JP2014240488A5 - - Google Patents
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- Publication number
- JP2014240488A5 JP2014240488A5 JP2014139115A JP2014139115A JP2014240488A5 JP 2014240488 A5 JP2014240488 A5 JP 2014240488A5 JP 2014139115 A JP2014139115 A JP 2014139115A JP 2014139115 A JP2014139115 A JP 2014139115A JP 2014240488 A5 JP2014240488 A5 JP 2014240488A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl
- aryl
- groups
- alkenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000003118 aryl group Chemical group 0.000 claims description 24
- 125000005915 C6-C14 aryl group Chemical group 0.000 claims description 16
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000001424 substituent group Chemical group 0.000 claims description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 2
- 125000004043 oxo group Chemical group O=* 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims 18
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims 9
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 8
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 8
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 8
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims 5
- 125000000332 coumarinyl group Chemical group O1C(=O)C(=CC2=CC=CC=C12)* 0.000 claims 5
- 125000001188 haloalkyl group Chemical group 0.000 claims 5
- 229910052736 halogen Inorganic materials 0.000 claims 5
- 150000002367 halogens Chemical class 0.000 claims 5
- 125000001072 heteroaryl group Chemical group 0.000 claims 5
- 238000000034 method Methods 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 5
- 125000006708 (C5-C14) heteroaryl group Chemical group 0.000 claims 4
- 125000004414 alkyl thio group Chemical group 0.000 claims 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000000304 alkynyl group Chemical group 0.000 claims 3
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims 2
- 125000000171 (C1-C6) haloalkyl group Chemical group 0.000 claims 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical group OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims 2
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 claims 2
- 229910003849 O-Si Inorganic materials 0.000 claims 2
- 229910003872 O—Si Inorganic materials 0.000 claims 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims 1
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 1
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 claims 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000009477 glass transition Effects 0.000 claims 1
- 125000000232 haloalkynyl group Chemical group 0.000 claims 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000008096 xylene Substances 0.000 claims 1
- -1 dioxo- (1H, 3H) -pyrimidyl Chemical group 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- 125000005841 biaryl group Chemical group 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003106 haloaryl group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000006413 ring segment Chemical group 0.000 description 2
- NDOVLWQBFFJETK-UHFFFAOYSA-N 1,4-thiazinane 1,1-dioxide Chemical compound O=S1(=O)CCNCC1 NDOVLWQBFFJETK-UHFFFAOYSA-N 0.000 description 1
- 125000001637 1-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C(*)=C([H])C([H])=C([H])C2=C1[H] 0.000 description 1
- 125000001622 2-naphthyl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C(*)C([H])=C([H])C2=C1[H] 0.000 description 1
