | Verfahren zur herstellung einer analysevorrichtung |
| EP3968353A1 (en) | 2020-09-10 | 2022-03-16 | Impedans Ltd | Apparatus for ion energy analysis of plasma processes |
| US11264212B1 (en) | 2020-09-29 | 2022-03-01 | Tokyo Electron Limited | Ion angle detector |
| CN112696329B (zh) * | 2020-12-14 | 2022-06-10 | 兰州空间技术物理研究所 | 一种离子推力器栅极绝缘连接结构及装配方法 |
| KR20250033239A (ko) * | 2022-06-30 | 2025-03-07 | 도쿄엘렉트론가부시키가이샤 | 조정 방법 및 플라즈마 처리 장치 |
| EP4625471A3 (en) * | 2022-11-25 | 2025-12-31 | Applied Materials, Inc. | ARMORED APPARATUS FOR THE ANALYSIS OF THE IONIC ENERGY OF PLASMA PROCESSES |
| US12555756B2 (en) | 2023-10-19 | 2026-02-17 | Tokyo Electron Limited | System and method to measure ion properties in a plasma system |
| WO2025159420A1 (ko) * | 2024-01-25 | 2025-07-31 | (주)아이씨디 | 플라즈마에서 대상물의 전위 제어 장치 및 그 전위 제어 방법 |
| US20260074174A1 (en) * | 2024-09-06 | 2026-03-12 | Applied Materials, Inc. | Retarding field energy analyzer with magnetic filter |
| CN119381231B (zh) * | 2024-09-27 | 2025-10-28 | 北京航天控制仪器研究所 | 一种离子能量筛选装置及方法 |
| CN119936953A (zh) * | 2025-01-21 | 2025-05-06 | 北京东方计量测试研究所 | 用于原位测量离子能量和通量的装置 |
| CN120468911B (zh) * | 2025-03-07 | 2025-11-04 | 中国科学院国家空间科学中心 | 一种自适应低能粒子探测系统 |
Family Cites Families (47)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4578589A (en) | 1983-08-15 | 1986-03-25 | Applied Materials, Inc. | Apparatus and methods for ion implantation |
| JPS60126832A (ja) | 1983-12-14 | 1985-07-06 | Hitachi Ltd | ドライエツチング方法および装置 |
| US5347905A (en) * | 1987-04-20 | 1994-09-20 | Cipriani Thomas | Adjustable bridge system for acoustical stringed instruments |
| JPH0221547A (ja) * | 1988-07-08 | 1990-01-24 | Fuji Electric Co Ltd | 液体金属イオン源 |
| GB8917570D0 (en) | 1989-08-01 | 1989-09-13 | Vg Instr Group | Plasma source mass spectrometry |
| US5223771A (en) * | 1991-06-17 | 1993-06-29 | Western Digital (Singapore) Pte., Ltd. | Polyphase brushless DC Motor control |
| US5160840A (en) | 1991-10-25 | 1992-11-03 | Vestal Marvin L | Time-of-flight analyzer and method |
| US5384465A (en) * | 1993-09-17 | 1995-01-24 | Applied Materials, Inc. | Spectrum analyzer in an ion implanter |
| JP2591081Y2 (ja) * | 1993-12-29 | 1999-02-24 | 日新電機株式会社 | イオン源電極支持装置 |
| ES2331494T3 (es) * | 1994-02-28 | 2010-01-05 | Perkinelmer Health Sciences, Inc. | Guia de iones multipolar para espectrometria de masas. |
| US5565881A (en) * | 1994-03-11 | 1996-10-15 | Motorola, Inc. | Balun apparatus including impedance transformer having transformation length |
| JP3136054B2 (ja) | 1994-08-16 | 2001-02-19 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US5451784A (en) | 1994-10-31 | 1995-09-19 | Applied Materials, Inc. | Composite diagnostic wafer for semiconductor wafer processing systems |
| US5565681A (en) * | 1995-03-23 | 1996-10-15 | Applied Materials, Inc. | Ion energy analyzer with an electrically controlled geometric filter |
| US5650618A (en) * | 1995-11-30 | 1997-07-22 | The Regents Of The University Of California | Compact mass spectrometer for plasma discharge ion analysis |
| US5989349A (en) | 1997-06-24 | 1999-11-23 | Applied Materials, Inc. | Diagnostic pedestal assembly for a semiconductor wafer processing system |
| JP2000208295A (ja) | 1999-01-11 | 2000-07-28 | Hitachi Ltd | プラズマ計測電極およびそれを用いた計測方法 |
| US6326794B1 (en) | 1999-01-14 | 2001-12-04 | International Business Machines Corporation | Method and apparatus for in-situ monitoring of ion energy distribution for endpoint detection via capacitance measurement |
| US6653852B1 (en) | 2000-03-31 | 2003-11-25 | Lam Research Corporation | Wafer integrated plasma probe assembly array |
| JP4175456B2 (ja) | 2002-03-26 | 2008-11-05 | 株式会社 東北テクノアーチ | オンウエハ・モニタリング・システム |
| US7045466B2 (en) | 2002-06-27 | 2006-05-16 | Cornell Research Foundation, Inc. | Three dimensional high aspect ratio micromachining |
