JP2014036055A5 - - Google Patents

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Publication number
JP2014036055A5
JP2014036055A5 JP2012175266A JP2012175266A JP2014036055A5 JP 2014036055 A5 JP2014036055 A5 JP 2014036055A5 JP 2012175266 A JP2012175266 A JP 2012175266A JP 2012175266 A JP2012175266 A JP 2012175266A JP 2014036055 A5 JP2014036055 A5 JP 2014036055A5
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JP
Japan
Prior art keywords
base member
substrate
cleaning
load
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012175266A
Other languages
English (en)
Japanese (ja)
Other versions
JP5937456B2 (ja
JP2014036055A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012175266A priority Critical patent/JP5937456B2/ja
Priority claimed from JP2012175266A external-priority patent/JP5937456B2/ja
Priority to US13/956,943 priority patent/US9579695B2/en
Priority to TW102128002A priority patent/TW201420216A/zh
Priority to KR1020130093103A priority patent/KR101761444B1/ko
Publication of JP2014036055A publication Critical patent/JP2014036055A/ja
Publication of JP2014036055A5 publication Critical patent/JP2014036055A5/ja
Application granted granted Critical
Publication of JP5937456B2 publication Critical patent/JP5937456B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012175266A 2012-08-07 2012-08-07 基板洗浄装置および基板洗浄ユニット Active JP5937456B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2012175266A JP5937456B2 (ja) 2012-08-07 2012-08-07 基板洗浄装置および基板洗浄ユニット
US13/956,943 US9579695B2 (en) 2012-08-07 2013-08-01 Substrate cleaning apparatus and substrate cleaning unit
TW102128002A TW201420216A (zh) 2012-08-07 2013-08-05 基板清洗裝置及基板清洗單元
KR1020130093103A KR101761444B1 (ko) 2012-08-07 2013-08-06 기판 세정 장치 및 기판 세정 유닛

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012175266A JP5937456B2 (ja) 2012-08-07 2012-08-07 基板洗浄装置および基板洗浄ユニット

Publications (3)

Publication Number Publication Date
JP2014036055A JP2014036055A (ja) 2014-02-24
JP2014036055A5 true JP2014036055A5 (enExample) 2015-03-05
JP5937456B2 JP5937456B2 (ja) 2016-06-22

Family

ID=50065256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012175266A Active JP5937456B2 (ja) 2012-08-07 2012-08-07 基板洗浄装置および基板洗浄ユニット

Country Status (4)

Country Link
US (1) US9579695B2 (enExample)
JP (1) JP5937456B2 (enExample)
KR (1) KR101761444B1 (enExample)
TW (1) TW201420216A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016131186A (ja) * 2015-01-13 2016-07-21 株式会社ディスコ スピンナ洗浄装置
JP6941464B2 (ja) * 2017-04-07 2021-09-29 株式会社荏原製作所 基板洗浄装置及び基板処理装置
JP6758247B2 (ja) * 2017-05-10 2020-09-23 株式会社荏原製作所 洗浄装置および基板処理装置、洗浄装置のメンテナンス方法、並びにプログラム
CN107340128A (zh) * 2017-08-23 2017-11-10 长治清华机械厂 清洗刷头试验装置
CN109950170B (zh) * 2017-12-20 2023-04-04 弘塑科技股份有限公司 晶圆清洗设备及控制晶圆清洗设备的毛刷组的方法
KR102788872B1 (ko) 2020-05-21 2025-03-31 삼성전자주식회사 틸팅 가능한 롤 브러쉬를 갖는 기판 세정 장치

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3328426B2 (ja) * 1994-05-12 2002-09-24 東京エレクトロン株式会社 洗浄装置
JP3539787B2 (ja) 1995-03-09 2004-07-07 大日本スクリーン製造株式会社 回転式基板洗浄装置
KR0175278B1 (ko) * 1996-02-13 1999-04-01 김광호 웨이퍼 세정장치
JPH09326378A (ja) * 1996-06-05 1997-12-16 Sony Corp 基板洗浄装置および基板洗浄方法
DE19914347C2 (de) * 1998-03-30 2003-11-06 Tokyo Electron Ltd Waschvorrichtung und Waschverfahren
JP3953716B2 (ja) * 2000-08-01 2007-08-08 株式会社荏原製作所 基板洗浄装置
JP4994074B2 (ja) * 2006-04-20 2012-08-08 東京エレクトロン株式会社 基板洗浄装置，基板洗浄方法，基板処理装置
JP4829710B2 (ja) * 2006-07-26 2011-12-07 芝浦メカトロニクス株式会社 基板の処理装置
JP5413016B2 (ja) * 2008-07-31 2014-02-12 東京エレクトロン株式会社 基板の洗浄方法、基板の洗浄装置及び記憶媒体
EP2397824B1 (en) * 2009-02-10 2019-10-09 Shimadzu Corporation Sensor mechanism body and electronic balance using the same
JP5583503B2 (ja) * 2010-07-14 2014-09-03 東京エレクトロン株式会社 基板洗浄装置、およびこれを備える塗布現像装置

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