JP2014097969A5 - - Google Patents
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- Publication number
- JP2014097969A5 JP2014097969A5 JP2013190009A JP2013190009A JP2014097969A5 JP 2014097969 A5 JP2014097969 A5 JP 2014097969A5 JP 2013190009 A JP2013190009 A JP 2013190009A JP 2013190009 A JP2013190009 A JP 2013190009A JP 2014097969 A5 JP2014097969 A5 JP 2014097969A5
- Authority
- JP
- Japan
- Prior art keywords
- salt
- onium
- compound
- optionally substituted
- different
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- -1 salt compound Chemical class 0.000 claims description 29
- 150000004010 onium ions Chemical class 0.000 claims description 15
- 150000003839 salts Chemical class 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 8
- 230000005855 radiation Effects 0.000 claims description 3
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 125000006575 electron-withdrawing group Chemical group 0.000 claims 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 claims 4
- 229910052760 oxygen Inorganic materials 0.000 claims 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims 4
- 229910052736 halogen Inorganic materials 0.000 claims 3
- 150000002367 halogens Chemical class 0.000 claims 3
- 125000000547 substituted alkyl group Chemical group 0.000 claims 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 239000010410 layer Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 230000003213 activating effect Effects 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 125000002091 cationic group Chemical group 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 150000008054 sulfonate salts Chemical class 0.000 claims 1
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 claims 1
- 150000001450 anions Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 0 *[S+](c1c(*2)cccc1)c1c2cccc1 Chemical compound *[S+](c1c(*2)cccc1)c1c2cccc1 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003260 vortexing Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261701612P | 2012-09-15 | 2012-09-15 | |
| US61/701,612 | 2012-09-15 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015209987A Division JP6343270B2 (ja) | 2012-09-15 | 2015-10-26 | オニウム化合物およびその合成方法 |
| JP2017014544A Division JP2017105803A (ja) | 2012-09-15 | 2017-01-30 | オニウム化合物およびその合成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014097969A JP2014097969A (ja) | 2014-05-29 |
| JP2014097969A5 true JP2014097969A5 (cg-RX-API-DMAC7.html) | 2015-01-29 |
| JP6144164B2 JP6144164B2 (ja) | 2017-06-07 |
Family
ID=50274819
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013190009A Expired - Fee Related JP6144164B2 (ja) | 2012-09-15 | 2013-09-13 | オニウム化合物およびその合成方法 |
| JP2015209987A Expired - Fee Related JP6343270B2 (ja) | 2012-09-15 | 2015-10-26 | オニウム化合物およびその合成方法 |
| JP2017014544A Withdrawn JP2017105803A (ja) | 2012-09-15 | 2017-01-30 | オニウム化合物およびその合成方法 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015209987A Expired - Fee Related JP6343270B2 (ja) | 2012-09-15 | 2015-10-26 | オニウム化合物およびその合成方法 |
| JP2017014544A Withdrawn JP2017105803A (ja) | 2012-09-15 | 2017-01-30 | オニウム化合物およびその合成方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9703192B2 (cg-RX-API-DMAC7.html) |
| JP (3) | JP6144164B2 (cg-RX-API-DMAC7.html) |
| KR (2) | KR20140036118A (cg-RX-API-DMAC7.html) |
| CN (2) | CN107266415A (cg-RX-API-DMAC7.html) |
| TW (1) | TWI538902B (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI538902B (zh) * | 2012-09-15 | 2016-06-21 | 羅門哈斯電子材料有限公司 | 鎓化合物及其合成方法 |
| JP5790631B2 (ja) * | 2012-12-10 | 2015-10-07 | 信越化学工業株式会社 | スルホニウム塩及び高分子化合物、レジスト材料及びパターン形成方法、並びに該高分子化合物の製造方法 |
