JP2009540605A - ナノ粒子を有する有機半導体組成物 - Google Patents
ナノ粒子を有する有機半導体組成物 Download PDFInfo
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- JP2009540605A JP2009540605A JP2009515430A JP2009515430A JP2009540605A JP 2009540605 A JP2009540605 A JP 2009540605A JP 2009515430 A JP2009515430 A JP 2009515430A JP 2009515430 A JP2009515430 A JP 2009515430A JP 2009540605 A JP2009540605 A JP 2009540605A
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- 239000002105 nanoparticle Substances 0.000 title claims abstract description 78
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- 239000004065 semiconductor Substances 0.000 title claims description 20
- 238000000576 coating method Methods 0.000 claims abstract description 23
- 239000011248 coating agent Substances 0.000 claims abstract description 22
- 239000007787 solid Substances 0.000 claims abstract description 5
- 229920000642 polymer Polymers 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 17
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical class CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims description 2
- 239000000463 material Substances 0.000 description 11
- 238000009826 distribution Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 230000003993 interaction Effects 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 6
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- 238000004519 manufacturing process Methods 0.000 description 5
- 238000004220 aggregation Methods 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
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- 238000005266 casting Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
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- 239000000725 suspension Substances 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N tetrahydrofuran Substances C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- BRXDAEMGSYZHGK-UHFFFAOYSA-N (4-bromophenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(Br)C=C1 BRXDAEMGSYZHGK-UHFFFAOYSA-N 0.000 description 2
- 239000005964 Acibenzolar-S-methyl Substances 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- -1 N-substituted naphthalene 1,4,5,8-tetracarboxylic acid diimide Chemical class 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 125000003636 chemical group Chemical group 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 229920000301 poly(3-hexylthiophene-2,5-diyl) polymer Polymers 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000008247 solid mixture Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical compound C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 1
- OHZAHWOAMVVGEL-UHFFFAOYSA-N 2,2'-bithiophene Chemical compound C1=CSC(C=2SC=CC=2)=C1 OHZAHWOAMVVGEL-UHFFFAOYSA-N 0.000 description 1
- VZIKEJZBGODECS-UHFFFAOYSA-N 3-octyl-2-(4-octyl-2h-thiophen-5-ylidene)-3-thiophen-2-ylthiophene Chemical compound CCCCCCCCC1=CCSC1=C1C(C=2SC=CC=2)(CCCCCCCC)C=CS1 VZIKEJZBGODECS-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000291 Poly(9,9-dioctylfluorene) Polymers 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 239000004964 aerogel Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229920006125 amorphous polymer Polymers 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000002073 nanorod Substances 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 150000002964 pentacenes Chemical class 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- WHRNULOCNSKMGB-UHFFFAOYSA-N tetrahydrofuran thf Chemical compound C1CCOC1.C1CCOC1 WHRNULOCNSKMGB-UHFFFAOYSA-N 0.000 description 1
