JP2014510645A5 - - Google Patents
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- Publication number
- JP2014510645A5 JP2014510645A5 JP2013557810A JP2013557810A JP2014510645A5 JP 2014510645 A5 JP2014510645 A5 JP 2014510645A5 JP 2013557810 A JP2013557810 A JP 2013557810A JP 2013557810 A JP2013557810 A JP 2013557810A JP 2014510645 A5 JP2014510645 A5 JP 2014510645A5
- Authority
- JP
- Japan
- Prior art keywords
- protrusions
- pad conditioner
- mechanical polishing
- chemical mechanical
- polishing pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims 15
- 239000000126 substance Substances 0.000 claims 15
- 239000000758 substrate Substances 0.000 claims 12
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 229910003460 diamond Inorganic materials 0.000 claims 4
- 239000010432 diamond Substances 0.000 claims 4
- 239000011148 porous material Substances 0.000 claims 4
- 230000005484 gravity Effects 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161449851P | 2011-03-07 | 2011-03-07 | |
| US61/449,851 | 2011-03-07 | ||
| US201161506483P | 2011-07-11 | 2011-07-11 | |
| US61/506,483 | 2011-07-11 | ||
| US201161513294P | 2011-07-29 | 2011-07-29 | |
| US61/513,294 | 2011-07-29 | ||
| PCT/US2012/027916 WO2012122186A2 (en) | 2011-03-07 | 2012-03-06 | Chemical mechanical planarization pad conditioner |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014510645A JP2014510645A (ja) | 2014-05-01 |
| JP2014510645A5 true JP2014510645A5 (cg-RX-API-DMAC7.html) | 2015-04-23 |
| JP6133218B2 JP6133218B2 (ja) | 2017-05-24 |
Family
ID=46798753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013557810A Active JP6133218B2 (ja) | 2011-03-07 | 2012-03-06 | 化学機械平坦化パッドコンディショナー |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US9132526B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2684211B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6133218B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101916492B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN103688343B (cg-RX-API-DMAC7.html) |
| SG (1) | SG193340A1 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI592258B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2012122186A2 (cg-RX-API-DMAC7.html) |
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| US20190337119A1 (en) * | 2016-12-21 | 2019-11-07 | 3M Innovative Properties Company | Pad conditioner with spacer and wafer planarization system |
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| US10857651B2 (en) * | 2017-11-20 | 2020-12-08 | Taiwan Semiconductor Manufacturing Company Ltd. | Apparatus of chemical mechanical polishing and operating method thereof |
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| KR102156997B1 (ko) * | 2019-03-11 | 2020-09-16 | 한양대학교 에리카산학협력단 | Cmp 패드 컨디셔너 및 그 동작 방법 |
| JP7368492B2 (ja) * | 2019-04-09 | 2023-10-24 | インテグリス・インコーポレーテッド | ディスクのセグメント設計 |
| CN110722456A (zh) * | 2019-10-14 | 2020-01-24 | 西安奕斯伟硅片技术有限公司 | 一种抛光垫修整设备和方法 |
| TWI859404B (zh) * | 2020-01-30 | 2024-10-21 | 台灣積體電路製造股份有限公司 | 可攜式清潔裝置 |
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| CN113050384B (zh) * | 2020-04-23 | 2025-02-18 | 台湾积体电路制造股份有限公司 | 半导体晶圆加工方法及清洁刷头 |
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| CN113199400A (zh) * | 2021-05-25 | 2021-08-03 | 宁波江丰电子材料股份有限公司 | 一种化学机械研磨抛光垫整修器及其制备方法 |
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-
2012
- 2012-03-06 SG SG2013067152A patent/SG193340A1/en unknown
- 2012-03-06 CN CN201280022237.9A patent/CN103688343B/zh active Active
- 2012-03-06 EP EP12754519.2A patent/EP2684211B1/en active Active
- 2012-03-06 WO PCT/US2012/027916 patent/WO2012122186A2/en not_active Ceased
- 2012-03-06 US US14/004,152 patent/US9132526B2/en active Active
- 2012-03-06 JP JP2013557810A patent/JP6133218B2/ja active Active
- 2012-03-06 KR KR1020137025682A patent/KR101916492B1/ko active Active
- 2012-03-07 TW TW101107639A patent/TWI592258B/zh active
-
2015
- 2015-08-20 US US14/831,280 patent/US9616547B2/en active Active