| US10179778B2 (en) | 2013-09-27 | 2019-01-15 | Rohm And Haas Electronic Materials Llc | Substituted aryl onium materials |
| EP4129975A4 (en) * | 2020-03-30 | 2023-12-13 | FUJIFILM Corporation | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, RESIST FILM, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE |
| JP7719654B2 (ja) * | 2020-08-05 | 2025-08-06 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7719653B2 (ja) * | 2020-08-05 | 2025-08-06 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP7782478B2 (ja) * | 2022-02-04 | 2025-12-09 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4161497B2 (ja) * | 1999-12-24 | 2008-10-08 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
| EP1953149B1 (en) * | 2002-03-04 | 2010-10-06 | Wako Pure Chemical Industries, Ltd. | A heterocycle-containing onium salt |
| US7160669B2 (en) * | 2002-10-16 | 2007-01-09 | Sumitomo Chemical Company, Limited | Chemical amplification type resist composition |
| US7217492B2 (en) | 2002-12-25 | 2007-05-15 | Jsr Corporation | Onium salt compound and radiation-sensitive resin composition |
| TWI412888B (zh) * | 2006-08-18 | 2013-10-21 | Sumitomo Chemical Co | 適合作為酸產生劑之鹽及含有該鹽之化學放大型正光阻組成物 |
| JP5116311B2 (ja) | 2007-02-05 | 2013-01-09 | 東洋合成工業株式会社 | スルホニウム塩 |
| JP5453834B2 (ja) * | 2008-02-22 | 2014-03-26 | 住友化学株式会社 | エステル化合物及びその製造方法 |
| JP5208573B2 (ja) * | 2008-05-06 | 2013-06-12 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体 |
| JP5481046B2 (ja) * | 2008-08-13 | 2014-04-23 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法、新規な化合物および酸発生剤 |
| JP5201363B2 (ja) * | 2008-08-28 | 2013-06-05 | 信越化学工業株式会社 | 重合性アニオンを有するスルホニウム塩及び高分子化合物、レジスト材料及びパターン形成方法 |
| JP5469920B2 (ja) * | 2009-05-29 | 2014-04-16 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
| KR20130028891A (ko) * | 2009-10-26 | 2013-03-20 | 가부시키가이샤 아데카 | 방향족 술포늄염 화합물 |
| KR101761434B1 (ko) | 2009-12-08 | 2017-07-25 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물, 중합체, 단량체 및 감방사선성 수지 조성물의 제조 방법 |
| JP5801723B2 (ja) * | 2010-01-29 | 2015-10-28 | タカノ株式会社 | ネオポンコラノール類の製造方法 |
| JP5763433B2 (ja) * | 2010-06-29 | 2015-08-12 | 住友化学株式会社 | 塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法 |
| JP5517811B2 (ja) * | 2010-07-26 | 2014-06-11 | サンアプロ株式会社 | 化学増幅型ネガ型フォトレジスト組成物 |
| JP5960991B2 (ja) | 2011-01-28 | 2016-08-02 | 住友化学株式会社 | 塩、レジスト組成物及びレジストパターンの製造方法 |
| JP5906787B2 (ja) | 2011-03-08 | 2016-04-20 | 住友化学株式会社 | 塩、レジスト組成物及びレジストパターンの製造方法 |
| PT105584B (pt) * | 2011-03-28 | 2013-08-30 | Hovione Farmaciencia S A | Reagentes electrofílicos de alquilação, a sua preparação e usos |
| TWI538902B (zh) * | 2012-09-15 | 2016-06-21 | 羅門哈斯電子材料有限公司 | 鎓化合物及其合成方法 |
| JP5739497B2 (ja) | 2012-09-15 | 2015-06-24 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 酸発生剤化合物およびそれを含むフォトレジスト |
-
2013
- 2013-09-13 TW TW102133124A patent/TWI538902B/zh not_active IP Right Cessation
- 2013-09-13 JP JP2013190009A patent/JP6144164B2/ja not_active Expired - Fee Related
- 2013-09-16 CN CN201710480420.8A patent/CN107266415A/zh active Pending
- 2013-09-16 US US14/027,361 patent/US9703192B2/en not_active Expired - Fee Related
- 2013-09-16 CN CN201310637227.2A patent/CN103664870B/zh not_active Expired - Fee Related
- 2013-09-16 KR KR20130111065A patent/KR20140036118A/ko not_active Ceased
-
2015
- 2015-10-26 JP JP2015209987A patent/JP6343270B2/ja not_active Expired - Fee Related
-
2016
- 2016-03-10 KR KR1020160028855A patent/KR102012203B1/ko not_active Expired - Fee Related
-
2017
- 2017-01-30 JP JP2017014544A patent/JP2017105803A/ja not_active Withdrawn
- 2017-07-10 US US15/645,691 patent/US20180052390A1/en not_active Abandoned