- OURXRFYZEOUCRM-UHFFFAOYSA-N 4-hydroxymorpholine Chemical compound ON1CCOCC1 OURXRFYZEOUCRM-UHFFFAOYSA-N 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 125000002047 benzodioxolyl group Chemical group O1OC(C2=C1C=CC=C2)* 0.000 description 1
- 125000003016 chromanyl group Chemical group O1C(CCC2=CC=CC=C12)* 0.000 description 1
- 125000004230 chromenyl group Chemical group O1C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 125000004404 heteroalkyl group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000002632 imidazolidinyl group Chemical group 0.000 description 1
- MTNDZQHUAFNZQY-UHFFFAOYSA-N imidazoline Chemical compound C1CN=CN1 MTNDZQHUAFNZQY-UHFFFAOYSA-N 0.000 description 1
- 125000002636 imidazolinyl group Chemical group 0.000 description 1
- 125000003387 indolinyl group Chemical group N1(CCC2=CC=CC=C12)* 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- 125000000160 oxazolidinyl group Chemical group 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000003072 pyrazolidinyl group Chemical group 0.000 description 1
- 125000002755 pyrazolinyl group Chemical group 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 125000001422 pyrrolinyl group Chemical group 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000001712 tetrahydronaphthyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- 125000003507 tetrahydrothiofenyl group Chemical group 0.000 description 1
- 125000004568 thiomorpholinyl group Chemical group 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11740408P | 2008-11-24 | 2008-11-24 | |
| US61/117,404 | 2008-11-24 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011536876A Division JP5684715B2 (ja) | 2008-11-24 | 2009-11-20 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014240488A JP2014240488A (ja) | 2014-12-25 |
| JP2014240488A5 true JP2014240488A5 (enExample) | 2016-02-25 |
| JP5960202B2 JP5960202B2 (ja) | 2016-08-02 |
Family
ID=42084518
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011536876A Active JP5684715B2 (ja) | 2008-11-24 | 2009-11-20 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
| JP2014139115A Expired - Fee Related JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011536876A Active JP5684715B2 (ja) | 2008-11-24 | 2009-11-20 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8937301B2 (enExample) |
| EP (2) | EP2368281B1 (enExample) |
| JP (2) | JP5684715B2 (enExample) |
| KR (2) | KR101717398B1 (enExample) |
| CN (2) | CN103560206B (enExample) |
| TW (1) | TWI491622B (enExample) |
| WO (1) | WO2010057984A2 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011126076A1 (ja) * | 2010-04-09 | 2011-10-13 | 大日本印刷株式会社 | 薄膜トランジスタ基板 |
| KR102007652B1 (ko) * | 2011-03-30 | 2019-08-06 | 디아이씨 가부시끼가이샤 | 중합성 액정 조성물, 편광 발광성 도료, 신규 나프토락탐 유도체, 신규 쿠마린 유도체, 신규 나일레드 유도체 및 신규 안트라센 유도체 |
| EP2812931B1 (en) * | 2012-02-07 | 2018-06-13 | Flexterra, Inc. | Electronic devices comprising photocurable polymeric materials |
| US9171961B2 (en) * | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
| JP6184489B2 (ja) * | 2013-06-07 | 2017-08-23 | 富士フイルム株式会社 | ゲート絶縁膜形成用組成物、有機薄膜トランジスタ、電子ペーパー、ディスプレイデバイス |
| WO2015100333A1 (en) | 2013-12-24 | 2015-07-02 | Polyera Corporation | Support structures for an attachable, two-dimensional flexible electronic device |
| JP6034326B2 (ja) * | 2014-03-26 | 2016-11-30 | 富士フイルム株式会社 | 半導体素子及び絶縁層形成用組成物 |
