JP2014505369A5 - - Google Patents
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- Publication number
- JP2014505369A5 JP2014505369A5 JP2013550780A JP2013550780A JP2014505369A5 JP 2014505369 A5 JP2014505369 A5 JP 2014505369A5 JP 2013550780 A JP2013550780 A JP 2013550780A JP 2013550780 A JP2013550780 A JP 2013550780A JP 2014505369 A5 JP2014505369 A5 JP 2014505369A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate table
- layer
- multilayer coating
- table according
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 19
- 239000011248 coating agent Substances 0.000 claims 18
- 238000000576 coating method Methods 0.000 claims 18
- 239000000463 material Substances 0.000 claims 10
- 238000000231 atomic layer deposition Methods 0.000 claims 7
- 238000000034 method Methods 0.000 claims 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 3
- 238000003486 chemical etching Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000001020 plasma etching Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161438480P | 2011-02-01 | 2011-02-01 | |
| US61/438,480 | 2011-02-01 | ||
| PCT/EP2011/070407 WO2012103967A1 (en) | 2011-02-01 | 2011-11-17 | Substrate table, lithographic apparatus and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014505369A JP2014505369A (ja) | 2014-02-27 |
| JP2014505369A5 true JP2014505369A5 (cg-RX-API-DMAC7.html) | 2015-01-15 |
| JP5989673B2 JP5989673B2 (ja) | 2016-09-07 |
Family
ID=44983562
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013550780A Expired - Fee Related JP5989673B2 (ja) | 2011-02-01 | 2011-11-17 | 基板テーブル、リソグラフィ装置、およびデバイス製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9329497B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5989673B2 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI536117B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2012103967A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2009189A (en) | 2011-08-17 | 2013-02-19 | Asml Netherlands Bv | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
| WO2013113569A1 (en) * | 2012-02-03 | 2013-08-08 | Asml Netherlands B.V. | Substrate holder and method of manufacturing a substrate holder |
| JP6001675B2 (ja) * | 2012-11-28 | 2016-10-05 | 京セラ株式会社 | 載置用部材およびその製造方法 |
| NL2010527A (en) | 2013-03-27 | 2014-09-30 | Asml Netherlands Bv | Object holder, lithographic apparatus, device manufacturing method, and method of manufacturing an object holder. |
| US9284210B2 (en) * | 2014-03-31 | 2016-03-15 | Corning Incorporated | Methods and apparatus for material processing using dual source cyclonic plasma reactor |
| JP6420900B2 (ja) | 2014-10-23 | 2018-11-07 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置用の支持テーブル、基板をロードする方法、リソグラフィ装置及びデバイス製造方法 |
| JP6867149B2 (ja) * | 2015-12-25 | 2021-04-28 | 日本特殊陶業株式会社 | 基板保持部材 |
| WO2019120921A1 (en) * | 2017-12-20 | 2019-06-27 | Asml Holding N.V. | Lithography supports with defined burltop topography |
| KR102800886B1 (ko) * | 2018-08-23 | 2025-04-29 | 에이에스엠 아이피 홀딩 비.브이. | 기판 처리 장치 및 방법 |
| CN113826045A (zh) | 2019-04-30 | 2021-12-21 | Asml荷兰有限公司 | 用于在本体上提供耐磨材料的方法、以及复合体 |
| KR20250139882A (ko) | 2019-05-24 | 2025-09-23 | 에이에스엠엘 홀딩 엔.브이. | 리소그래피 장치, 기판 테이블 및 방법 |
| KR102787404B1 (ko) * | 2020-09-02 | 2025-03-28 | 엔테그리스, 아이엔씨. | 다이아몬드-유사 탄소 및 침착된 규소-기재 물질을 포함하는 엠보싱을 갖는 정전 척, 및 관련 방법 |
| DE102021115970A1 (de) * | 2021-06-21 | 2022-12-22 | Asml Netherlands B.V. | Haltevorrichtung zur Bauteil-Halterung und Verfahren zur Herstellung der Haltevorrichtung |
| EP4386478A1 (en) | 2022-12-12 | 2024-06-19 | ASML Netherlands B.V. | Apparatus and method for electrostatically clamping a substrate |