- CRUIOQJBPNKOJG-UHFFFAOYSA-N thieno[3,2-e][1]benzothiole Chemical class C1=C2SC=CC2=C2C=CSC2=C1 CRUIOQJBPNKOJG-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- FMZQNTNMBORAJM-UHFFFAOYSA-N tri(propan-2-yl)-[2-[13-[2-tri(propan-2-yl)silylethynyl]pentacen-6-yl]ethynyl]silane Chemical compound C1=CC=C2C=C3C(C#C[Si](C(C)C)(C(C)C)C(C)C)=C(C=C4C(C=CC=C4)=C4)C4=C(C#C[Si](C(C)C)(C(C)C)C(C)C)C3=CC2=C1 FMZQNTNMBORAJM-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/40—Organosilicon compounds, e.g. TIPS pentacene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thin Film Transistor (AREA)
- Luminescent Compositions (AREA)
Abstract
Description
Claims (10)
- 有機分子媒質と、
前記媒質中に拡散した複数のナノ粒子と、
前記複数のナノ粒子の表面に化学的に結合した被膜と
を含み、半導電性固体である、組成物。 - 前記ナノ粒子はケイ素原子を含む、請求項1に記載の組成物。
- 前記被膜は融和因子を含む、請求項1に記載の組成物。
- 前記有機分子は半導体ポリマーである、請求項1に記載の組成物。
- 前記ナノ粒子は、約15nmまたはそれ未満の平均直径を有する、請求項1に記載の組成物。
- 複数のナノ粒子に被膜を化学的に結合させるステップと、
有機分子を含む媒質中に前記ナノ粒子を拡散させるステップと、
前記媒質を含む有機半導体チャネルを形成するステップと、
基板上に複数の電極を形成するステップであって、前記電極は、FETのゲート電極、ドレイン電極およびソース電極のうちの2つとして機能するように配置されるステップと
を含む、回路を製造する方法。 - 前記皮膜は融和因子を含む、請求項6に記載の方法。
- 被膜を化学的に結合させる前記ステップは、トリメトキシシランの誘導体にナノ粒子をさらすステップを含む、請求項6に記載の方法。
- 前記有機分子は半導体ポリマーである、請求項6に記載の方法。
- 前記半導体ポリマーを含む溶液の粘度が、前記ナノ粒子が中に拡散することによって高められる、請求項6に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/423,555 US8164087B2 (en) | 2006-06-12 | 2006-06-12 | Organic semiconductor compositions with nanoparticles |
US11/423,555 | 2006-06-12 | ||
PCT/US2007/013513 WO2007146127A2 (en) | 2006-06-12 | 2007-06-08 | Organic semiconductor compositions with nanoparticles |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014023115A Division JP5847214B2 (ja) | 2006-06-12 | 2014-02-10 | ナノ粒子を有する有機半導体組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009540605A true JP2009540605A (ja) | 2009-11-19 |
JP5665315B2 JP5665315B2 (ja) | 2015-02-04 |
Family
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009515430A Expired - Fee Related JP5665315B2 (ja) | 2006-06-12 | 2007-06-08 | ナノ粒子を有する有機半導体組成物 |
JP2014023115A Expired - Fee Related JP5847214B2 (ja) | 2006-06-12 | 2014-02-10 | ナノ粒子を有する有機半導体組成物 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014023115A Expired - Fee Related JP5847214B2 (ja) | 2006-06-12 | 2014-02-10 | ナノ粒子を有する有機半導体組成物 |
Country Status (8)
Country | Link |
---|---|
US (2) | US8164087B2 (ja) |
EP (1) | EP2033241B1 (ja) |
JP (2) | JP5665315B2 (ja) |
KR (1) | KR101050617B1 (ja) |
CN (1) | CN101467277B (ja) |
AT (1) | ATE497641T1 (ja) |
DE (1) | DE602007012349D1 (ja) |
WO (1) | WO2007146127A2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010010525A (ja) * | 2008-06-30 | 2010-01-14 | Sony Corp | 電子デバイス及びその製造方法、並びに、半導体装置及びその製造方法 |
JP2010272816A (ja) * | 2009-05-25 | 2010-12-02 | Japan Science & Technology Agency | ポリシルセスキオキサン薄膜への有機半導体膜の製膜方法 |
JP2011181759A (ja) * | 2010-03-02 | 2011-09-15 | Osaka Municipal Technical Research Institute | 有機半導体膜の製造方法及び有機トランジスタ |
JP2015176954A (ja) * | 2014-03-14 | 2015-10-05 | 国立大学法人山形大学 | 半導体層の形成方法 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8164087B2 (en) | 2006-06-12 | 2012-04-24 | Alcatel Lucent | Organic semiconductor compositions with nanoparticles |
US8012564B2 (en) | 2006-07-24 | 2011-09-06 | Alcatel Lucent | Nanoparticle dispersions with low aggregation levels |
US8119233B2 (en) | 2007-02-17 | 2012-02-21 | Nanogram Corporation | Functional composites, functional inks and applications thereof |
CN102259832A (zh) * | 2010-05-27 | 2011-11-30 | 清华大学 | 三维纳米结构阵列的制备方法 |