| US10261634B2 (en) | 2014-03-27 | 2019-04-16 | Flexterra, Inc. | Infrared touch system for flexible displays |
| WO2015183567A1 (en) | 2014-05-28 | 2015-12-03 | Polyera Corporation | Low power display updates |
| US9606439B2 (en) | 2014-07-15 | 2017-03-28 | Eastman Kodak Company | Forming conductive metal patterns using water-soluble polymers |
| WO2016046659A1 (en) * | 2014-09-25 | 2016-03-31 | Basf Se | Ether-based polymers as photo-crosslinkable dielectrics |
| CN107003608B (zh) * | 2014-10-24 | 2020-09-25 | 飞利斯有限公司 | 可光图案化组合物及使用其制造晶体管器件的方法 |
| US9761817B2 (en) | 2015-03-13 | 2017-09-12 | Corning Incorporated | Photo-patternable gate dielectrics for OFET |
| US10254795B2 (en) | 2015-05-06 | 2019-04-09 | Flexterra, Inc. | Attachable, flexible display device with flexible tail |
| EP3133065A1 (en) * | 2015-08-21 | 2017-02-22 | Merck Patent GmbH | Compounds for optically active devices |
| JPWO2017038948A1 (ja) * | 2015-09-02 | 2018-06-28 | 富士フイルム株式会社 | 有機薄膜トランジスタ、有機薄膜トランジスタの製造方法、有機半導体組成物、有機半導体膜および有機半導体膜の製造方法 |
| DE102015119939A1 (de) | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
| CN105628262A (zh) * | 2015-12-20 | 2016-06-01 | 华南理工大学 | 基于有机弹性体栅绝缘层的薄膜晶体管压力传感器 |
| CN105810819B (zh) * | 2016-05-04 | 2018-09-04 | 国家纳米科学中心 | 一种有机分子螺旋生长薄膜场效应晶体管及其制备方法和应用 |
| JP6801374B2 (ja) * | 2016-10-31 | 2020-12-16 | 東ソー株式会社 | 重合体、絶縁膜及びこれを含む有機電界効果トランジスタデバイス |
| TWI614505B (zh) * | 2017-02-18 | 2018-02-11 | 以紫外光照射提高矽基表面原生氧化層品質之裝置與方法 | |
| CN110418808B (zh) | 2017-03-16 | 2022-07-15 | 东曹株式会社 | 光交联性聚合物、绝缘膜、平坦化膜、亲疏图案化膜和包含其的有机场效应晶体管器件 |
| WO2018168676A1 (ja) | 2017-03-16 | 2018-09-20 | 東ソー株式会社 | 光架橋性重合体、絶縁膜、平坦化膜、親撥パターニング膜及びこれを含む有機電界効果トランジスタデバイス |
| CN107621751B (zh) * | 2017-09-21 | 2021-02-09 | 儒芯微电子材料（上海）有限公司 | 含碱性香豆素结构的聚合物树脂及其光刻胶组合物 |
| EP4327779A3 (en) | 2019-04-26 | 2024-05-08 | AMO Ireland | System and method |
| KR102540663B1 (ko) * | 2021-04-29 | 2023-06-12 | 이화여자대학교 산학협력단 | 병솔 고분자를 포함하는 트랜지스터 게이트절연층용 고분자 박막 및 이를 포함하는 유기전계효과트랜지스터 |
| US20240400736A1 (en) * | 2021-08-30 | 2024-12-05 | Flexterra, Inc. | Colored dielectric polymer materials and devices using them |
| CN113793901B (zh) * | 2021-09-16 | 2023-11-07 | 南京大学 | 一种基于聚合物掺杂n-型有机半导体的并五苯有机场效应晶体管 |
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| JPS5560503A (en) * | 1978-10-30 | 1980-05-07 | Cosmo Co Ltd | Lactone group-containing vinylphenol-type polymer and its preparation |
| US5773591A (en) * | 1997-03-07 | 1998-06-30 | Hoechst Celanese Corp. | Process for preparing coumarin sulfonates |
| US5739295A (en) * | 1997-03-07 | 1998-04-14 | Hoechst Celanese Corporation | Photoactive coumarin sulfonate compounds |
| GB9720922D0 (en) * | 1997-10-02 | 1997-12-03 | Smith & Nephew | Adhesives |
| JP4433526B2 (ja) * | 1999-10-07 | 2010-03-17 | コニカミノルタホールディングス株式会社 | 液晶性高分子水系分散物の製造方法、液晶性高分子水系分散物、光学素子の製造方法及び光学素子 |
| US6608323B2 (en) * | 2000-07-24 | 2003-08-19 | Northwestern University | n-type thiophene semiconductors |
| US6585914B2 (en) * | 2000-07-24 | 2003-07-01 | Northwestern University | N-type thiophene semiconductors |
| JP4305637B2 (ja) * | 2003-06-19 | 2009-07-29 | 信越化学工業株式会社 | 高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| JP2005093921A (ja) * | 2003-09-19 | 2005-04-07 | Canon Inc | 電界効果型有機トランジスタおよびその製造方法 |
| KR101148868B1 (ko) * | 2004-01-26 | 2012-05-29 | 노오쓰웨스턴 유니버시티 | 페릴렌 ｎ-형 반도체 및 관련된 소자 |
| JP2006024862A (ja) * | 2004-07-09 | 2006-01-26 | Nippon Hoso Kyokai <Nhk> | 有機トランジスタおよび有機トランジスタの製造方法 |
