JP2014116635A - ナノ粒子を有する有機半導体組成物 - Google Patents
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- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
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Abstract
【解決手段】有機電界効果トランジスタoFET600のチャネル層630に有機分子媒質と、この媒質中に拡散した複数のナノ粒子と、これらのナノ粒子の表面に化学的に結合した被膜とを含んだ半導電性固体である組成物を用い、チャネル層630に接触している電極の第1電極640および第2の電極650を、それぞれ、ドレイン電極およびソース電極、誘電体620を介した基板610をゲートとして構成する。
【選択図】図6
Description
別の態様において、ナノ粒子140の拡散は、組成物130上に製造された電極間の距離のオーダにもとづく規模で均一である。別の態様では、ナノ粒子140の拡散は、約10μmまたはそれ未満の規模で均一である。しかし、ナノ粒子140は、非晶質領域160中に比べて結晶性ドメイン150中の方が、ナノ粒子140の濃度がより高くなるように拡散してよい。
第1は、有機分子との混合前および混合後における、ナノ粒子140の凝集を低減させることである。第2は、有機分子との好ましい相互作用を実現することである。好ましい相互作用とは、例えばさらに優れた凝着力、所望の核形成特性、または電荷キャリア・トラップの存在を減少させる結果をもたらす特定の電気的相互作用を含んでよい。
例えば、約1gのナノ粒子140を、約120℃で約12時間の間、乾燥させてよい。乾燥後に、ナノ粒子140は、チャネル層630中におけるナノ粒子140の拡散を向上させるために、被膜145を生成するように処理される。一実施形態においては、この処理により、ナノ粒子140の凝集が低減される。いくつかの場合においては、この処理により、先に説明したように、ナノ粒子140間の極性相互作用が変更される。
一実施形態においては、有機分子はポリマーである。別の実施形態においては、有機分子は(F8T2)210である。(F8T2)210は、American Dye Source Inc.社(Quebec、Canada)より入手可能である。(F8T2)210が使用される場合、テトラヒドロフランTHFを溶媒として使用してよい。この実施形態においては、約2.0gのナノ粒子140を1LのTHFに添加して、THF中のナノ粒子140が約0.2重量%である懸濁物質を結果として得てよい。ステップ550において、約10gの固体の(F8T2)210を、約1LのAerosil(登録商標)/THFの懸濁物質に添加し、混合して(F8T2)210を溶解し、懸濁物質中における約1.0重量%の(F8T2)濃度を結果として得てよい。
Claims (5)
- 回路の基板上に有機半導体チャネルを形成するステップと、
前記基板上に複数の電極を形成するステップと、
を含む、電子デバイスを製造する方法であって、
前記チャネルは、複数のナノ粒子および前記ナノ粒子の外表面に化学的に結合した被膜を含み、
前記被覆されたナノ粒子は有機分子を含む媒質中に拡散し、
前記媒質は複数の結晶性領域と前記結晶性領域間の複数の非晶質領域とを含み、
前記複数の結晶性領域の各結晶性領域は前記被覆されたナノ粒子の1つを含み、
前記媒質と前記媒質中に拡散した被覆されたナノ粒子とは、前記チャネルの半導電性固体を形成し、
前記有機半導体チャネルに接触している前記電極の第1および第2の電極は、それぞれ、ドレイン電極およびソース電極として構成される、
電子デバイスを製造する方法。 - 前記被膜は、前記ナノ粒子の間の双極性またはファンデルワールス相互作用を低下させる1つまたは複数の化学基を含む融和因子を含む、請求項1に記載の方法。
- トリメトキシシランの誘導体に前記ナノ粒子をさらして、被膜を化学的に結合させる、請求項1に記載の方法。
- 前記有機分子は半導体ポリマー鎖である、請求項1に記載の方法。
- 前記半導体ポリマー鎖を含む溶液の粘度が、前記ナノ粒子が中に拡散することによって高められる、請求項4に記載の方法。
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US11/423,555 US8164087B2 (en) | 2006-06-12 | 2006-06-12 | Organic semiconductor compositions with nanoparticles |
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EP (1) | EP2033241B1 (ja) |
JP (2) | JP5665315B2 (ja) |
KR (1) | KR101050617B1 (ja) |
CN (1) | CN101467277B (ja) |
AT (1) | ATE497641T1 (ja) |
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US8164087B2 (en) | 2006-06-12 | 2012-04-24 | Alcatel Lucent | Organic semiconductor compositions with nanoparticles |
US8012564B2 (en) | 2006-07-24 | 2011-09-06 | Alcatel Lucent | Nanoparticle dispersions with low aggregation levels |
US8119233B2 (en) | 2007-02-17 | 2012-02-21 | Nanogram Corporation | Functional composites, functional inks and applications thereof |
JP5369516B2 (ja) * | 2008-06-30 | 2013-12-18 | ソニー株式会社 | 電子デバイス及びその製造方法、並びに、半導体装置及びその製造方法 |
JP5513772B2 (ja) * | 2009-05-25 | 2014-06-04 | 独立行政法人科学技術振興機構 | ポリシルセスキオキサン薄膜への有機半導体膜の製膜方法 |
JP5737849B2 (ja) * | 2010-03-02 | 2015-06-17 | 地方独立行政法人 大阪市立工業研究所 | 有機半導体膜の製造方法及び有機トランジスタ |
CN102259832A (zh) * | 2010-05-27 | 2011-11-30 | 清华大学 | 三维纳米结构阵列的制备方法 |
JP6281816B2 (ja) * | 2014-03-14 | 2018-02-21 | 国立大学法人山形大学 | 半導体層の形成方法 |
CN106206947A (zh) * | 2016-09-23 | 2016-12-07 | 深圳大学 | 一种有机场效应晶体管及其制备方法 |
CN107527999B (zh) * | 2017-08-25 | 2020-03-31 | 京东方科技集团股份有限公司 | 半导体混合材料及其制备方法、薄膜晶体管以及电子装置 |
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JP2005529984A (ja) * | 2002-02-19 | 2005-10-06 | フォトン−エックス・インコーポレーテッド | 光用途のポリマーナノ複合材 |
WO2003089515A1 (fr) * | 2002-04-22 | 2003-10-30 | Konica Minolta Holdings, Inc. | Composition de semi-conducteur organique, element semi-conducteur organique et procede pour les produire |
JP2005531132A (ja) * | 2002-04-29 | 2005-10-13 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | 有機半導体中の荷電粒子の移動度を改善するための添加剤としてのシリコン粒子 |
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JP2004158710A (ja) * | 2002-11-07 | 2004-06-03 | Asahi Kasei Corp | 有機半導体薄膜及びその製造方法 |
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US20070284570A1 (en) | 2007-12-13 |
KR20090018112A (ko) | 2009-02-19 |
WO2007146127A2 (en) | 2007-12-21 |
EP2033241A2 (en) | 2009-03-11 |
KR101050617B1 (ko) | 2011-07-19 |
WO2007146127A3 (en) | 2008-02-21 |
JP2009540605A (ja) | 2009-11-19 |
ATE497641T1 (de) | 2011-02-15 |
US20120171811A1 (en) | 2012-07-05 |
US8164087B2 (en) | 2012-04-24 |
US8450143B2 (en) | 2013-05-28 |
EP2033241B1 (en) | 2011-02-02 |
JP5665315B2 (ja) | 2015-02-04 |
DE602007012349D1 (de) | 2011-03-17 |
CN101467277B (zh) | 2013-01-02 |
CN101467277A (zh) | 2009-06-24 |
JP5847214B2 (ja) | 2016-01-20 |
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