CN106206947A (zh) * | 2016-09-23 | 2016-12-07 | 深圳大学 | 一种有机场效应晶体管及其制备方法 |
CN107527999B (zh) * | 2017-08-25 | 2020-03-31 | 京东方科技集团股份有限公司 | 半导体混合材料及其制备方法、薄膜晶体管以及电子装置 |
Citations (2)
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JP2005529984A (ja) * | 2002-02-19 | 2005-10-06 | フォトン−エックス・インコーポレーテッド | 光用途のポリマーナノ複合材 |
JP2005531132A (ja) * | 2002-04-29 | 2005-10-13 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | 有機半導体中の荷電粒子の移動度を改善するための添加剤としてのシリコン粒子 |
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GB9815271D0 (en) * | 1998-07-14 | 1998-09-09 | Cambridge Display Tech Ltd | Particles and devices comprising particles |
US6617583B1 (en) * | 1998-09-18 | 2003-09-09 | Massachusetts Institute Of Technology | Inventory control |
US6797412B1 (en) * | 2000-04-11 | 2004-09-28 | University Of Connecticut | Full color display structures using pseudomorphic cladded quantum dot nanophosphor thin films |
EP1195417B1 (de) * | 2000-10-05 | 2009-10-14 | Evonik Degussa GmbH | Siliciumorganische Nanokapseln |
GB0028867D0 (en) | 2000-11-28 | 2001-01-10 | Avecia Ltd | Field effect translators,methods for the manufacture thereof and materials therefor |
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JP4635410B2 (ja) * | 2002-07-02 | 2011-02-23 | ソニー株式会社 | 半導体装置及びその製造方法 |
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-
2006
- 2006-06-12 US US11/423,555 patent/US8164087B2/en not_active Expired - Fee Related
-
2007
- 2007-06-08 DE DE602007012349T patent/DE602007012349D1/de active Active
- 2007-06-08 JP JP2009515430A patent/JP5665315B2/ja not_active Expired - Fee Related
- 2007-06-08 KR KR1020087030133A patent/KR101050617B1/ko not_active IP Right Cessation
- 2007-06-08 AT AT07809401T patent/ATE497641T1/de not_active IP Right Cessation
- 2007-06-08 CN CN2007800216856A patent/CN101467277B/zh not_active Expired - Fee Related
- 2007-06-08 WO PCT/US2007/013513 patent/WO2007146127A2/en active Application Filing
- 2007-06-08 EP EP07809401A patent/EP2033241B1/en not_active Not-in-force
-
2012
- 2012-03-14 US US13/420,256 patent/US8450143B2/en active Active
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2014
- 2014-02-10 JP JP2014023115A patent/JP5847214B2/ja not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005529984A (ja) * | 2002-02-19 | 2005-10-06 | フォトン−エックス・インコーポレーテッド | 光用途のポリマーナノ複合材 |
JP2005531132A (ja) * | 2002-04-29 | 2005-10-13 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | 有機半導体中の荷電粒子の移動度を改善するための添加剤としてのシリコン粒子 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2010010525A (ja) * | 2008-06-30 | 2010-01-14 | Sony Corp | 電子デバイス及びその製造方法、並びに、半導体装置及びその製造方法 |
JP2010272816A (ja) * | 2009-05-25 | 2010-12-02 | Japan Science & Technology Agency | ポリシルセスキオキサン薄膜への有機半導体膜の製膜方法 |
JP2011181759A (ja) * | 2010-03-02 | 2011-09-15 | Osaka Municipal Technical Research Institute | 有機半導体膜の製造方法及び有機トランジスタ |
JP2015176954A (ja) * | 2014-03-14 | 2015-10-05 | 国立大学法人山形大学 | 半導体層の形成方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070284570A1 (en) | 2007-12-13 |
KR20090018112A (ko) | 2009-02-19 |
WO2007146127A2 (en) | 2007-12-21 |
EP2033241A2 (en) | 2009-03-11 |
KR101050617B1 (ko) | 2011-07-19 |
WO2007146127A3 (en) | 2008-02-21 |
JP2014116635A (ja) | 2014-06-26 |
ATE497641T1 (de) | 2011-02-15 |
US20120171811A1 (en) | 2012-07-05 |
US8164087B2 (en) | 2012-04-24 |
US8450143B2 (en) | 2013-05-28 |
EP2033241B1 (en) | 2011-02-02 |
JP5665315B2 (ja) | 2015-02-04 |
DE602007012349D1 (de) | 2011-03-17 |
CN101467277B (zh) | 2013-01-02 |
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