JP2014509038A5 - - Google Patents

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Publication number
JP2014509038A5
JP2014509038A5 JP2013552017A JP2013552017A JP2014509038A5 JP 2014509038 A5 JP2014509038 A5 JP 2014509038A5 JP 2013552017 A JP2013552017 A JP 2013552017A JP 2013552017 A JP2013552017 A JP 2013552017A JP 2014509038 A5 JP2014509038 A5 JP 2014509038A5
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JP
Japan
Prior art keywords
resist layer
imprinted
bcp
polymer block
chemically neutral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013552017A
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English (en)
Japanese (ja)
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JP2014509038A (ja
JP6054306B2 (ja
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Publication date
Priority claimed from US13/018,414 external-priority patent/US9469525B2/en
Application filed filed Critical
Publication of JP2014509038A publication Critical patent/JP2014509038A/ja
Publication of JP2014509038A5 publication Critical patent/JP2014509038A5/ja
Application granted granted Critical
Publication of JP6054306B2 publication Critical patent/JP6054306B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013552017A 2011-01-31 2012-01-18 ブロックコポリマーの自己組織化カラムへの形成 Expired - Fee Related JP6054306B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/018,414 US9469525B2 (en) 2011-01-31 2011-01-31 Modified surface for block copolymer self-assembly
US13/018,414 2011-01-31
PCT/US2012/021780 WO2012106120A2 (en) 2011-01-31 2012-01-18 Forming block copolymer into self-assembled columns

Publications (3)

Publication Number Publication Date
JP2014509038A JP2014509038A (ja) 2014-04-10
JP2014509038A5 true JP2014509038A5 (enExample) 2015-02-19
JP6054306B2 JP6054306B2 (ja) 2016-12-27

Family

ID=46577586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013552017A Expired - Fee Related JP6054306B2 (ja) 2011-01-31 2012-01-18 ブロックコポリマーの自己組織化カラムへの形成

Country Status (3)

Country Link
US (1) US9469525B2 (enExample)
JP (1) JP6054306B2 (enExample)
WO (1) WO2012106120A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120196094A1 (en) * 2011-01-31 2012-08-02 Seagate Technology Llc Hybrid-guided block copolymer assembly
US9566609B2 (en) * 2013-01-24 2017-02-14 Corning Incorporated Surface nanoreplication using polymer nanomasks
ITRM20130278A1 (it) 2013-05-10 2014-11-11 Consiglio Nazionale Ricerche Procedimento di fabbricazione di film autoassemblati di copolimeri a blocchi
US10457088B2 (en) * 2013-05-13 2019-10-29 Ridgefield Acquisition Template for self assembly and method of making a self assembled pattern
CN104562023A (zh) * 2013-10-18 2015-04-29 富泰华工业（深圳）有限公司 树脂与异质材料的复合体的制造方法
US9466527B2 (en) * 2014-02-23 2016-10-11 Tokyo Electron Limited Method for creating contacts in semiconductor substrates
KR102295523B1 (ko) 2014-12-03 2021-08-30 삼성전자 주식회사 미세 패턴 형성 방법 및 이를 이용한 집적회로 소자의 제조 방법
KR102335109B1 (ko) 2014-12-15 2021-12-03 삼성전자 주식회사 미세 패턴 형성 방법 및 이를 이용한 집적회로 소자의 제조 방법
KR20170051886A (ko) 2015-11-03 2017-05-12 삼성전자주식회사 반도체 장치의 패턴 형성 방법
KR102402958B1 (ko) 2015-11-11 2022-05-27 삼성전자주식회사 반도체 장치의 패턴 형성 방법 및 반도체 장치의 제조 방법
US20170174855A1 (en) * 2015-12-20 2017-06-22 Erika Yang Super-hydrophobic surface by chemically modified block copolymer generated nano-structures
FR3060422B1 (fr) * 2016-12-16 2019-05-10 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de fonctionnalisation d'un substrat

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6746825B2 (en) 2001-10-05 2004-06-08 Wisconsin Alumni Research Foundation Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates
US7326514B2 (en) * 2003-03-12 2008-02-05 Cornell Research Foundation, Inc. Organoelement resists for EUV lithography and methods of making the same
CN101120433B (zh) 2004-06-04 2010-12-08 伊利诺伊大学评议会 用于制造并组装可印刷半导体元件的方法
JP4032050B2 (ja) 2004-10-20 2008-01-16 株式会社東芝 磁気記録媒体およびその製造方法
US8287957B2 (en) 2004-11-22 2012-10-16 Wisconsin Alumni Research Foundation Methods and compositions for forming aperiodic patterned copolymer films
US7347953B2 (en) * 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
JP4585476B2 (ja) * 2006-03-16 2010-11-24 株式会社東芝 パターンド媒体および磁気記録装置
JP4543004B2 (ja) 2006-05-11 2010-09-15 株式会社東芝 パタン形成方法、インプリントモールド、および磁気記録媒体の製造方法
JP4163729B2 (ja) 2006-10-03 2008-10-08 株式会社東芝 磁気記録媒体、その製造方法、および磁気記録装置
US8394483B2 (en) * 2007-01-24 2013-03-12 Micron Technology, Inc. Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
US8404124B2 (en) * 2007-06-12 2013-03-26 Micron Technology, Inc. Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
US7790350B2 (en) 2007-07-30 2010-09-07 International Business Machines Corporation Method and materials for patterning a neutral surface
US20090092803A1 (en) 2007-09-27 2009-04-09 Massachusetts Institute Of Technology Self-assembly technique applicable to large areas and nanofabrication
WO2009079241A2 (en) * 2007-12-07 2009-06-25 Wisconsin Alumni Research Foundation Density multiplication and improved lithography by directed block copolymer assembly
US8425982B2 (en) 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
WO2009146086A2 (en) 2008-04-01 2009-12-03 Wisconsin Alumni Research Foundation Molecular transfer printing using block copolymers
JP4654280B2 (ja) 2008-08-28 2011-03-16 株式会社日立製作所 微細構造体の製造方法
US8993060B2 (en) 2008-11-19 2015-03-31 Seagate Technology Llc Chemical pinning to direct addressable array using self-assembling materials
US8362179B2 (en) 2008-11-19 2013-01-29 Wisconsin Alumni Research Foundation Photopatternable imaging layers for controlling block copolymer microdomain orientation

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