| CN101056873A (zh) * | 2004-09-14 | 2007-10-17 | 西北大学 | 羰基官能化的噻吩化合物和相关的器件结构 |
| EP1799771A2 (en) * | 2004-10-06 | 2007-06-27 | Cornerstone Research Group, Inc. | Light activated shape memory co-polymers |
| US7605225B2 (en) | 2006-05-11 | 2009-10-20 | Northwestern University | Silole-based polymers and semiconductor materials prepared from the same |
| US7569693B2 (en) * | 2006-06-12 | 2009-08-04 | Northwestern University | Naphthalene-based semiconductor materials and methods of preparing and use thereof |
| KR101224723B1 (ko) * | 2006-09-15 | 2013-01-21 | 삼성전자주식회사 | 유기 절연막 조성물, 이를 이용하여 제조된 유기 절연막 및유기 박막 트랜지스터 |
| WO2008051552A2 (en) * | 2006-10-25 | 2008-05-02 | Northwestern University | Organic semiconductor materials and methods of preparing and use thereof |
| JP5380296B2 (ja) | 2006-11-17 | 2014-01-08 | ポリエラ コーポレイション | ジイミド系半導体材料ならびにジイミド系半導体材料を調製および使用する方法 |
| US7892454B2 (en) * | 2006-11-17 | 2011-02-22 | Polyera Corporation | Acene-based organic semiconductor materials and methods of preparing and using the same |
| US7981989B2 (en) * | 2006-11-28 | 2011-07-19 | Polyera Corporation | Photopolymer-based dielectric materials and methods of preparation and use thereof |
| JP2010515684A (ja) * | 2007-01-08 | 2010-05-13 | ポリエラ コーポレイション | アレーン−ビス（ジカルボキシイミド）系半導体材料、およびそれを調製するための関連する中間体を調製する方法 |
| US8022214B2 (en) | 2007-01-24 | 2011-09-20 | Polyera Corporation | Organic semiconductor materials and precursors thereof |
| KR101316291B1 (ko) * | 2007-02-16 | 2013-10-08 | 삼성전자주식회사 | 공중합체, 유기절연층 조성물 및 그를 이용하여 제조된유기 절연층 및 유기 박막 트랜지스터 |
| JP4911469B2 (ja) * | 2007-09-28 | 2012-04-04 | 富士フイルム株式会社 | レジスト組成物及びこれを用いたパターン形成方法 |
| TW200951160A (en) * | 2008-02-05 | 2009-12-16 | Basf Se | Perylene-imide semiconductor polymers |
| JP5523351B2 (ja) * | 2008-02-05 | 2014-06-18 | ビーエーエスエフ ソシエタス・ヨーロピア | ペリレン半導体並びにその製造方法及び使用 |
| WO2009144205A1 (en) * | 2008-05-30 | 2009-12-03 | Basf Se | Rylene-based semiconductor materials and methods of preparation and use thereof |
| JP5650108B2 (ja) * | 2008-07-02 | 2015-01-07 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 交互ドナーアクセプターコポリマー系の高性能で溶液加工可能な半導体ポリマー |
| US8580384B2 (en) * | 2010-01-17 | 2013-11-12 | Polyera Corporation | Dielectric materials and methods of preparation and use thereof |
| EP2612377B1 (en) * | 2010-09-02 | 2019-10-02 | Merck Patent GmbH | Process for preparing an organic electronic device |
| US9171961B2 (en) * | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
-
2009
- 2009-11-20 CN CN201310529741.4A patent/CN103560206B/zh not_active Expired - Fee Related
- 2009-11-20 EP EP09759719.9A patent/EP2368281B1/en not_active Not-in-force
- 2009-11-20 WO PCT/EP2009/065569 patent/WO2010057984A2/en not_active Ceased
- 2009-11-20 JP JP2011536876A patent/JP5684715B2/ja active Active
- 2009-11-20 KR KR1020157036689A patent/KR101717398B1/ko active Active
- 2009-11-20 US US13/128,961 patent/US8937301B2/en active Active
- 2009-11-20 KR KR1020117014710A patent/KR101712680B1/ko active Active
- 2009-11-20 CN CN200980146851.4A patent/CN102224611B/zh not_active Expired - Fee Related
- 2009-11-20 EP EP20130179103 patent/EP2660889A3/en not_active Withdrawn
- 2009-11-24 TW TW098139975A patent/TWI491622B/zh not_active IP Right Cessation
-
2014
- 2014-07-04 JP JP2014139115A patent/JP5960202B2/ja not_active Expired - Fee Related
- 2014-08-25 US US14/467,839 patent/US9923158B2/en active Active
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