JP2014081659A - ノボラック樹脂ブレンドを含むフォトレジスト - Google Patents
ノボラック樹脂ブレンドを含むフォトレジスト Download PDFInfo
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- JP2014081659A JP2014081659A JP2014018410A JP2014018410A JP2014081659A JP 2014081659 A JP2014081659 A JP 2014081659A JP 2014018410 A JP2014018410 A JP 2014018410A JP 2014018410 A JP2014018410 A JP 2014018410A JP 2014081659 A JP2014081659 A JP 2014081659A
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- photoresist
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
Abstract
【解決手段】放射線感受性成分および少なくとも2種の異なるノボラック樹脂を含む、フォトレジスト組成物が提供される。一態様において、本発明のフォトレジストは、例えば水性現像溶液中で1秒あたり800オングストロームを超えるなど、顕著に高い溶解速度を示す。別の態様において、本発明のフォトレジストは、例えば100mJ/cm2以下などの、良好なフォトスピードを示すことができる。
【選択図】なし
Description
以下に特定する量で以下の物質を混合することによって、フォトレジスト組成物を調製した。
Claims (1)
- (a)(i)ポリマー性ジアゾナフトキノン光活性化合物及び非ポリマー性ジアゾナフトキノン光活性化合物を含む放射線感受性成分、並びに
(ii)1)クレゾール反応生成物並びに2)ベンズアルデヒドおよび/またはサリチルアルデヒドの反応生成物を含む、少なくとも2種の異なるノボラック樹脂、
を含み、
フォトレジストが100mJ/cm2以下のフォトスピードを示す、フォトレジスト組成物を半導体基体上に適用すること;
(b)フォトレジスト層を365nm、405nmおよび/または435nmの波長を有する放射線で露光すること;並びに
(c)露光されたフォトレジスト層を現像してレジストレリーフ像を提供すること;
を含む、フォトレジストレリーフ像を形成する方法。
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JP2014018410A JP6138067B2 (ja) | 2014-02-03 | 2014-02-03 | ノボラック樹脂ブレンドを含むフォトレジスト |
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JP2014018410A JP6138067B2 (ja) | 2014-02-03 | 2014-02-03 | ノボラック樹脂ブレンドを含むフォトレジスト |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2008014797A Division JP2009222733A (ja) | 2008-01-25 | 2008-01-25 | ノボラック樹脂ブレンドを含むフォトレジスト |
Publications (2)
Publication Number | Publication Date |
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JP2014081659A true JP2014081659A (ja) | 2014-05-08 |
JP6138067B2 JP6138067B2 (ja) | 2017-05-31 |
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JP2014018410A Active JP6138067B2 (ja) | 2014-02-03 | 2014-02-03 | ノボラック樹脂ブレンドを含むフォトレジスト |
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JP (1) | JP6138067B2 (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004233846A (ja) * | 2003-01-31 | 2004-08-19 | Tokyo Ohka Kogyo Co Ltd | Lcd製造用ポジ型ホトレジスト組成物およびレジストパターンの形成方法 |
JP2006209099A (ja) * | 2004-12-23 | 2006-08-10 | Az Electronic Materials (Germany) Gmbh | フォトレジスト溶液の調製方法 |
WO2007022124A2 (en) * | 2005-08-17 | 2007-02-22 | Fujifilm Electronic Materials U.S.A, Inc. | Novel positive photosensitive polybenzoxazole precursor compositions |
JP2007304592A (ja) * | 2006-05-08 | 2007-11-22 | Dongjin Semichem Co Ltd | フォトレジスト組成物 |
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2014
- 2014-02-03 JP JP2014018410A patent/JP6138067B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004233846A (ja) * | 2003-01-31 | 2004-08-19 | Tokyo Ohka Kogyo Co Ltd | Lcd製造用ポジ型ホトレジスト組成物およびレジストパターンの形成方法 |
JP2006209099A (ja) * | 2004-12-23 | 2006-08-10 | Az Electronic Materials (Germany) Gmbh | フォトレジスト溶液の調製方法 |
WO2007022124A2 (en) * | 2005-08-17 | 2007-02-22 | Fujifilm Electronic Materials U.S.A, Inc. | Novel positive photosensitive polybenzoxazole precursor compositions |
JP2007304592A (ja) * | 2006-05-08 | 2007-11-22 | Dongjin Semichem Co Ltd | フォトレジスト組成物 |
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JP6138067B2 (ja) | 2017-05-31 |
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