| EP4425259A1 (en) * | 2023-02-28 | 2024-09-04 | ASML Netherlands B.V. | Method of manufacturing an electrostatic object clamp, electrostatic object clamp and semiconductor processing apparatus |
| EP4488758A1 (en) * | 2023-07-05 | 2025-01-08 | ASML Netherlands B.V. | Object holder with a support surface having a plurality of support elements or optical element for a lithographic apparatus, comprising a metal-si multilayer, a metal-ge multilayer and/or a chromium nitride layer configured to provide a selectively changeable height of individual support elements or shape of the optical element via thermal treatment and method of correcting flatness of a surface of the object holder or the optical element |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4551192A (en) * | 1983-06-30 | 1985-11-05 | International Business Machines Corporation | Electrostatic or vacuum pinchuck formed with microcircuit lithography |
| JP2979922B2 (ja) | 1992-10-12 | 1999-11-22 | 住友電気工業株式会社 | 超薄膜積層部材 |
| US5298103A (en) | 1993-07-15 | 1994-03-29 | Hughes Aircraft Company | Electrode assembly useful in confined plasma assisted chemical etching |
| JPH07138771A (ja) | 1993-11-17 | 1995-05-30 | Kobe Steel Ltd | 多層皮膜被覆金属材料 |
| JPH07207459A (ja) | 1994-01-24 | 1995-08-08 | Kobe Steel Ltd | 多層皮膜被覆金属材料 |
| JP3705382B2 (ja) | 1996-09-03 | 2005-10-12 | 日立ツール株式会社 | 多層被覆硬質工具 |
| JP3705381B2 (ja) | 1996-09-03 | 2005-10-12 | 日立ツール株式会社 | 多層被覆硬質工具 |
| US5841624A (en) * | 1997-06-09 | 1998-11-24 | Applied Materials, Inc. | Cover layer for a substrate support chuck and method of fabricating same |
| JP2000349140A (ja) | 1999-06-01 | 2000-12-15 | Toto Ltd | 静電チャックを用いた被処理体の処理および搬送方法 |
| TW594426B (en) * | 1999-06-11 | 2004-06-21 | Asml Netherlands Bv | Lithographic projection apparatus, integrated circuit manufacturing method and integrated circuit made thereby |
| US7399357B2 (en) | 2003-05-08 | 2008-07-15 | Arthur Sherman | Atomic layer deposition using multilayers |
| EP1498777A1 (en) * | 2003-07-15 | 2005-01-19 | ASML Netherlands B.V. | Substrate holder and lithographic projection apparatus |
| EP1510868A1 (en) * | 2003-08-29 | 2005-03-02 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP2006305713A (ja) * | 2005-03-28 | 2006-11-09 | Nikon Corp | 吸着装置、研磨装置、半導体デバイス及び半導体デバイス製造方法 |
| KR100755874B1 (ko) | 2005-11-30 | 2007-09-05 | 주식회사 아이피에스 | 진공처리장치의 정전척, 그를 가지는 진공처리장치 및정전척의 제조방법 |
| JP4890421B2 (ja) * | 2006-10-31 | 2012-03-07 | 太平洋セメント株式会社 | 静電チャック |
| JP4437301B2 (ja) | 2007-02-28 | 2010-03-24 | エルピーダメモリ株式会社 | 半導体装置の製造方法 |
| JP5059450B2 (ja) * | 2007-03-06 | 2012-10-24 | 東京エレクトロン株式会社 | 基板載置台及び基板処理装置 |
| US7698678B2 (en) * | 2007-05-30 | 2010-04-13 | International Business Machines Corporation | Methodology for automated design of vertical parallel plate capacitors |
| US20100255625A1 (en) | 2007-09-07 | 2010-10-07 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma |
| WO2009035002A1 (ja) * | 2007-09-11 | 2009-03-19 | Canon Anelva Corporation | 静電チャック |
| KR101200785B1 (ko) | 2007-10-12 | 2012-11-13 | 히타치 쓰루 가부시키가이샤 | 경질 피막 피복 부재, 및 그 제조 방법 |
| TWI475594B (zh) | 2008-05-19 | 2015-03-01 | Entegris Inc | 靜電夾頭 |
| JP5268476B2 (ja) | 2008-07-29 | 2013-08-21 | 日本特殊陶業株式会社 | 静電チャック |
-
2011
- 2011-11-17 JP JP2013550780A patent/JP5989673B2/ja not_active Expired - Fee Related
- 2011-11-17 WO PCT/EP2011/070407 patent/WO2012103967A1/en not_active Ceased
- 2011-11-17 US US13/979,278 patent/US9329497B2/en not_active Expired - Fee Related
- 2011-12-06 TW TW100144919A patent/TWI536117B/zh not_active IP Right Cessation