| US20050011611A1 (en) | 2002-07-12 | 2005-01-20 | Mahoney Leonard J. | Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| US6830650B2 (en) | 2002-07-12 | 2004-12-14 | Advanced Energy Industries, Inc. | Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
| JP4268812B2 (ja) | 2003-01-31 | 2009-05-27 | 株式会社アルバック | イオンエネルギー分析器の感度補正方法 |
| US7557362B2 (en) | 2004-02-04 | 2009-07-07 | Veeco Instruments Inc. | Ion sources and methods for generating an ion beam with a controllable ion current density distribution |
| US8158016B2 (en) | 2004-02-04 | 2012-04-17 | Veeco Instruments, Inc. | Methods of operating an electromagnet of an ion source |
| JP2004281232A (ja) * | 2003-03-14 | 2004-10-07 | Ebara Corp | ビーム源及びビーム処理装置 |
| US7445830B2 (en) * | 2003-03-17 | 2008-11-04 | Tech-Wood International Ltd. | Reinforced profile containing elements to limit expansion |
| US7947950B2 (en) | 2003-03-20 | 2011-05-24 | Stc.Unm | Energy focus for distance of flight mass spectometry with constant momentum acceleration and an ion mirror |
| US6881966B2 (en) | 2003-05-15 | 2005-04-19 | Axcelis Technologies, Inc. | Hybrid magnetic/electrostatic deflector for ion implantation systems |
| CN101006541B (zh) * | 2003-06-02 | 2010-07-07 | 福克斯·彻斯癌症中心 | 高能多能离子选择系统、离子束治疗系统及离子束治疗中心 |
| US7385187B2 (en) | 2003-06-21 | 2008-06-10 | Leco Corporation | Multi-reflecting time-of-flight mass spectrometer and method of use |
| US6902646B2 (en) * | 2003-08-14 | 2005-06-07 | Advanced Energy Industries, Inc. | Sensor array for measuring plasma characteristics in plasma processing environments |
| US7740737B2 (en) | 2004-06-21 | 2010-06-22 | Tokyo Electron Limited | Plasma processing apparatus and method |
| US20060043063A1 (en) | 2004-09-02 | 2006-03-02 | Mahoney Leonard J | Electrically floating diagnostic plasma probe with ion property sensors |
| JP4773079B2 (ja) | 2004-11-26 | 2011-09-14 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置の制御方法 |
| US7691226B2 (en) | 2005-03-24 | 2010-04-06 | Tokyo Electron Limited | Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement program |
| TWI268183B (en) * | 2005-10-28 | 2006-12-11 | Ind Tech Res Inst | Capacitive ultrasonic transducer and method of fabricating the same |
| US7476849B2 (en) * | 2006-03-10 | 2009-01-13 | Varian Semiconductor Equipment Associates, Inc. | Technique for monitoring and controlling a plasma process |
| KR100782370B1 (ko) | 2006-08-04 | 2007-12-07 | 삼성전자주식회사 | 지연 전기장을 이용한 이온 에너지 분포 분석기에 근거한이온 분석 시스템 |
| US20080179264A1 (en) * | 2007-01-25 | 2008-07-31 | Abrams Franklin J | Glassware or stemware drying mat with stainless steel serving tray |
| KR100868019B1 (ko) | 2007-01-30 | 2008-11-10 | 삼성전자주식회사 | 플라즈마 쉬쓰 제어기를 갖는 이온 빔 장치 |
| US7867409B2 (en) | 2007-03-29 | 2011-01-11 | Tokyo Electron Limited | Control of ion angular distribution function at wafer surface |
| US7777179B2 (en) | 2008-03-31 | 2010-08-17 | Tokyo Electron Limited | Two-grid ion energy analyzer and methods of manufacturing and operating |
| US7875859B2 (en) * | 2008-03-31 | 2011-01-25 | Tokyo Electron Limited | Ion energy analyzer and methods of manufacturing and operating |
| TWI383715B (zh) * | 2008-05-16 | 2013-01-21 | Nan Ya Printed Circuit Board | 高密度基板之結構與製法 |
| JP5428450B2 (ja) * | 2009-03-30 | 2014-02-26 | ソニー株式会社 | イオン照射ダメージの予測方法とイオン照射ダメージのシミュレータ、およびイオン照射装置とイオン照射方法 |
-
2012
- 2012-03-28 US US13/433,078 patent/US9087677B2/en not_active Expired - Fee Related
- 2012-03-28 US US13/433,088 patent/US8816281B2/en not_active Expired - Fee Related
- 2012-03-28 JP JP2014502755A patent/JP6023787B2/ja not_active Expired - Fee Related
- 2012-03-28 TW TW101110830A patent/TWI505318B/zh not_active IP Right Cessation
- 2012-03-28 KR KR1020137028485A patent/KR101967490B1/ko not_active Expired - Fee Related
- 2012-03-28 CN CN201280023721.3A patent/CN103534780B/zh not_active Expired - Fee Related
- 2012-03-28 US US13/433,071 patent/US8847159B2/en not_active Expired - Fee Related
- 2012-03-28 WO PCT/US2012/030960 patent/WO2012135351A2/en not_active Ceased
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